Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 3/20 | 0.49 |
| ▸ | MEN1 | O00255 | 2/20 | 0.49 |
| ▸ | PBRM1 | Q86U86 | 4/20 | 0.45 |
| ▸ | HTR2C | P28335 | 3/20 | 0.43 |
| ▸ | LMNA | P02545 | 1/20 | 0.42 |
| ▸ | MAPT | P10636 | 1/20 | 0.42 |
| ▸ | HTR2A | P28223 | 1/20 | 0.40 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.40 |
| ▸ | HTR2B | P41595 | 1/20 | 0.40 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.40 |
| ▸ | NPC1 | O15118 | 1/20 | 0.40 |
| ▸ | HPN | P05981 | 1/20 | 0.40 |
| ▸ | GSK3A | P49840 | 1/20 | 0.40 |
| ▸ | GSK3B | P49841 | 1/20 | 0.40 |
| ▸ | CACNA1B | Q00975 | 1/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.40 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.40 |
| ▸ | GAA | P10253 | 1/20 | 0.40 |
| ▸ | ATM | Q13315 | 1/20 | 0.40 |
| ▸ | ACHE | P22303 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8922119 | 0.79 | TDP1 (0.50) | KMT2AMEN1PBRM1HTR2CLMNA | |
| SCHEMBL6381813 | 0.79 | TDP1 (0.50) | KMT2AMEN1PBRM1HTR2CLMNA | |
| SCHEMBL18025771 | 0.78 | MAPT (0.49) | KMT2AMEN1PBRM1LMNAMAPT | |
| SCHEMBL7485090 | 0.78 | KDM1A (0.50) | KMT2AMEN1HTR2CLMNAMAPT | |
| SCHEMBL3630698 | 0.77 | DDB1 (0.42) | — | |
| SCHEMBL6385829 | 0.77 | DDB1 (0.55) | KMT2AMEN1HTR2CHTR2AHTR2B | |
| SCHEMBL28455968 | 0.77 | DDB1 (0.42) | — | |
| SCHEMBL6380792 | 0.76 | MEN1 (0.48) | KMT2AMEN1MAPTNPC1TDP1 | |
| SCHEMBL11025101 | 0.76 | KMT2A (0.44) | KMT2AMEN1PBRM1HTR2CLMNA | |
| SCHEMBL1639992 | 0.76 | MAPT (0.48) | KMT2AMEN1HTR2CLMNAMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110003119-A | A kind of preparation method of 5- methyl -5- phenyl barbiturates | 山东新华制药股份有限公司 | 2019-07-12 | — | — | CN | disclosed |
| EP-2331649-B1 | METHODS AND COMPOSITIONS FOR POLISHING SILICON-CONTAINING SUBSTRATES | CABOT MICROELECTRONICS CORP (US) | 2018-06-13 | — | — | EP | disclosed |
| US-8597540-B2 | Compositions for polishing silicon-containing substrates | CABOT MICROELECTRONICS CORPORATION (US) | 2013-12-03 | — | — | US | disclosed |
| US-20130200039-A1 | AQUEOUS POLISHING COMPOSITIONS CONTAINING N-SUBSTITUTED DIAZENIUM DIOXIDES AND/OR N'-HYDROXY-DIAZENIUM OXIDE SALTS | BASF SE (DE) | 2013-08-08 | — | — | US | disclosed |
| EP-2614122-A1 | AQUEOUS POLISHING COMPOSITIONS CONTAINING N-SUBSTITUTED DIAZENIUM DIOXIDES AND/OR N'-HYDROXY-DIAZENIUM OXIDE SALTS | BASF SE (DE) | 2013-07-17 | — | — | EP | disclosed |
| EP-2613910-A1 | PROCESS FOR CHEMICALLY MECHANICALLY POLISHING SUBSTRATES CONTAINING SILICON OXIDE DIELECTRIC FILMS AND POLYSILICON AND/OR SILICON NITRIDE FILMS | BASF SE (DE) | 2013-07-17 | — | — | EP | disclosed |
| US-8486169-B2 | Method of polishing a silicon-containing dielectric | CABOT MICROELECTRONICS CORPORATION (US) | 2013-07-16 | — | — | US | disclosed |
| US-20130171824-A1 | PROCESS FOR CHEMICALLY MECHANICALLY POLISHING SUBSTRATES CONTAINING SILICON OXIDE DIELECTRIC FILMS AND POLYSILICON AND/OR SILICON NITRIDE FILMS | BASF SE (DE) | 2013-07-04 | — | — | US | disclosed |
| US-20130168348-A1 | AQUEOUS POLISHING COMPOSITION AND PROCESS FOR CHEMICALLY MECHANICALLY POLISHING SUBSTRATES CONTAINING SILICON OXIDE DIELECTRIC AND POLYSILICON FILMS | BASF SE (DE) | 2013-07-04 | — | — | US | disclosed |
| US-20120280170-A1 | COMPOSITIONS FOR POLISHING SILICON-CONTAINING SUBSTRATES | CABOT MICROELECTRONICS CORPORATION | 2012-11-08 | — | — | US | disclosed |
| US-20090029633-A1 | METHOD OF POLISHING A SILICON-CONTAINING DIELECTRIC | CABOT MICROELECTRONICS CORPORATION (US) | 2009-01-29 | — | — | US | disclosed |
| US-7442645-B2 | Method of polishing a silicon-containing dielectric | CABOT MICROELECTRONICS CORPORATION (US) | 2008-10-28 | — | — | US | disclosed |
| US-20060196848-A1 | Readily deinkable toners | MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT | 2006-09-07 | — | — | US | disclosed |
| US-20060144824-A1 | Method of polishing a silicon-containing dielectric | CABOT MICROELECTRONICS CORPORATION (US) | 2006-07-06 | — | — | US | disclosed |
| US-7071105-B2 | Method of polishing a silicon-containing dielectric | CABOT MICROELECTRONICS CORPORATION (US) | 2006-07-04 | — | — | US | disclosed |
| EP-1601735-A1 | METHOD OF POLISHING A SILICON-CONTAINING DIELECTRIC | Cabot Microelectronics Corporation (US) | 2005-12-07 | — | — | EP | disclosed |
| EP-0989982-B1 | BARBITURIC ACID DERIVATIVES WITH ANTIMETASTATIC AND ANTITUMOR ACTIVITY | ROCHE DIAGNOSTICS GMBH (DE) | 2005-08-17 | — | — | EP | disclosed |
| WO-2004069947-A1 | METHOD OF POLISHING A SILICON-CONTAINING DIELECTRIC | CABOT MICROELECTRONICS CORPORATION (US) | 2004-08-19 | — | — | WO | disclosed |
| US-20040152309-A1 | Method of polishing a silicon-containing dielectric | CABOT MICROELECTRONICS CORPORATION | 2004-08-05 | — | — | US | disclosed |
| US-6335332-B1 | MATRIX METALLOPROTEASE INHIBITORS; CONTRACEPTIVES, ANTIINFLAMMATORY AGENTS | ROCHE DIAGNOSTICS GMBH (DE) | 2002-01-01 | — | — | US | disclosed |