Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CTRC | Q99895 | 1/20 | 0.44 |
| ▸ | RECQL | P46063 | 1/20 | 0.42 |
| ▸ | PRSS1 | P07477 | 2/20 | 0.41 |
| ▸ | CTSG | P08311 | 2/20 | 0.41 |
| ▸ | CTRB1 | P17538 | 2/20 | 0.41 |
| ▸ | CMA1 | P23946 | 2/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.41 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.41 |
| ▸ | CES2 | O00748 | 1/20 | 0.41 |
| ▸ | CES1 | P23141 | 1/20 | 0.41 |
| ▸ | PLA2G2C | Q5R387 | 1/20 | 0.40 |
| ▸ | MMP2 | P08253 | 1/20 | 0.40 |
| ▸ | MMP9 | P14780 | 1/20 | 0.40 |
| ▸ | MMP12 | P39900 | 1/20 | 0.40 |
| ▸ | TP53 | P04637 | 1/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.40 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3099257 | 1.00 | CTRC (0.44) | CTRCRECQLPRSS1CTSGCTRB1 | |
| SCHEMBL3087152 | 0.94 | ALDH1A1 (0.43) | CTRCALDH1A1PLA2G2CMMP2MMP9 | |
| SCHEMBL9458215 | 0.86 | CTRC (0.48) | CTRCALDH1A1PLA2G2CMMP2MMP9 | |
| SCHEMBL10809966 | 0.86 | CTRC (0.48) | CTRCALDH1A1PLA2G2CMMP2MMP9 | |
| SCHEMBL2328962 | 0.81 | PPARG (0.42) | CTRCALDH1A1PLA2G2CMMP9TDP1 | |
| Ammonia Solution, Strong SCHEMBL27490894 | 0.81 | ALDH1A1 (0.42) | CTRCALDH1A1PLA2G2CMMP2MMP9 | |
| SCHEMBL3095016 | 0.80 | PPARG (0.47) | RECQLALDH1A1NPSR1MMP9TP53 | |
| SCHEMBL9674814 | 0.79 | CTRC (0.51) | CTRCPRSS1ALDH1A1MMP2MMP9 | |
| SCHEMBL10711693 | 0.78 | PPARA (0.47) | ALDH1A1 | |
| SCHEMBL10807674 | 0.78 | RECQL (0.50) | RECQLALDH1A1NPSR1CES2CES1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0251465-A2 | Light activatable anaerobic composition containing latent sulfonic acid source | LOCTITE CORPORATION (US) | 1988-01-07 | — | — | EP | claimed |
| US-7670745-B2 | Alkali soluble polymer and positive working photosensitive resin composition using the same | CHISSO CORPORATION (JP) | 2010-03-02 | — | — | US | disclosed |
| US-20080131813-A1 | Alkali soluble polymer and positive working photosensitive resin composition using the same | CHISSO CORPORATION | 2008-06-05 | — | — | US | disclosed |
| US-6664021-B1 | Acid generator and silicon-containing polyimide ester precursor comprising partially esterified silicon-containing polyamic ester; radiating with light | CHISSO CORPORATION (JP) | 2003-12-16 | — | — | US | disclosed |
| US-5449705-A | Silicon-containing polyamic acid derivative and photosensitive resin composition using it | CHISSO CORPORATION (JP) | 1995-09-12 | — | — | US | disclosed |
| US-5449588-A | Shrinkage inhibition | CHISSO CORPORATION (JP) | 1995-09-12 | — | — | US | disclosed |
| US-5442024-A | Polyamic acid having a crosslinkable silane group or copolymerized with a polysiloxane and a compound generating an acid catalyst to effect imidation upon radiating; films; photoresists; shrinkage inhibition; resolution; adhesion | CHISSO CORPORATION (JP) | 1995-08-15 | — | — | US | disclosed |
| EP-0251465-A2 | Light activatable anaerobic composition containing latent sulfonic acid source | LOCTITE CORPORATION (US) | 1988-01-07 | — | — | EP | disclosed |
| EP-0249365-A2 | Photocatalysts for vinyl compounds activated by an electron donating hetero atom | LOCTITE (IRELAND) Ltd. (IE) | 1987-12-16 | — | — | EP | disclosed |
| US-4708926-A | SULFONIC ESTERS OF A-HYDROXYCARBONYL COMPOUNDS | CIBA-GEIGY CORPORATION (US) | 1987-11-24 | — | — | US | disclosed |
| EP-0084515-B1 | ACID-CURABLE COMPOSITION CONTAINING A BLOCKED CATALYST, AND A CURING METHOD | CIBA-GEIGY AG (CH) | 1987-04-01 | — | — | EP | disclosed |
| US-4636575-A | Masked curing catalyst for acid-curable compositions | CIBA-GEIGY CORPORATION (US) | 1987-01-13 | — | — | US | disclosed |
| US-4510290-A | LATENCY; LOW-TEMPERATURE CURING BY SHORTWAVE RADIATION; INKS, LACQUERS | CIBA GEIGY CORPORATION (US) | 1985-04-09 | — | — | US | disclosed |
| EP-0084515-A2 | Acid-curable composition containing a blocked catalyst, and a curing method | CIBA-GEIGY AG (CH) | 1983-07-27 | — | — | EP | disclosed |