SCHEMBL29558125

SCHEMBL29558125

Oc1ccc(C(c2cc(C3CCCCC3)c(O)cc2O)c2cc(C3CCCCC3)c(O)cc2O)cc1

nearest known ligand 0.51

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
▸ HSP90AA1 P07900 2/20 0.39
▸ NUDT1 P36639 1/20 0.39
▸ BACE1 P56817 1/20 0.39
▸ ESR2 Q92731 3/20 0.35
▸ ESR1 P03372 2/20 0.35
▸ MIF P14174 1/20 0.33
▸ DEGS1 O15121 1/20 0.32
▸ ACMSD Q8TDX5 1/20 0.32
▸ ALDH1A1 P00352 1/20 0.31
▸ MAPT P10636 1/20 0.31
▸ KMT2A Q03164 1/20 0.31
▸ P4HB P07237 1/20 0.31
▸ HSP90AB1 P08238 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28723729 1.00 HSP90AA1 (0.39) HSP90AA1NUDT1BACE1ESR2ESR1
SCHEMBL761688 0.87 NUDT1 (0.34) HSP90AA1NUDT1BACE1ESR2ESR1
SCHEMBL36658 0.87 NUDT1 (0.37) HSP90AA1NUDT1BACE1ESR2ESR1
SCHEMBL29372915 0.87 NUDT1 (0.37) HSP90AA1NUDT1BACE1ESR2ESR1
SCHEMBL29372576 0.87 NUDT1 (0.34) HSP90AA1NUDT1BACE1ESR2ESR1
SCHEMBL29499852 0.87 NUDT1 (0.37) HSP90AA1NUDT1BACE1ESR2ESR1
SCHEMBL28462503 0.87 HIF1A (0.41) HSP90AA1NUDT1BACE1ACMSDALDH1A1
SCHEMBL28899040 0.84 SLC6A4 (0.40) HSP90AA1NUDT1BACE1
SCHEMBL30103811 0.84 SLC6A4 (0.40) HSP90AA1NUDT1BACE1
SCHEMBL28269345 0.84 NUDT1 (0.43) HSP90AA1NUDT1BACE1ESR2ESR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109062007-B Positive photosensitive polysiloxane composition and application thereof 奇美实业股份有限公司 2023-03-10 — — CN disclosed
CN-108693710-B Positive photosensitive polysiloxane composition 奇美实业股份有限公司 2022-12-02 — — CN disclosed
CN-114326300-A Positive photoresist composition, preparation method and photoresist pattern forming method 上海飞凯材料科技股份有限公司 2022-04-12 — — CN disclosed
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