SCHEMBL2955720

SCHEMBL2955720

BNC1CCCCC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23798018 0.96
SCHEMBL18819700 0.89
SCHEMBL12809446 0.81
SCHEMBL13166298 0.71 ALDH1A1 (0.53)
SCHEMBL13166302 0.71 ALDH1A1 (0.53)
SCHEMBL8918 0.71
SCHEMBL3036481 0.71 ALDH1A1 (0.53)
SCHEMBL3035987 0.71 ALDH1A1 (0.53)
SCHEMBL1148684 0.71
SCHEMBL8921740 0.71 ALDH1A1 (0.53)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3277696-A1 BORON-CONTAINING COMPOUNDS, COMPOSITIONS, AND METHODS FOR THE DEPOSITION OF BORON CONTAINING FILMS Versum Materials US, LLC (US) 2018-02-07 EP claimed
WO-2016160800-A1 BORON-CONTAINING COMPOUNDS, COMPOSITIONS, AND METHODS FOR THE DEPOSITION OF BORON CONTAINING FILMS AIR PRODUCTS AND CHEMICALS, INC. (US) 2016-10-06 WO claimed
EP-3277696-A1 BORON-CONTAINING COMPOUNDS, COMPOSITIONS, AND METHODS FOR THE DEPOSITION OF BORON CONTAINING FILMS Versum Materials US, LLC (US) 2018-02-07 EP disclosed
CN-107660209-A Boron-containing compounds, compositions and methods for depositing boron-containing films 弗萨姆材料美国有限责任公司 2018-02-02 CN disclosed
US-9834448-B2 Preparation of amine-boranes, including ammonia borane PURDUE RESEARCH FOUNDATION (US) 2017-12-05 US disclosed
US-9834448-B2 Preparation of amine-boranes, including ammonia borane PURDUE RESEARCH FOUNDATION (US) 2017-12-05 US disclosed
WO-2016160800-A1 BORON-CONTAINING COMPOUNDS, COMPOSITIONS, AND METHODS FOR THE DEPOSITION OF BORON CONTAINING FILMS AIR PRODUCTS AND CHEMICALS, INC. (US) 2016-10-06 WO disclosed
US-20160101984-A1 PREPARATION OF AMINE-BORANES, INCLUDING AMMONIA BORANE PURDUE RESEARCH FOUNDATION (US) 2016-04-14 US disclosed
US-20160101984-A1 PREPARATION OF AMINE-BORANES, INCLUDING AMMONIA BORANE PURDUE RESEARCH FOUNDATION (US) 2016-04-14 US disclosed
WO-2010148197-A1 INHIBITORS OF INFLUENZA VIRUSES REPLICATION VERTEX PHARMACEUTICALS INCORPORATED (US) 2010-12-23 WO disclosed
EP-1990345-B1 Organometallic germanium compounds suitable for use in vapor deposition processes ROHM & HAAS ELECT MAT (US) 2010-11-10 EP disclosed
EP-1464724-A2 Organometallic compounds suitable for use in vapor deposition processes Rohm and Haas Electronic Materials, L.L.C. (US) 2004-10-06 EP disclosed
US-20030199704-A1 Alkyl group VA metal compounds SHIPLEY COMPANY, L.L.C. (US) 2003-10-23 US disclosed
CN-1445233-A ALkyl VA group metal compound HIPREY CORP (US) 2003-10-01 CN disclosed
US-20030181746-A1 Alkyl Group VA metal compounds SHIPLEY COMPANY, L.L.C. (US) 2003-09-25 US disclosed
EP-1335416-A1 Preparation of monoalkyl group 15 metal dihalides and dihydrides Shipley Co. L.L.C. (US) 2003-08-13 EP disclosed
US-5489613-A TREATING THROMBOSIS SANKYO COMPANY, LIMITED (JP) 1996-02-06 US disclosed
US-5405870-A Platelet-aggregation inhibitors; useful in treatment of thrombosis SANKYO COMPANY, LIMITED (JP) 1995-04-11 US disclosed
EP-0136779-B1 NEW CARBACYCLIN DERIVATIVES, PROCESSES FOR THEIR PREPARATION AND COMPOSITIONS CONTAINING THEM SANKYO COMPANY LIMITED (JP) 1988-09-14 EP disclosed
EP-0136779-A1 New carbacyclin derivatives, processes for their preparation and compositions containing them SANKYO COMPANY LIMITED (JP) 1985-04-10 EP disclosed