SCHEMBL297424

SCHEMBL297424

CO[Si](O[Si](OC)(C(C)C)C(C)C)(C(C)C)C(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27615455 0.88
SCHEMBL22675 0.88
SCHEMBL9167042 0.85
SCHEMBL28121257 0.79
SCHEMBL28793317 0.76
SCHEMBL16003927 0.76
SCHEMBL30110262 0.74
SCHEMBL14247931 0.74
SCHEMBL16476526 0.72 ALDH1A1 (0.30)
SCHEMBL1142719 0.72 LMNA (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2287231-B1 Ulltraviolet transmissive polyhedral silsesquioxane polymers PANASONIC CORP (JP) 2012-06-06 EP claimed
US-20110251357-A1 ULTRAVIOLET TRANSMISSIVE POLYHEDRAL SILSESQUIOXANE POLYMERS PANASONIC ELECTRIC WORKS CO., LTD. 2011-10-13 US claimed
EP-2287231-A2 Ulltraviolet transmissive polyhedral silesquioxane polymers Panasonic Electric Works Co., Ltd. (JP) 2011-02-23 EP claimed
US-20060122351-A1 Ultraviolet transmissive polyhedral silsesquioxane polymers PANASONIC ELECTRIC WORKS CO., LTD. (JP) 2006-06-08 US claimed
JP-2080407-A None JP disclosed
US-9766547-B2 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method of manufacturing electronic device using the same, and electronic device FUJIFILM CORPORATION (JP) 2017-09-19 US disclosed
US-9760003-B2 Pattern forming method and actinic-ray- or radiation-sensitive resin composition FUJIFILM CORPORATION (JP) 2017-09-12 US disclosed
US-9709892-B2 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same FUJIFILM CORPORATION (JP) 2017-07-18 US disclosed
US-9557643-B2 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same and electronic device FUJIFILM CORPORATION (JP) 2017-01-31 US disclosed
US-9551935-B2 Pattern forming method and resist composition FUJIFILM CORPORATION (JP) 2017-01-24 US disclosed
US-9527809-B2 Compound, actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern formation method, and method for manufacturing electronic device using same, and electronic device FUJIFILM CORPORATION (JP) 2016-12-27 US disclosed
US-9519214-B2 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, pattern forming method, process for manufacturing electronic device and electronic device FUJIFILM CORPORATION (JP) 2016-12-13 US disclosed
EP-1425407-A2 ENZYMATIC RESOLUTION OF T-BUTYL TAXANE DERIVATIVES Bristol-Myers Squibb Company (US) 2004-06-09 EP disclosed
EP-1391459-A1 Process for the preparation of a paclitaxel C-4 methyl carbonate analog and intermediates BRISTOL-MYERS SQUIBB COMPANY (US) 2004-02-25 EP disclosed
US-20030069415-A1 Enzymatic resolution of t-butyl taxane derivatives BRISTON-MYERS SQUIBB COMPANY 2003-04-10 US disclosed
EP-1206461-A4 PROCESS FOR THE PREPARATION OF A PACLITAXEL C-4 METHYL CARBONATE ANALOG BRISTOL MYERS SQUIBB CO (US) 2003-03-26 EP disclosed
WO-2003016543-A2 ENZYMATIC RESOLUTION OF T-BUTYL TAXANE DERIVATIVES BRISTOL-MYERS SQUIBB COMPANY (US) 2003-02-27 WO disclosed
EP-1206461-A1 Process for the preparation of a paclitaxel c-4 methyl carbonate analog BRISTOL-MYERS SQUIBB COMPANY (US) 2002-05-22 EP disclosed
WO-2001010856-A1 PROCESS FOR THE PREPARATION OF A PACLITAXEL C-4 METHYL CARBONATE ANALOG BRISTOL-MYERS SQUIBB COMPANY (US) 2001-02-15 WO disclosed
JP-H0280407-A POLYMERIZATION OF OLEFIN SHOWA DENKO KK 1990-03-20 JP disclosed