SCHEMBL29652158

SCHEMBL29652158

Cc1nnc(N)nc1C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL324446 1.00
SCHEMBL11901290 0.75
SCHEMBL25859151 0.75
SCHEMBL31314104 0.75
SCHEMBL27292448 0.75
SCHEMBL19519309 0.75
SCHEMBL27036986 0.71 ALDH1A1 (0.54)
SCHEMBL802376 0.67
SCHEMBL9644113 0.67 ALDH1A1 (0.50)
SCHEMBL7919954 0.67 KDM4E (0.50)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118772631-A Fusible intumescent flame retardant composition QED实验室公司 2024-10-15 CN claimed
EP-4677144-A1 FIBERS AND FABRICS WITH NITROGEN-CONTAINING ADDITIVES Ascend Performance Materials Operations LLC (US) 2026-01-14 EP disclosed
CN-116479366-B Chemical activation of self-passivating metals 斯瓦戈洛克公司 2025-05-23 CN disclosed
CN-114929924-B Chemical activation of self-passivating metals 斯瓦戈洛克公司 2025-02-14 CN disclosed
CN-119403952-A Laser assisted reagent activation and modification of self-passivating metals 斯瓦戈洛克公司 2025-02-07 CN disclosed
CN-118772631-A Fusible intumescent flame retardant composition QED实验室公司 2024-10-15 CN disclosed
WO-2024186866-A1 FIBERS AND FABRICS WITH NITROGEN-CONTAINING ADDITIVES ASCEND PERFORMANCE MATERIALS OPERATIONS LLC (US) 2024-09-12 WO disclosed
EP-4416555-A1 COMPOSITIONS FOR REMOVING PHOTORESIST AND ETCH RESIDUE FROM A SUBSTRATE WITH COPPER CORROSION INHIBITOR AND USES THEREOF Versum Materials US, LLC (US) 2024-08-21 EP disclosed
CN-118401902-A Composition with copper corrosion inhibitor for removing photoresist and etching residues from a substrate and use thereof 弗萨姆材料美国有限责任公司 2024-07-26 CN disclosed
CN-117295840-A Activation of self-passivating metals using reagent coatings for low temperature nitrocarburizing in the presence of oxygen-containing gas 斯瓦戈洛克公司 2023-12-26 CN disclosed
CN-116479366-A Chemical activation of self-passivating metals 斯瓦戈洛克公司 2023-07-25 CN disclosed
WO-2023114638-A1 COMPOSITIONS FOR REMOVING PHOTORESIST AND ETCH RESIDUE FROM A SUBSTRATE WITH COPPER CORROSION INHIBITOR AND USES THEREOF VERSUM MATERIALS US, LLC (US) 2023-06-22 WO disclosed
CN-112236540-B Chemical activation of self-passivating metals 斯瓦戈洛克公司 2023-05-16 CN disclosed
WO-2023081261-A1 TUNABLE FLUORESCENT COMPOUNDS AND USES THEREOF ARIZONA BOARD OF REGENTS ON BEHALF OF THE UNIVERSITY OF ARIZONA (US) 2023-05-11 WO disclosed
CN-116018224-A Low temperature case hardening and surface modification of additively manufactured articles and materials 斯瓦戈洛克公司 2023-04-25 CN disclosed
CN-114929924-A Chemical activation of self-passivated metals 斯瓦戈洛克公司 2022-08-19 CN disclosed
CN-112004845-B Resin composition, laminate, semiconductor wafer with resin composition layer, substrate, and semiconductor device 三菱瓦斯化学株式会社 2022-05-31 CN disclosed
US-20220154219-A1 GENE DELIVERY PARTICLES TO INDUCE TUMOR-DERIVED ANTIGEN PRESENTING CELLS THE JOHNS HOPKINS UNIVERSITY 2022-05-19 US disclosed