SCHEMBL29580938

SCHEMBL29580938

CC[P+](CC)(CC)COC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Fluoride Ion SCHEMBL22345973 0.97
Fluoride SCHEMBL31058771 0.97
Bromide SCHEMBL198828 0.97
SCHEMBL4939253 0.88
Thiocyanic Acid SCHEMBL4937848 0.84
Trifluoromethanesulfonic Acid SCHEMBL4937834 0.75 ACHE (0.36)
SCHEMBL29606558 0.74 HSD17B10 (0.32)
Water SCHEMBL14840297 0.72 HSD17B10 (0.31)
Hydrochloric Acid SCHEMBL14840264 0.72 HSD17B10 (0.31)
Bromide SCHEMBL14840142 0.72 HSD17B10 (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025046186-A1 ELECTROLYTE WITH LOW SULPHAMATE ION CONTENT ARKEMA FRANCE (FR) 2025-03-06 WO claimed
CN-113825747-B Fluorolactones and process for producing the same 大金工业株式会社 2025-04-25 CN disclosed
WO-2025046186-A1 ELECTROLYTE WITH LOW SULPHAMATE ION CONTENT ARKEMA FRANCE (FR) 2025-03-06 WO disclosed
CN-119390676-A Perfluoro dioxolane and method for producing same 大金工业株式会社 2025-02-07 CN disclosed
CN-111837272-B Catalyst for fuel cell, membrane electrode assembly for fuel cell, and fuel cell provided with the membrane electrode assembly for fuel cell 斯泰拉化工公司 2025-01-14 CN disclosed
CN-118440045-A Fluorolactones and process for producing the same 大金工业株式会社 2024-08-06 CN disclosed
CN-114127228-A Wavelength conversion film, composition for forming wavelength conversion film, and method for producing cluster-containing quantum dot 东京应化工业株式会社 2022-03-01 CN disclosed