Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.58 |
| ▸ | NOX1 | Q9Y5S8 | 1/20 | 0.49 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.46 |
| ▸ | GAA | P10253 | 1/20 | 0.46 |
| ▸ | MEN1 | O00255 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.42 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.31 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.31 |
| ▸ | PTPRB | P23467 | 1/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 2/20 | 0.30 |
| ▸ | KDM5A | P29375 | 1/20 | 0.30 |
| ▸ | JMJD1C | Q15652 | 1/20 | 0.30 |
| ▸ | KDM3A | Q9Y4C1 | 1/20 | 0.30 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | NPC1 | O15118 | 1/20 | 0.30 |
| ▸ | POLB | P06746 | 1/20 | 0.30 |
| ▸ | RAB9A | P51151 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10397972 | 0.76 | KDM4E (0.61) | KDM4EGAA | |
| SCHEMBL3257142 | 0.74 | TDP1 (0.65) | TDP1NOX1KDM4EGAAMEN1 | |
| SCHEMBL29688221 | 0.74 | TDP1 (0.65) | TDP1NOX1KDM4EGAAMEN1 | |
| Picloram SCHEMBL29388079 | 0.74 | TDP1 (1.00) | TDP1NOX1KDM4EGAAMEN1 | |
| Picloram SCHEMBL13299 | 0.74 | TDP1 (1.00) | TDP1NOX1KDM4EGAAMEN1 | |
| Picloram SCHEMBL8467014 | 0.74 | TDP1 (1.00) | TDP1NOX1KDM4EGAAMEN1 | |
| Picloram SCHEMBL15437675 | 0.72 | TDP1 (0.96) | TDP1NOX1KDM4EGAAMEN1 | |
| Picloram SCHEMBL7112378 | 0.72 | TDP1 (0.96) | TDP1NOX1KDM4EGAAMEN1 | |
| Picloram SCHEMBL28547325 | 0.72 | TDP1 (0.96) | TDP1NOX1KDM4EGAAMEN1 | |
| Picloram SCHEMBL29705200 | 0.72 | TDP1 (0.96) | TDP1NOX1KDM4EGAAMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4087431-A | Preparation of 3,6-dichloropicolinic acid | THE DOW CHEMICAL COMPANY (US) | 1978-05-02 | — | — | US | claimed |
| US-3971799-A | Preparation of 3,5,6-trichloropicolinic acid | THE DOW CHEMICAL COMPANY (US) | 1976-07-27 | — | — | US | claimed |
| EP-2331649-B1 | METHODS AND COMPOSITIONS FOR POLISHING SILICON-CONTAINING SUBSTRATES | CABOT MICROELECTRONICS CORP (US) | 2018-06-13 | — | — | EP | disclosed |
| US-8597540-B2 | Compositions for polishing silicon-containing substrates | CABOT MICROELECTRONICS CORPORATION (US) | 2013-12-03 | — | — | US | disclosed |
| US-20130200039-A1 | AQUEOUS POLISHING COMPOSITIONS CONTAINING N-SUBSTITUTED DIAZENIUM DIOXIDES AND/OR N'-HYDROXY-DIAZENIUM OXIDE SALTS | BASF SE (DE) | 2013-08-08 | — | — | US | disclosed |
| EP-2614122-A1 | AQUEOUS POLISHING COMPOSITIONS CONTAINING N-SUBSTITUTED DIAZENIUM DIOXIDES AND/OR N'-HYDROXY-DIAZENIUM OXIDE SALTS | BASF SE (DE) | 2013-07-17 | — | — | EP | disclosed |
| US-8486169-B2 | Method of polishing a silicon-containing dielectric | CABOT MICROELECTRONICS CORPORATION (US) | 2013-07-16 | — | — | US | disclosed |
| US-20130168348-A1 | AQUEOUS POLISHING COMPOSITION AND PROCESS FOR CHEMICALLY MECHANICALLY POLISHING SUBSTRATES CONTAINING SILICON OXIDE DIELECTRIC AND POLYSILICON FILMS | BASF SE (DE) | 2013-07-04 | — | — | US | disclosed |
| US-20130171824-A1 | PROCESS FOR CHEMICALLY MECHANICALLY POLISHING SUBSTRATES CONTAINING SILICON OXIDE DIELECTRIC FILMS AND POLYSILICON AND/OR SILICON NITRIDE FILMS | BASF SE (DE) | 2013-07-04 | — | — | US | disclosed |
| US-20120280170-A1 | COMPOSITIONS FOR POLISHING SILICON-CONTAINING SUBSTRATES | CABOT MICROELECTRONICS CORPORATION | 2012-11-08 | — | — | US | disclosed |
| US-8247327-B2 | Methods and compositions for polishing silicon-containing substrates | CABOT MICROELECTRONICS CORPORATION (US) | 2012-08-21 | — | — | US | disclosed |
| EP-1601735-A1 | METHOD OF POLISHING A SILICON-CONTAINING DIELECTRIC | Cabot Microelectronics Corporation (US) | 2005-12-07 | — | — | EP | disclosed |
| WO-2004069947-A1 | METHOD OF POLISHING A SILICON-CONTAINING DIELECTRIC | CABOT MICROELECTRONICS CORPORATION (US) | 2004-08-19 | — | — | WO | disclosed |
| US-20040152309-A1 | Method of polishing a silicon-containing dielectric | CABOT MICROELECTRONICS CORPORATION | 2004-08-05 | — | — | US | disclosed |
| US-4594422-A | Hydroxylation of a 6-halo picolinic acid with a aqueous mineral acid solution; then halogenating | THE DOW CHEMICAL COMPANY (US) | 1986-06-10 | — | — | US | disclosed |
| US-4334074-A | BY ACIDIFICATION WITH HYDROGEN CHLORIDE IN THE PRESENCE OF A FLOCCULANT | THE DOW CHEMICAL COMPANY (US) | 1982-06-08 | — | — | US | disclosed |
| US-4087431-A | Preparation of 3,6-dichloropicolinic acid | THE DOW CHEMICAL COMPANY (US) | 1978-05-02 | — | — | US | disclosed |
| US-4087431-A | Preparation of 3,6-dichloropicolinic acid | THE DOW CHEMICAL COMPANY (US) | 1978-05-02 | — | — | US | disclosed |
| US-3971799-A | Preparation of 3,5,6-trichloropicolinic acid | THE DOW CHEMICAL COMPANY (US) | 1976-07-27 | — | — | US | disclosed |
| US-3971799-A | Preparation of 3,5,6-trichloropicolinic acid | THE DOW CHEMICAL COMPANY (US) | 1976-07-27 | — | — | US | disclosed |