Anthracene

Anthracene

SCHEMBL29778690

C=C(C)C(=O)O.c1ccc2cc3ccccc3cc2c1

nearest known ligand 0.45

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 9/20 0.45
ALDH1A1 P00352 7/20 0.45
HPGD P15428 6/20 0.45
HSD17B10 Q99714 3/20 0.45
MEN1 O00255 3/20 0.45
KMT2A Q03164 3/20 0.45
CYP1A2 P05177 2/20 0.45
CYP2C19 P33261 2/20 0.45
GLA P06280 1/20 0.45
ELANE P08246 1/20 0.43
IDO1 P14902 1/20 0.42
CES2 O00748 2/20 0.41
CES1 P23141 2/20 0.41
MAPT P10636 2/20 0.41
DAO P14920 1/20 0.41
SRD5A2 P31213 1/20 0.41
POLB P06746 1/20 0.41
CASP6 P55212 1/20 0.41
SMN1; SMN2 Q16637 2/20 0.40
AKR1C3 P42330 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Anthracene SCHEMBL1711588 1.00 KDM4E (0.45) KDM4EALDH1A1HPGDHSD17B10MEN1
Methacrylic Acid SCHEMBL27952884 0.98 KDM4E (0.43) KDM4EALDH1A1HPGDHSD17B10MEN1
Naphthalene SCHEMBL3422143 0.90 KDM4E (0.47) KDM4EALDH1A1HPGDHSD17B10MEN1
Naphthalene SCHEMBL3422961 0.90 KDM4E (0.47) KDM4EALDH1A1HPGDHSD17B10MEN1
Naphthalene SCHEMBL2138200 0.90 KDM4E (0.47) KDM4EALDH1A1HPGDHSD17B10MEN1
Naphthalene SCHEMBL28211669 0.88 KDM4E (0.45) KDM4EALDH1A1HPGDHSD17B10MEN1
Anthracene SCHEMBL27835058 0.87 ALDH1A1 (0.54) KDM4EALDH1A1HPGDHSD17B10MEN1
Acridine SCHEMBL27555574 0.86 ALDH1A1 (0.58) KDM4EALDH1A1HPGDMEN1KMT2A
Methacrylic Acid SCHEMBL27818242 0.85 ALDH1A1 (0.52) KDM4EALDH1A1HPGDHSD17B10MEN1
Methacrylic Acid SCHEMBL29733321 0.85 ALDH1A1 (0.46) KDM4EALDH1A1HPGDHSD17B10MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11940730-B2 Photoresist compositions and pattern formation methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2024-03-26 US disclosed
US-20220229366-A1 PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2022-07-21 US disclosed
CN-114690557-A Photoresist composition and pattern forming method 罗门哈斯电子材料有限责任公司 2022-07-01 CN disclosed