Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HDAC1 | Q13547 | 1/20 | 0.55 |
| ▸ | SELL | P14151 | 1/20 | 0.54 |
| ▸ | SELP | P16109 | 1/20 | 0.54 |
| ▸ | HSD17B14 | Q9BPX1 | 2/20 | 0.48 |
| ▸ | CA1 | P00915 | 3/20 | 0.46 |
| ▸ | CA2 | P00918 | 3/20 | 0.46 |
| ▸ | CA12 | O43570 | 2/20 | 0.46 |
| ▸ | CA7 | P43166 | 2/20 | 0.46 |
| ▸ | CA9 | Q16790 | 2/20 | 0.46 |
| ▸ | CA14 | Q9ULX7 | 2/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.46 |
| ▸ | HPGD | P15428 | 3/20 | 0.46 |
| ▸ | ALOX15 | P16050 | 3/20 | 0.46 |
| ▸ | RECQL | P46063 | 3/20 | 0.46 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.46 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.46 |
| ▸ | MAPT | P10636 | 2/20 | 0.46 |
| ▸ | MEN1 | O00255 | 1/20 | 0.46 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL350981 | 1.00 | HDAC1 (0.55) | HDAC1SELLSELPHSD17B14CA1 | |
| SCHEMBL8861210 | 0.91 | CA1 (0.50) | HDAC1SELLSELPHSD17B14CA1 | |
| SCHEMBL21935544 | 0.87 | HDAC1 (0.59) | HDAC1SELLSELPHSD17B14ALDH1A1 | |
| SCHEMBL29468156 | 0.87 | HDAC1 (0.59) | HDAC1SELLSELPHSD17B14CA1 | |
| SCHEMBL273458 | 0.87 | HDAC1 (0.59) | HDAC1SELLSELPHSD17B14CA1 | |
| SCHEMBL6847041 | 0.86 | HDAC1 (0.53) | HDAC1SELLSELPHSD17B14ALDH1A1 | |
| SCHEMBL29942150 | 0.86 | HDAC1 (0.53) | HDAC1SELLSELPHSD17B14ALDH1A1 | |
| SCHEMBL7757807 | 0.85 | HDAC1 (0.61) | HDAC1SELLSELPHSD17B14ALDH1A1 | |
| SCHEMBL8605869 | 0.83 | HDAC1 (0.59) | HDAC1SELLSELPHSD17B14ALDH1A1 | |
| SCHEMBL1063407 | 0.82 | SELL (0.68) | HDAC1SELLSELPHSD17B14ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112731765-B | Fluorine-containing resin composition, preparation method thereof and preparation method of cured film containing fluorine-containing resin composition | 西安瑞联新材料股份有限公司 | 2024-03-26 | — | — | CN | claimed |
| CN-110286561-B | Radiation-sensitive composition, cured film, and display element | JSR株式会社 | 2025-06-03 | — | — | CN | disclosed |
| CN-119452307-A | Resist auxiliary film composition and pattern forming method using the same | 三菱瓦斯化学株式会社 | 2025-02-14 | — | — | CN | disclosed |
| CN-110850680-B | Curable composition, display element, and method for forming cured film | JSR株式会社 | 2024-10-25 | — | — | CN | disclosed |
| US-20240302746-A1 | RESIST FILM THICKENING COMPOSITION AND METHOD FOR MANUFACTURING THICKENED PATTERN | MERCK PATENT GMBH (DE) | 2024-09-12 | — | — | US | disclosed |
| CN-112731765-B | Fluorine-containing resin composition, preparation method thereof and preparation method of cured film containing fluorine-containing resin composition | 西安瑞联新材料股份有限公司 | 2024-03-26 | — | — | CN | disclosed |
| CN-117769684-A | Resist auxiliary film composition and pattern forming method using the same | 三菱瓦斯化学株式会社 | 2024-03-26 | — | — | CN | disclosed |
| CN-117751327-A | Positive photosensitive resin composition containing specific copolymer | 日产化学株式会社 | 2024-03-22 | — | — | CN | disclosed |
| CN-117716290-A | Resist composition and method for forming resist film using the same | 三菱瓦斯化学株式会社 | 2024-03-15 | — | — | CN | disclosed |
| CN-117677901-A | Positive photosensitive resin composition | 日产化学株式会社 | 2024-03-08 | — | — | CN | disclosed |
| CN-117590689-A | Radiation-sensitive composition, cured film, method for producing same, display device, and curable resin composition | JSR株式会社 | 2024-02-23 | — | — | CN | disclosed |
| CN-116917812-A | Resist film thick film composition and method for producing thick film pattern | 默克专利有限公司 | 2023-10-20 | — | — | CN | disclosed |
| CN-108333869-B | Photosensitive composition, cured film, method for producing same, and display element, light-emitting element, and light-receiving element | JSR株式会社 | 2023-07-18 | — | — | CN | disclosed |
| CN-115963697-A | Radiation-sensitive composition, cured film, method for producing cured film, and display device | JSR株式会社 | 2023-04-14 | — | — | CN | disclosed |
| CN-115704996-A | Radiation-sensitive composition, interlayer insulating film, method for producing same, and display element | JSR株式会社 | 2023-02-17 | — | — | CN | disclosed |
| CN-115151863-A | Resist composition and method of using the same | 三菱瓦斯化学株式会社 | 2022-10-04 | — | — | CN | disclosed |
| WO-2022142537-A1 | FLUORINE-CONTAINING RESIN COMPOSITION, PREPARATION METHOD THEREFOR, AND PREPARATION METHOD FOR CURED FILM CONTAINING SAME | 西安瑞联新材料股份有限公司 | 2022-07-07 | — | — | WO | disclosed |
| CN-114488688-A | Liquid crystal display element, method for producing same, and radiation-sensitive resin composition | JSR株式会社 | 2022-05-13 | — | — | CN | disclosed |