SCHEMBL29633699

SCHEMBL29633699

COc1ccc(C(=O)c2ccccc2Cl)c(O)c1

nearest known ligand 0.77

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 5/20 0.77
HPGD P15428 3/20 0.77
CYP2C19 P33261 3/20 0.77
CYP3A4 P08684 3/20 0.77
CYP1A2 P05177 2/20 0.77
PGR P06401 2/20 0.77
SLC6A2 P23975 2/20 0.77
ADORA3 P0DMS8 1/20 0.77
AR P10275 1/20 0.77
CHRM1 P11229 1/20 0.77
ALOX15 P16050 1/20 0.77
TBXA2R P21731 1/20 0.77
ADRA1A P35348 1/20 0.77
HIF1A Q16665 1/20 0.77
RAB9A P51151 3/20 0.73
NPC1 O15118 2/20 0.73
ALDH1A1 P00352 3/20 0.66
MAPK1 P28482 3/20 0.66
CYP2D6 P10635 1/20 0.66
PDE4A P27815 1/20 0.66

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2482326 1.00 LMNA (0.77) LMNAHPGDCYP2C19CYP3A4CYP1A2
SCHEMBL11361515 0.88 NPC1 (0.69) LMNAHPGDCYP2C19CYP3A4CYP1A2
Dioxybenzone SCHEMBL6674075 0.87 LMNA (1.00) LMNAHPGDCYP2C19CYP3A4CYP1A2
Dioxybenzone SCHEMBL7936480 0.87 LMNA (1.00) LMNAHPGDCYP2C19CYP3A4CYP1A2
Dioxybenzone SCHEMBL29364693 0.87 LMNA (1.00) LMNAHPGDCYP2C19CYP3A4CYP1A2
Dioxybenzone SCHEMBL15894 0.87 LMNA (1.00) LMNAHPGDCYP2C19CYP3A4CYP1A2
Dioxybenzone SCHEMBL29365575 0.87 LMNA (1.00) LMNAHPGDCYP2C19CYP3A4CYP1A2
Dioxybenzone SCHEMBL29354139 0.87 LMNA (1.00) LMNAHPGDCYP2C19CYP3A4CYP1A2
SCHEMBL11371715 0.87 LMNA (0.67) LMNAHPGDCYP2C19CYP3A4CYP1A2
SCHEMBL29365072 0.85 NPC1 (1.00) LMNAHPGDCYP2C19CYP3A4CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120092045-A Synergistic stabilizer composition and method for protecting organic material from UV rays and thermal degradation using the same 塞特工业公司 2025-06-03 CN claimed
WO-2025099141-A1 STABILIZING COMPOSITIONS FOR POLYMERIC MATERIALS CYTEC INDUSTRIES INC. (US) 2025-05-15 WO claimed
WO-2025099143-A1 COMPOSITIONS FOR STABILIZING POLYMERIC MATERIALS AGAINST UV LIGHT THERMAL AND GAS FADING DEGRADATION CYTEC INDUSTRIES INC. (US) 2025-05-15 WO claimed
EP-4363506-A1 COMPOSITIONS AND METHODS FOR PROTECTING COATINGS FROM THE DELETERIOUS EFFECTS OF EXPOSURE TO UV-C LIGHT Cytec Industries Inc. (US) 2024-05-08 EP claimed
CN-117597403-A Composition and method for protecting a coating from harmful effects of exposure to UV-C light 塞特工业公司 2024-02-23 CN claimed
EP-4251689-A1 COMPOSITIONS AND METHODS FOR PROTECTING ORGANIC POLYMERIC MATERIALS FROM DISCOLORATION DUE TO EXPOSURE TO UV-C LIGHT Cytec Industries, Inc. (US) 2023-10-04 EP claimed
CN-116783246-A Compositions and methods for protecting organic polymeric materials from discoloration due to exposure to UV-C light 塞特工业公司 2023-09-19 CN claimed
WO-2023278282-A1 COMPOSITIONS AND METHODS FOR PROTECTING COATINGS FROM THE DELETERIOUS EFFECTS OF EXPOSURE TO UV-C LIGHT CYTEC INDUSTRIES INC. (US) 2023-01-05 WO claimed
WO-2022115573-A1 COMPOSITIONS AND METHODS FOR PROTECTING ORGANIC POLYMERIC MATERIALS FROM DISCOLORATION DUE TO EXPOSURE TO UV-C LIGHT CYTEC INDUSTRIES INC. (US) 2022-06-02 WO claimed
WO-2022115578-A1 COMPOSITIONS AND METHODS FOR PROTECTING ORGANIC POLYMERIC MATERIALS FROM THE DELETERIOUS EFFECTS EXPOSURE TO UV-C LIGHT CYTEC INDUSTRIES INC. (US) 2022-06-02 WO claimed
EP-4605460-A1 SYNERGISTIC STABILIZER COMPOSITIONS AND METHODS FOR USING SAME FOR PROTECTING ORGANIC MATERIALS FROM UV LIGHT AND THERMAL DEGRADATION Cytec Industries Inc. (US) 2025-08-27 EP disclosed
CN-120092045-A Synergistic stabilizer composition and method for protecting organic material from UV rays and thermal degradation using the same 塞特工业公司 2025-06-03 CN disclosed
WO-2025099141-A1 STABILIZING COMPOSITIONS FOR POLYMERIC MATERIALS CYTEC INDUSTRIES INC. (US) 2025-05-15 WO disclosed
WO-2025099143-A1 COMPOSITIONS FOR STABILIZING POLYMERIC MATERIALS AGAINST UV LIGHT THERMAL AND GAS FADING DEGRADATION CYTEC INDUSTRIES INC. (US) 2025-05-15 WO disclosed
WO-2025056330-A1 STABILIZED POLYMER COMPOSITIONS WITH IMPROVED COLOR RESISTANCE CYTEC INDUSTRIES INC. (US) 2025-03-20 WO disclosed
CN-112055728-B Granular stabilizer composition for polymer resin and method for producing the same 塞特工业公司 2023-05-05 CN disclosed
WO-2023278282-A1 COMPOSITIONS AND METHODS FOR PROTECTING COATINGS FROM THE DELETERIOUS EFFECTS OF EXPOSURE TO UV-C LIGHT CYTEC INDUSTRIES INC. (US) 2023-01-05 WO disclosed
CN-115368629-A Stabilizer composition and method for protecting organic materials from UV light and thermal degradation using the same 塞特工业公司 2022-11-22 CN disclosed
WO-2022115578-A1 COMPOSITIONS AND METHODS FOR PROTECTING ORGANIC POLYMERIC MATERIALS FROM THE DELETERIOUS EFFECTS EXPOSURE TO UV-C LIGHT CYTEC INDUSTRIES INC. (US) 2022-06-02 WO disclosed
WO-2022115573-A1 COMPOSITIONS AND METHODS FOR PROTECTING ORGANIC POLYMERIC MATERIALS FROM DISCOLORATION DUE TO EXPOSURE TO UV-C LIGHT CYTEC INDUSTRIES INC. (US) 2022-06-02 WO disclosed