SCHEMBL36658

SCHEMBL36658

Cc1cc(O)c(C2CCCCC2)cc1C(c1ccc(O)cc1)c1cc(C2CCCCC2)c(O)cc1C

nearest known ligand 0.59

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
NUDT1 P36639 1/20 0.37
BACE1 P56817 1/20 0.37
HSP90AA1 P07900 1/20 0.37
ESR1 P03372 2/20 0.33
ESR2 Q92731 2/20 0.33
PTGDR2 Q9Y5Y4 1/20 0.31
PSMB5 P28074 1/20 0.31
MIF P14174 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29499852 1.00 NUDT1 (0.37) NUDT1BACE1HSP90AA1ESR1ESR2
SCHEMBL29372915 1.00 NUDT1 (0.37) NUDT1BACE1HSP90AA1ESR1ESR2
SCHEMBL19685091 0.92 NUDT1 (0.39) NUDT1BACE1HSP90AA1ESR1ESR2
SCHEMBL2864394 0.92 NUDT1 (0.37) NUDT1BACE1HSP90AA1PTGDR2PSMB5
Diphenylmethane SCHEMBL28899035 0.89 OPRK1 (0.36) NUDT1BACE1
SCHEMBL278752 0.89 NUDT1 (0.37) NUDT1BACE1HSP90AA1PTGDR2
SCHEMBL761688 0.89 NUDT1 (0.34) NUDT1BACE1HSP90AA1ESR1ESR2
SCHEMBL29372576 0.89 NUDT1 (0.34) NUDT1BACE1HSP90AA1ESR1ESR2
SCHEMBL36430 0.88 HIF1A (0.39) NUDT1BACE1HSP90AA1PSMB5
SCHEMBL30374860 0.88 HIF1A (0.39) NUDT1BACE1HSP90AA1PSMB5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 620 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7879528-B2 For forming pattern that prevents contamination within the exposure apparatus; lithography TOKYO OHKA KOGYO CO., LTD. (JP) 2011-02-01 US claimed
US-20080176170-A1 RESIST COMPOSITION FOR ELECTRON BEAM OR EUV TOKYO OHKA KOGYO CO., LTD. (JP) 2008-07-24 US claimed
US-5434031-A Positive-working naphthoquinone diazide photoresist composition containing specific hydroxy compound additive TOKYO OHKA KOGYO CO., LTD. (JP) 1995-07-18 US claimed
US-12497558-B2 Colour change composition and compounds THERMOGRAPHIC MEASUREMENTS LTD (GB) 2025-12-16 US disclosed
US-12297357-B2 Temperature-sensitive indicator THERMOGRAPHIC MEASUREMENTS LTD (GB) 2025-05-13 US disclosed
WO-2025079919-A1 PHOTOSENSITIVE RESIN PRECURSOR COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION, INSULATING FILM, AND SEMICONDUCTOR DEVICE 주식회사 엘지화학 2025-04-17 WO disclosed
EP-3344468-B1 COMPOUND FOR USE IN COLOUR CHANGE COMPOSITIONS THERMOGRAPHIC MEASUREMENTS LTD (GB) 2025-03-05 EP disclosed
EP-3961676-B1 ETCHING METHOD AND PHOTOSENSITIVE RESIN COMPOSITION TOKYO OHKA KOGYO CO LTD (JP) 2025-01-22 EP disclosed
US-12202981-B2 Compound for use in colour change compositions SOCIETE BIC (FR) 2025-01-21 US disclosed
EP-3349990-B1 COMPOUND FOR USE IN COLOUR CHANGE COMPOSITIONS SOCIéTé BIC (FR) 2024-10-30 EP disclosed
US-20240270891-A1 PHENOLIC HYDROXY GROUP-CONTAINING RESIN, RESIN COMPOSITION FOR ALKALINE DEVELOPABLE RESIST, RESIST CURABLE RESIN COMPOSITION, AND METHOD FOR PRODUCING PHENOLIC HYDROXY GROUP-CONTAINING RESIN DIC CORPORATION (JP) 2024-08-15 US disclosed
US-5702862-A ALKALI SOLUBLE RESIN; A QUINONE DIAZIDE GROUP-CONTAINING COMPOUND TOKYO OHKA KOGYO CO., LTD. (JP) 1997-12-30 US disclosed
US-5677102-A DISSOLVING AN ALKALI SOLUBLE RESIN AND A QUINONEDIAZIDE GROUP CONTAINING COMPOUND; HEATING TOKYO OHKA KOGYO CO., LTD. (JP) 1997-10-14 US disclosed
US-5604077-A MIXTURE OF ALKALI-SOLUBLE NOVOLAK AND A QUINONE DIAZIDE PHOTOSENSITIZER; HEAT RESISTANCE, RESOLUTION, ANTIFOULING AGENTS TOKYO OHKA KOGYO CO., LTD. (JP) 1997-02-18 US disclosed
US-5601961-A QUINONE DIAZIDE GROUP-CONTAINING COMPOUND AS PHOTOSENSITIZING AGENT, ALKALI-SOLUBLE RESINOUS INGREDIENT AS FILM-FORMING AGENT MADE FROM A BLEND OF AT LEAST TWO NOVOLAK-TYPE RESINS FROM M-AND P-CRESOL, A XYLENOL AND A TRIMETHYLPHENOL TOKYO OHKA KOGYO CO., LTD. (JP) 1997-02-11 US disclosed
US-5576138-A MIXTURE OF RESIN, PHOTOSENSITIZER AND BENZOPHENONE COMPOUND TOKYO OHKA KOGYO CO., LTD. (JP) 1996-11-19 US disclosed
US-5501936-A IMPROVED RESOLUTION OF VERY FINE PATTERNS TOKYO OHKA KOGYO CO., LTD. (JP) 1996-03-26 US disclosed
US-5478692-A Fine patterning for electronics TOKYO OHKA KOGYO CO., LTD. (JP) 1995-12-26 US disclosed
US-5434031-A Positive-working naphthoquinone diazide photoresist composition containing specific hydroxy compound additive TOKYO OHKA KOGYO CO., LTD. (JP) 1995-07-18 US disclosed
US-5401605-A Positive working photosensitive resin composition containing 1,2-naphthoquinone diazide esterification product of triphenylmethane compound TOKYO OHKA KOGYO CO., LTD. (JP) 1995-03-28 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12297357-B2 Temperature-sensitive indicator NCS1, TREH, NEFM NUDT1 905/4885BACE1 774/4885HSP90AA1 1479/4885
US-12202981-B2 Compound for use in colour change compositions TYR, C1R, CBR3 NUDT1 1470/4885BACE1 3206/4885HSP90AA1 3854/4885
US-12497558-B2 Colour change composition and compounds C5, C9, C3AR1 NUDT1 3205/4885BACE1 382/4885HSP90AA1 4704/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.