SCHEMBL2975722

SCHEMBL2975722

C=C(CCC(F)(F)C(F)F)C(=O)OC

nearest known ligand 0.34

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.34
POLB P06746 1/20 0.32
GAA P10253 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.31
MAPT P10636 1/20 0.30
HTT P42858 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9357767 0.84 ALDH1A1 (0.44) ALDH1A1
SCHEMBL27580564 0.81 ALDH1A1 (0.37) ALDH1A1POLBGAAMAPTHTT
SCHEMBL3992009 0.81 ALDH1A1 (0.39) ALDH1A1MAPT
SCHEMBL210760 0.77 TET2 (0.38)
SCHEMBL25858192 0.77 TSHR (0.48) ALDH1A1POLBGAAMAPTHTT
SCHEMBL21777040 0.75 ALDH1A1 (0.34) ALDH1A1MAPT
SCHEMBL28055342 0.75 ALDH1A1 (0.34) ALDH1A1MAPT
SCHEMBL27800565 0.75 ALDH1A1 (0.41) ALDH1A1
SCHEMBL28039689 0.74 ALDH1A1 (0.33) ALDH1A1
SCHEMBL11603931 0.73 ALDH1A1 (0.52) ALDH1A1GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8247165-B2 Upper layer film forming composition for liquid immersion and method of forming photoresist pattern JSR CORPORATION (JP) 2012-08-21 US disclosed
US-7781142-B2 Copolymer and top coating composition JSR CORPORATION (JP) 2010-08-24 US disclosed
US-20080038661-A1 Copolymer and Top Coating Composition JSR CORPORATION (JP) 2008-02-14 US disclosed
US-20070269734-A1 Uper Layer Film Forming Composition for Liquid Immersion and Method of Forming Photoresist Pattern JSR CORPORATION (JP) 2007-11-22 US disclosed