SCHEMBL29670526

SCHEMBL29670526

Nc1ccc(C(=O)c2ccccc2)c(N)c1N

nearest known ligand 0.62

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 3/20 0.62
GAA P10253 2/20 0.62
POLB P06746 1/20 0.58
ALDH1A1 P00352 2/20 0.50
LMNA P02545 2/20 0.50
MEN1 O00255 2/20 0.50
USP2 O75604 2/20 0.50
KMT2A Q03164 2/20 0.50
GLA P06280 1/20 0.50
HSD17B10 Q99714 1/20 0.50
AKR1C3 P42330 1/20 0.50
MAPK14 Q16539 1/20 0.49
TSHR P16473 1/20 0.49
MAPK1 P28482 1/20 0.49
HTT P42858 1/20 0.49
KDM4E B2RXH2 1/20 0.47
KEAP1 Q14145 1/20 0.47
NFE2L2 Q16236 1/20 0.47
PBRM1 Q86U86 1/20 0.46
ADORA1 P30542 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3289240 1.00 MAPT (0.62) MAPTGAAPOLBALDH1A1LMNA
Hydrochloric Acid SCHEMBL9847484 0.98 MAPT (0.60) MAPTGAAPOLBALDH1A1LMNA
SCHEMBL10963218 0.86 MAPT (0.60) MAPTGAAPOLBALDH1A1LMNA
SCHEMBL26194817 0.85 MAPT (0.50) MAPTGAAPOLBALDH1A1LMNA
SCHEMBL6466249 0.85 MAPT (0.58) MAPTGAAPOLBALDH1A1LMNA
Benzene SCHEMBL28303083 0.84 MAPT (0.74) MAPTGAAPOLBALDH1A1LMNA
SCHEMBL29786713 0.84 MAPT (0.74) MAPTGAAPOLBALDH1A1LMNA
SCHEMBL112508 0.84 MAPT (0.74) MAPTGAAPOLBALDH1A1LMNA
SCHEMBL27585757 0.83 MAPT (0.56) MAPTGAAPOLBALDH1A1LMNA
SCHEMBL27566030 0.83 MAPT (0.56) MAPTGAAPOLBALDH1A1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110643374-B Liquid crystal aligning agent, liquid crystal alignment film and liquid crystal display element 江苏三月科技股份有限公司(CN) 2023-01-13 CN claimed
CN-110320746-B Radiation-sensitive composition, cured film, method for producing same, display element, and display device JSR株式会社 2024-09-06 CN disclosed
CN-108333869-B Photosensitive composition, cured film, method for producing same, and display element, light-emitting element, and light-receiving element JSR株式会社 2023-07-18 CN disclosed
CN-108732831-B Resin composition, substrate and element comprising same, and method for producing same JSR株式会社 2022-08-16 CN disclosed
CN-114488688-A Liquid crystal display element, method for producing same, and radiation-sensitive resin composition JSR株式会社 2022-05-13 CN disclosed