SCHEMBL297263

SCHEMBL297263

C[Si](C)(Cl)O[Si](C)(C)O[Si](C)(C)Cl

nearest known ligand 0.39

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8962546 0.96 ALDH1A1 (0.36) ALDH1A1
SCHEMBL523534 0.96 ALDH1A1 (0.36) ALDH1A1
SCHEMBL2198949 0.96 ALDH1A1 (0.36) ALDH1A1
SCHEMBL19145978 0.89 ALDH1A1 (0.31) ALDH1A1
SCHEMBL8846179 0.89 ALDH1A1 (0.31) ALDH1A1
SCHEMBL8846171 0.87
SCHEMBL9930113 0.87
SCHEMBL22264581 0.87
SCHEMBL22264587 0.87
SCHEMBL297046 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 348 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240258111-A1 Surface Treatment Compositions and Methods FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2024-08-01 US claimed
US-11447642-B2 Methods of using surface treatment compositions FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2022-09-20 US claimed
CN-113637166-B Toughened flame-retardant modified bismaleimide resin and application thereof 江南大学 2022-04-26 CN claimed
US-11174394-B2 Surface treatment compositions and articles containing same FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2021-11-16 US claimed
CN-113637166-A Toughened flame-retardant modified bismaleimide resin and application thereof 江南大学 2021-11-12 CN claimed
EP-3830196-A1 SURFACE TREATMENT COMPOSITIONS AND METHODS FUJIFILM Electronic Materials U.S.A, Inc. (US) 2021-06-09 EP claimed
CN-112899648-A High temperature atomic layer deposition of silicon-containing films 弗萨姆材料美国有限责任公司 2021-06-04 CN claimed
US-20210122925-A1 METHODS OF USING SURFACE TREATMENT COMPOSITIONS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2021-04-29 US claimed
CN-112513192-A Surface treatment composition and method 富士胶片电子材料美国有限公司 2021-03-16 CN claimed
CN-106992114-B High temperature atomic layer deposition of silicon-containing films 弗萨姆材料美国有限责任公司 2021-02-19 CN claimed
EP-0799852-B1 Preparation of polyorganosiloxanes by interfacial polymerization DOW CORNING (US) 2003-09-24 EP claimed
US-6130301-A POLYMERIZING OR COPOLYMERIZING ETHYLENE AND ALPHA-OLEFIN IN PRESENCE OF SOLID CATALYST SYSTEM COMPRISING TITANIUM COMPONENT AND ORGANIC ALUMINUM COMPOUND CATALYST COMPONENT TOSOH CORPORATION (JP) 2000-10-10 US claimed
EP-1006136-A1 Solid-liquid phase interfacial polymerisation DOW CORNING CORPORATION (US) 2000-06-07 EP claimed
US-6046293-A Solid-liquid phase interfacial polymerization UNIVERSITY OF SOUTH AUSTRALIA (AU) 2000-04-04 US claimed
EP-0799852-A2 Preparation of polyorganosiloxanes by interfacial polymerization DOW CORNING CORPORATION (US) 1997-10-08 EP claimed
US-5230976-A Polymeric arylamine silane compounds and imaging members incorporating same XEROX CORPORATION (US) 1993-07-27 US claimed
US-5215855-A Encapsulated toner compositions XEROX CORPORATION (US) 1993-06-01 US claimed
US-5153089-A Encapsulated toner compositions and processes thereof XEROX CORPORATION (US) 1992-10-06 US claimed
US-5118769-A Using coordination catalyst TOYO SODA MANUFACTURING CO., LTD. (JP) 1992-06-02 US claimed
US-4804726-A USING COORDINATION CATALYSTS COMPRISING COMPOUNDS OF MAGNESIUM, TITANIUM, ALUMINUM AND SILICON Ioyo Soda Manufacturing Co., Ltd. (JP) 1989-02-14 US claimed