⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL737740 | 0.86 | CES1 (0.42) | — | |
| Butane SCHEMBL11085259 | 0.86 | ALDH1A1 (0.33) | — | |
| SCHEMBL28526149 | 0.83 | CES2 (0.46) | — | |
| SCHEMBL28891396 | 0.81 | CES2 (0.45) | — | |
| SCHEMBL994740 | 0.80 | — | — | |
| SCHEMBL61201 | 0.78 | — | — | |
| SCHEMBL28266186 | 0.78 | — | — | |
| Hydrochloric Acid SCHEMBL27871589 | 0.78 | — | — | |
| SCHEMBL1298570 | 0.78 | — | — | |
| Butane SCHEMBL3414639 | 0.78 | TSHR (0.47) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 50 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110573963-B | Photosensitive resin composition | 日产化学株式会社 | 2023-10-24 | — | — | CN | disclosed |
| EP-3478734-B1 | FINELY DIVIDED, CATIONIC, AQUEOUS POLYMER DISPERSIONS, METHOD FOR THE PRODUCTION THEREOF, AND USE THEREOF | SOLENIS TECHNOLOGIES CAYMAN LP (KY) | 2021-03-31 | — | — | EP | disclosed |
| CN-107007871-B | Folic acid-phosphorylcholine oligomer-modified graphene oxide and preparation method and application thereof | 南京大学 | 2020-09-08 | — | — | CN | disclosed |
| EP-3478734-A1 | FINELY DIVIDED, CATIONIC, AQUEOUS POLYMER DISPERSIONS, METHOD FOR THE PRODUCTION THEREOF, AND USE THEREOF | BASF SE (DE) | 2019-05-08 | — | — | EP | disclosed |
| US-10088612-B2 | Alkali-soluble resin, photosensitive resin composition for color filter containing the same and uses thereof | CHI MEI CORPORATION (TW) | 2018-10-02 | — | — | US | disclosed |
| US-9897729-B2 | Photosensitive resin composition for color filter and application thereof | CHI MEI CORPORATION (TW) | 2018-02-20 | — | — | US | disclosed |
| CN-107621750-A | Photosensitive composition, the colour filter and image display device manufactured using said composition | 东友精细化工有限公司 | 2018-01-23 | — | — | CN | disclosed |
| WO-2018001885-A1 | FINELY DIVIDED, CATIONIC, AQUEOUS POLYMER DISPERSIONS, METHOD FOR THE PRODUCTION THEREOF, AND USE THEREOF | BASF SE (DE) | 2018-01-04 | — | — | WO | disclosed |
| EP-2643360-B1 | FINELY DIVIDED, CATIONIC OR AMPHOTERIC, AQUEOUS POLYMER DISPERSIONS, PROCESS FOR THEIR PREPARATION, THEIR USE, CATIONIC OR AMPHOTERIC PROTECTIVE COLLOIDS AND THEIR PREPARATION | BASF SE (DE) | 2017-10-18 | — | — | EP | disclosed |
| CN-104379830-B | It is grafted with the nonwoven articles of copolymer | 3M创新有限公司 | 2017-09-15 | — | — | CN | disclosed |
| CN-1863543-A | Dietetic composition | ORYZA OIL & FAT CHEM (JP) | 2006-11-15 | — | — | CN | disclosed |
| CN-1235089-C | Photosensitive lithographic printing plate | FUJI PHOTO FILM CO LTD (JP) | 2006-01-04 | — | — | CN | disclosed |
| CN-1427306-A | Radiation sensitive refractivity change composition and method for changing refractivity | JSR CORP (JP) | 2003-07-02 | — | — | CN | disclosed |
| US-6568997-B2 | Forming a passivating layer copper oxide for reducing the reaction of the copper metal with the polishing mixtures; reducing the problem of dishing of copper circuits of semiconductor devices | RODEL HOLDINGS, INC. | 2003-05-27 | — | — | US | disclosed |
| US-20020173241-A1 | CMP polishing composition for semiconductor devices containing organic polymer particles | ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. | 2002-11-21 | — | — | US | disclosed |
| US-20020173243-A1 | Polishing composition having organic polymer particles | RODEL HOLDINGS, INC. | 2002-11-21 | — | — | US | disclosed |
| WO-2002081584-A1 | POLISHING COMPOSITION HAVING ORGANIC POLYMER PARTICLES | RODEL HOLDINGS, INC. (US) | 2002-10-17 | — | — | WO | disclosed |
| CN-1355448-A | Photosensitive lithographic printing plate | FUJI PHOTO FILM CO LTD (JP) | 2002-06-26 | — | — | CN | disclosed |
| US-5866298-A | Radiation sensitive composition for color filters | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1999-02-02 | — | — | US | disclosed |
| EP-0775941-A1 | Radiation sensitive composition for color filters | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-05-28 | — | — | EP | disclosed |