Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LTA4H | P09960 | 1/20 | 0.34 |
| ▸ | TP53 | P04637 | 2/20 | 0.33 |
| ▸ | PIN1 | Q13526 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
| ▸ | RELA | Q04206 | 1/20 | 0.31 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.31 |
| ▸ | ESR1 | P03372 | 1/20 | 0.31 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.31 |
| ▸ | TSHR | P16473 | 2/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | NPC1 | O15118 | 1/20 | 0.31 |
| ▸ | HPGD | P15428 | 1/20 | 0.31 |
| ▸ | RAB9A | P51151 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.31 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.31 |
| ▸ | GLA | P06280 | 1/20 | 0.31 |
| ▸ | AOC3 | Q16853 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9175209 | 0.92 | TSHR (0.31) | LTA4HTSHR | |
| SCHEMBL5194396 | 0.92 | TSHR (0.31) | LTA4HTSHR | |
| SCHEMBL34937 | 0.91 | LTA4H (0.37) | LTA4HTP53PIN1MAPTHTT | |
| SCHEMBL5078835 | 0.90 | LTA4H (0.31) | LTA4HTP53PIN1MAPT | |
| Phosphine SCHEMBL23931373 | 0.88 | LTA4H (0.35) | LTA4HTP53PIN1MAPTHTT | |
| SCHEMBL712057 | 0.88 | ESR1 (0.37) | LTA4HTP53PIN1MAPTHTT | |
| SCHEMBL28187676 | 0.88 | LTA4H (0.35) | LTA4HTP53PIN1MAPTHTT | |
| SCHEMBL646714 | 0.88 | LTA4H (0.31) | LTA4H | |
| SCHEMBL18328940 | 0.86 | — | — | |
| SCHEMBL3301397 | 0.84 | TSHR (0.33) | LTA4HTP53PIN1MAPTHTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 172 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2287231-B1 | Ulltraviolet transmissive polyhedral silsesquioxane polymers | PANASONIC CORP (JP) | 2012-06-06 | — | — | EP | claimed |
| US-20110251357-A1 | ULTRAVIOLET TRANSMISSIVE POLYHEDRAL SILSESQUIOXANE POLYMERS | PANASONIC ELECTRIC WORKS CO., LTD. | 2011-10-13 | — | — | US | claimed |
| EP-2287231-A2 | Ulltraviolet transmissive polyhedral silesquioxane polymers | Panasonic Electric Works Co., Ltd. (JP) | 2011-02-23 | — | — | EP | claimed |
| US-7500397-B2 | Activated chemical process for enhancing material properties of dielectric films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2009-03-10 | — | — | US | claimed |
| CN-101312129-A | Activated chemical process for enhancing material properties of dielectric film | AIR PROD & CHEM (US) | 2008-11-26 | — | — | CN | claimed |
| US-20080199977-A1 | Activated Chemical Process for Enhancing Material Properties of Dielectric Films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2008-08-21 | — | — | US | claimed |
| EP-1959485-A2 | Activated chemical process for enhancing material properties of dielectric films | Air Products and Chemicals, Inc. (US) | 2008-08-20 | — | — | EP | claimed |
| US-20060122351-A1 | Ultraviolet transmissive polyhedral silsesquioxane polymers | PANASONIC ELECTRIC WORKS CO., LTD. (JP) | 2006-06-08 | — | — | US | claimed |
| EP-0067066-B2 | Dry-developing resist composition | FUJITSU LTD (JP) | 1994-01-12 | — | — | EP | claimed |
| EP-0067066-B1 | DRY-DEVELOPING RESIST COMPOSITION | FUJITSU LIMITED (JP) | 1985-12-18 | — | — | EP | claimed |
| EP-1520891-B1 | FILM FORMING COMPOSITION, PROCESS FOR PRODUCING FILM FORMING COMPOSITION, INSULATING FILM FORMING MATERIAL, PROCESS FOR FORMING FILM, AND SILICA-BASED FILM | JSR CORP (JP) | 2019-05-01 | — | — | EP | disclosed |
| EP-1746122-B1 | METHOD FOR FORMING ORGANIC SILICA FILM, ORGANIC SILICA FILM, WIRING STRUCTURE AND SEMICONDUCTOR DEVICE | JSR CORP (JP) | 2013-06-12 | — | — | EP | disclosed |
| US-8450045-B2 | Pattern forming method | JSR CORPORATION (JP) | 2013-05-28 | — | — | US | disclosed |
| EP-1705207-B1 | METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM | JSR CORP (JP) | 2012-10-24 | — | — | EP | disclosed |
| US-8283260-B2 | Process for restoring dielectric properties | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2012-10-09 | — | — | US | disclosed |
| EP-1090967-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-11 | — | — | EP | disclosed |
| EP-1088868-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-04 | — | — | EP | disclosed |
| EP-1058274-A1 | Composition for film formation and material for insulating film formation | JSR Corporation (JP) | 2000-12-06 | — | — | EP | disclosed |
| EP-1045290-A2 | Composition for resist underlayer film and method for producing the same | JSR Corporation (JP) | 2000-10-18 | — | — | EP | disclosed |
| EP-0067066-B2 | Dry-developing resist composition | FUJITSU LTD (JP) | 1994-01-12 | — | — | EP | disclosed |