⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2001779 | 0.79 | TET2 (0.56) | — | |
| SCHEMBL1995657 | 0.79 | TET2 (0.56) | — | |
| SCHEMBL6064308 | 0.79 | TET2 (0.50) | — | |
| SCHEMBL1995655 | 0.79 | TET2 (0.56) | — | |
| SCHEMBL6063635 | 0.77 | TET2 (0.48) | — | |
| SCHEMBL18954253 | 0.76 | — | — | |
| SCHEMBL6064272 | 0.75 | TET2 (0.46) | — | |
| SCHEMBL6063735 | 0.75 | TET2 (0.46) | — | |
| Bicarbonate SCHEMBL29184122 | 0.74 | TET2 (0.33) | — | |
| SCHEMBL11037132 | 0.74 | TET2 (0.64) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0449274-B1 | Fluoroacrylic polymer having lubricating effect and thermoplastic resin composition comprising same | MITSUBISHI RAYON CO (JP) | 1995-10-04 | — | — | EP | claimed |
| US-5213938-A | Oxidation of toner compositions | XEROX CORPORATION (US) | 1993-05-25 | — | — | US | claimed |
| CN-111004122-B | Synthesis method of gem-difluoroallyl compound in aqueous phase | 陕西科技大学 | 2022-03-04 | — | — | CN | disclosed |
| CN-112374983-A | Synthesis method of 2, 2-difluoroethyl 2-acrylate | 山东华安新材料有限公司 | 2021-02-19 | — | — | CN | disclosed |
| US-8577256-B2 | Electrostatic image developing carrier, electrostatic image developer, process cartridge, image forming method, and image forming apparatus | FUJI XEROX CO., LTD. (JP) | 2013-11-05 | — | — | US | disclosed |
| US-8507189-B2 | Upper layer film forming composition and method of forming photoresist pattern | JSR CORPORATION (JP) | 2013-08-13 | — | — | US | disclosed |
| US-8431332-B2 | Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist pattern | JSR CORPORATION (JP) | 2013-04-30 | — | — | US | disclosed |
| US-20130017482-A1 | ELECTROSTATIC IMAGE DEVELOPING CARRIER, ELECTROSTATIC IMAGE DEVELOPER, PROCESS CARTRIDGE, IMAGE FORMING METHOD, AND IMAGE FORMING APPARATUS | FUJI XEROX CO., LTD. (JP) | 2013-01-17 | — | — | US | disclosed |
| US-8247165-B2 | Upper layer film forming composition for liquid immersion and method of forming photoresist pattern | JSR CORPORATION (JP) | 2012-08-21 | — | — | US | disclosed |
| US-20100255416-A1 | COMPOSITION FOR FORMING UPPER LAYER FILM FOR IMMERSION EXPOSURE, UPPER LAYER FILM FOR IMMERSION EXPOSURE, AND METHOD OF FORMING PHOTORESIST PATTERN | JSR CORPORATION (JP) | 2010-10-07 | — | — | US | disclosed |
| US-7781142-B2 | Copolymer and top coating composition | JSR CORPORATION (JP) | 2010-08-24 | — | — | US | disclosed |
| US-20080038661-A1 | Copolymer and Top Coating Composition | JSR CORPORATION (JP) | 2008-02-14 | — | — | US | disclosed |
| US-20070269734-A1 | Uper Layer Film Forming Composition for Liquid Immersion and Method of Forming Photoresist Pattern | JSR CORPORATION (JP) | 2007-11-22 | — | — | US | disclosed |
| US-7148363-B2 | Process for preparing acrylate compound | TOSOH CORPORATION (JP) | 2006-12-12 | — | — | US | disclosed |
| US-20050148789-A1 | Process for preparing acrylate compound | TOSOH CORPORATION | 2005-07-07 | — | — | US | disclosed |
| US-6833462-B2 | Esterification to get cyclic acrylate compounds; used as raw material for functional polymers, pharmaceuticals, pesticides, semiconductor lithography | TOSOH CORPORATION (JP) | 2004-12-21 | — | — | US | disclosed |
| US-20030139613-A1 | Process for preparing acrylate compound | TOSOH CORPORATION | 2003-07-24 | — | — | US | disclosed |
| US-5928832-A | Toner adsorption processes | XEROX CORPORATION (US) | 1999-07-27 | — | — | US | disclosed |
| US-5213938-A | Oxidation of toner compositions | XEROX CORPORATION (US) | 1993-05-25 | — | — | US | disclosed |
| US-5100762-A | Radiation-sensitive polymer and radiation-sensitive composition containing the same | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 1992-03-31 | — | — | US | disclosed |