SCHEMBL324446

SCHEMBL324446

Cc1nnc(N)nc1C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11901290 0.75
SCHEMBL25859151 0.75
SCHEMBL31314104 0.75
SCHEMBL27292448 0.75
SCHEMBL19519309 0.75
SCHEMBL27036986 0.71 ALDH1A1 (0.54)
SCHEMBL802376 0.67
SCHEMBL9644113 0.67 ALDH1A1 (0.50)
SCHEMBL7919954 0.67 KDM4E (0.50)
SCHEMBL34472783 0.65 LMNA (0.58)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 341 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11932765-B2 Meltable intumescent flame retardant compositions QED LABS, INC. (US) 2024-03-19 US claimed
US-20230331986-A1 MELTABLE INTUMESCENT FLAME RETARDANT COMPOSITIONS QED LABS INC (US) 2023-10-19 US claimed
US-20210309855-A1 MELTABLE INTUMESCENT FLAME RETARDANT COMPOSITIONS QED LABS, INC. 2021-10-07 US claimed
US-11066554-B2 2021-07-20 US claimed
EP-3545031-A1 MELTABLE INTUMESCENT FLAME RETARDANT COMPOSITIONS QED Labs Inc (US) 2019-10-02 EP claimed
WO-2018098408-A1 MELTABLE INTUMESCENT FLAME RETARDANT COMPOSITIONS QED LABS, INC. (US) 2018-05-31 WO claimed
US-20090162764-A1 NITROGEN HETEROCYCLICS CONTAINING PHOTOCONDUCTORS XEROX CORPORATION (US) 2009-06-25 US claimed
US-20090061337-A1 PHOTOCONDUCTORS XEROX CORPORATION (US) 2009-03-05 US claimed
US-7497966-B2 Chemical mechanical polishing slurry composition for shallow trench isolation process of semiconductor HANWHA CHEMICAL CORPORATION (KR) 2009-03-03 US claimed
WO-2008023858-A1 MANUFACTURING METHODS OF FINE CERIUM OXIDE PARTICLES AND ITS SLURRY FOR SHALLOW TRENCH ISOLATION PROCESS OF SEMICONDUCTOR HANWHA CHEMICAL CORPORATION (KR) 2008-02-28 WO claimed
WO-2003002119-A1 TREATMENT AND PREVENTION OF LIPODERMATOSCLEROSIS JOHNSON & JOHNSON MEDICAL LIMITED (GB) 2003-01-09 WO claimed
US-6447695-B1 WITH POLISHING RATE ADJUSTOR JSR CORPORATION (JP) 2002-09-10 US claimed
US-20020012888-A1 Photothermographic material KONICA CORPORATION, A CORPORATION OF JAPAN (JP) 2002-01-31 US claimed
US-5780459-A SALICYLIC ACID WITH ADDITIONAL ACTIVE MATERIALS THE PROCTER & GAMBLE COMPANY (US) 1998-07-14 US claimed
CN-1133617-A Gold leaching using nitrogen and sulfur aromatic heterocyclic compounds DU PONT (US) 1996-10-16 CN claimed
US-5487884-A CYTOPROTECTIVE AGENTS BY RADIATION RESISTANCE TO PREVENT SKIN CANCER AND PREMATURE AGING THE PROCTER & GAMBLE COMPANY (US) 1996-01-30 US claimed
US-5484470-A AS CATALYST AVAILABLE FOR COORDINATION TO SURFACE OF UNDISSOLVED GOLD E. I. DU PONT DE NEMOURS AND COMPANY (US) 1996-01-16 US claimed
EP-0663204-A1 Hairdyeing composition GOLDWELL GmbH (DE) 1995-07-19 EP claimed
WO-1995011319-A1 GOLD LIXIVIATION USING NITROGEN AND SULFUR HETEROCYCLIC AROMATIC COMPOUNDS E.I. DU PONT DE NEMOURS AND COMPANY (US) 1995-04-27 WO claimed
EP-0313305-A2 Photoprotection compositions comprising chelating agents THE PROCTER & GAMBLE COMPANY (US) 1989-04-26 EP claimed