SCHEMBL29670272

SCHEMBL29670272

C=Cc1ccc([Si](CC)(OCC)OCC)c2ccccc12

nearest known ligand 0.31

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.31
LMNA P02545 1/20 0.31
MAPT P10636 1/20 0.31
HPGD P15428 1/20 0.31
ALOX12 P18054 1/20 0.31
NTSR1 P30989 1/20 0.31
CCR6 P51684 1/20 0.31
MCL1 Q07820 1/20 0.31
NPSR1 Q6W5P4 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29670571 0.84 ALDH1A1 (0.32) ALDH1A1LMNAMAPTHPGDALOX12
SCHEMBL27769595 0.81 ALDH1A1 (0.34) ALDH1A1
SCHEMBL29670533 0.72 POLB (0.36) ALDH1A1LMNAMAPTHPGDMCL1
SCHEMBL18319629 0.72 POLB (0.36) ALDH1A1LMNAMAPTHPGDMCL1
SCHEMBL29416086 0.72 HPGD (0.38) ALDH1A1LMNAHPGD
SCHEMBL15303120 0.72 HPGD (0.38) ALDH1A1LMNAHPGD
SCHEMBL6708619 0.72 ALDH1A1 (0.31) ALDH1A1
SCHEMBL29670551 0.71 LMNA (0.33) ALDH1A1LMNAMAPT
SCHEMBL30017689 0.71 ALDH1A1 (0.35) ALDH1A1
SCHEMBL15848163 0.71 HPRT1 (0.44) ALDH1A1LMNAMAPTHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122054878-A Method for manufacturing light-emitting device, negative-type radiation-sensitive composition, cured film, and organic EL device JSR株式会社 2026-05-15 CN disclosed
CN-119065201-A Radiation-sensitive composition, cured film, method for producing same, semiconductor element, and display element JSR株式会社 2024-12-03 CN disclosed
WO-2024242171-A1 RADIATION-SENSITIVE COMPOSITION FOR FORMING GATE INSULATING FILM, PATTERN, METHOD FOR PRODUCING PATTERN, CURED FILM FOR GATE INSULATING FILM, SEMICONDUCTOR ELEMENT, ORGANIC ELECTROCHEMICAL TRANSISTOR, ORGANIC EL DISPLAY DEVICE, LIQUID CRYSTAL DISPLAY DEVICE, MICRO-LED DISPLAY DEVICE, QUANTUM DOT LIGHT-EMITTING DISPLAY DEVICE, WEARABLE DEVICE, ELECTRONIC SKIN DEVICE, BIOLOGICAL SENSOR, AND NEUROMORPHIC DEVICE JSR株式会社 2024-11-28 WO disclosed
CN-118818897-A Radiation-sensitive composition, cured film, method for producing same, semiconductor element, and display element JSR株式会社 2024-10-22 CN disclosed
CN-118795734-A Radiation-sensitive composition, cured film, method for producing cured film, liquid crystal display device, and organic EL display device JSR株式会社 2024-10-18 CN disclosed
CN-117590689-A Radiation-sensitive composition, cured film, method for producing same, display device, and curable resin composition JSR株式会社 2024-02-23 CN disclosed
CN-117148680-A Radiation-sensitive composition, cured film, method for producing cured film, liquid crystal display device, and organic EL display device JSR株式会社 2023-12-01 CN disclosed
CN-115963697-A Radiation-sensitive composition, cured film, method for producing cured film, and display device JSR株式会社 2023-04-14 CN disclosed
CN-115268214-A Radiation-sensitive composition, cured film and method for producing the same, semiconductor and display device JSR株式会社 2022-11-01 CN disclosed
CN-115202152-A Composition, cured film and method for producing same, semiconductor element, and display element JSR株式会社 2022-10-18 CN disclosed
CN-114488688-A Liquid crystal display element, method for producing same, and radiation-sensitive resin composition JSR株式会社 2022-05-13 CN disclosed