SCHEMBL3289240

SCHEMBL3289240

Nc1ccc(C(=O)c2ccccc2)c(N)c1N

nearest known ligand 0.62

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 3/20 0.62
GAA P10253 2/20 0.62
POLB P06746 1/20 0.58
ALDH1A1 P00352 2/20 0.50
LMNA P02545 2/20 0.50
MEN1 O00255 2/20 0.50
USP2 O75604 2/20 0.50
KMT2A Q03164 2/20 0.50
GLA P06280 1/20 0.50
HSD17B10 Q99714 1/20 0.50
AKR1C3 P42330 1/20 0.50
MAPK14 Q16539 1/20 0.49
TSHR P16473 1/20 0.49
MAPK1 P28482 1/20 0.49
HTT P42858 1/20 0.49
KDM4E B2RXH2 1/20 0.47
KEAP1 Q14145 1/20 0.47
NFE2L2 Q16236 1/20 0.47
PBRM1 Q86U86 1/20 0.46
ADORA1 P30542 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29670526 1.00 MAPT (0.62) MAPTGAAPOLBALDH1A1LMNA
Hydrochloric Acid SCHEMBL9847484 0.98 MAPT (0.60) MAPTGAAPOLBALDH1A1LMNA
SCHEMBL10963218 0.86 MAPT (0.60) MAPTGAAPOLBALDH1A1LMNA
SCHEMBL26194817 0.85 MAPT (0.50) MAPTGAAPOLBALDH1A1LMNA
SCHEMBL6466249 0.85 MAPT (0.58) MAPTGAAPOLBALDH1A1LMNA
Benzene SCHEMBL28303083 0.84 MAPT (0.74) MAPTGAAPOLBALDH1A1LMNA
SCHEMBL29786713 0.84 MAPT (0.74) MAPTGAAPOLBALDH1A1LMNA
SCHEMBL112508 0.84 MAPT (0.74) MAPTGAAPOLBALDH1A1LMNA
SCHEMBL27585757 0.83 MAPT (0.56) MAPTGAAPOLBALDH1A1LMNA
SCHEMBL27566030 0.83 MAPT (0.56) MAPTGAAPOLBALDH1A1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101006007-A Processes for producing monolithic porous carbon disks from aromatic organic precursors JING WANG (US) 2007-07-25 CN claimed
CN-219879718-U Heavy metal chelating agent synthesis and preparation device 成都赢纳环保科技有限公司 2023-10-24 CN disclosed
CN-114846080-A Thermoplastic molding compositions containing polyalkylene terephthalates 巴斯夫欧洲公司 2022-08-02 CN disclosed
CN-112368641-A Photosensitive resin composition, photosensitive sheet, cured film of photosensitive resin composition and photosensitive sheet, method for producing cured film, and electronic component 东丽株式会社 2021-02-12 CN disclosed
CN-102549506-A Electrificating member and electrophotographic device CANON KK 2012-07-04 CN disclosed
CN-101006007-B Processes for producing monolithic porous carbon disks from aromatic organic precursors ELECTROMATERIALS INC 2011-04-06 CN disclosed
US-7723460-B2 Shape-memory resin performing remoldability and excellent in shape recovering property, and molded product composed of the cross-linked resin NEC CORPORATION (JP) 2010-05-25 US disclosed
CN-101006007-A Processes for producing monolithic porous carbon disks from aromatic organic precursors JING WANG (US) 2007-07-25 CN disclosed
US-20070148465-A1 Shape-memory resin performing remoldability and excellent in shape recovering property, and molded product composed of the cross-linked resin NEC CORPORATION (JP) 2007-06-28 US disclosed
CN-1136252-C Preparation of polyimide and polyamine acid 世韩米克罗尼克斯株式会社 2004-01-28 CN disclosed
CN-1313349-A Preparation of polyimide and polyamine acid SAEHAN IND CO LTD (KR) 2001-09-19 CN disclosed
EP-0022049-A1 Process for preparing polymers that contain imide groups and that are modified with silicon, and the polymers obtained by this process RHONE-POULENC SPECIALITES CHIMIQUES (FR) 1981-01-07 EP disclosed