Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.47 |
| ▸ | HPGD | P15428 | 4/20 | 0.43 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.43 |
| ▸ | CES2 | O00748 | 2/20 | 0.42 |
| ▸ | CES1 | P23141 | 2/20 | 0.42 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.42 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.42 |
| ▸ | ELANE | P08246 | 1/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.41 |
| ▸ | NAPRT | Q6XQN6 | 2/20 | 0.41 |
| ▸ | MAPT | P10636 | 3/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.40 |
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
| ▸ | XBP1 | P17861 | 1/20 | 0.40 |
| ▸ | ATM | Q13315 | 1/20 | 0.40 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.40 |
| ▸ | DAO | P14920 | 2/20 | 0.39 |
| ▸ | SRD5A2 | P31213 | 1/20 | 0.39 |
| ▸ | NOTUM | Q6P988 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Naphthalene SCHEMBL3422143 | 1.00 | KDM4E (0.47) | KDM4EALDH1A1HPGDAKR1C3CES2 | |
| Naphthalene SCHEMBL3422961 | 1.00 | KDM4E (0.47) | KDM4EALDH1A1HPGDAKR1C3CES2 | |
| Naphthalene SCHEMBL28211669 | 0.97 | KDM4E (0.45) | KDM4EALDH1A1HPGDAKR1C3CES2 | |
| Anthracene SCHEMBL1711588 | 0.90 | KDM4E (0.45) | KDM4EALDH1A1HPGDAKR1C3CES2 | |
| Anthracene SCHEMBL29778690 | 0.90 | KDM4E (0.45) | KDM4EALDH1A1HPGDAKR1C3CES2 | |
| Methacrylic Acid SCHEMBL27952884 | 0.88 | KDM4E (0.43) | KDM4EALDH1A1HPGDAKR1C3CES2 | |
| Phenanthrene SCHEMBL670439 | 0.86 | ALDH1A1 (0.53) | KDM4EALDH1A1HPGDCYP2A6HSD17B10 | |
| Phenanthrene SCHEMBL27623638 | 0.86 | ALDH1A1 (0.53) | KDM4EALDH1A1HPGDCYP2A6HSD17B10 | |
| Biphenyl SCHEMBL29116448 | 0.85 | MAPT (0.44) | KDM4EALDH1A1HPGDAKR1C3ALOX12 | |
| Naphthalene SCHEMBL7560846 | 0.85 | ALDH1A1 (0.38) | KDM4EALDH1A1HPGDAKR1C3CES2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 169 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116510698-B | Adsorption material and preparation method and application thereof | 中国石油化工股份有限公司 | 2025-06-03 | — | — | CN | claimed |
| CN-118667399-B | Preparation method of high-adhesion automobile repair paint | 英德市佐桐化学品有限公司 | 2024-11-29 | — | — | CN | claimed |
| CN-118667399-A | Preparation method of high-adhesion automobile repair paint | 英德市佐桐化学品有限公司 | 2024-09-20 | — | — | CN | claimed |
| CN-117777387-A | Block resin with narrow molecular weight distribution for photoresist and preparation method thereof | 苏州威迈芯材半导体有限公司 | 2024-03-29 | — | — | CN | claimed |
| CN-112980549-B | High viscosity index comb polymer viscosity modifiers and methods of using the same to alter lubricant viscosity | 英菲诺姆国际有限公司 | 2023-12-15 | — | — | CN | claimed |
| CN-116510698-A | Adsorption material and preparation method and application thereof | 中国石油化工股份有限公司 | 2023-08-01 | — | — | CN | claimed |
| CN-116449648-A | Femtosecond laser direct-writing photoresist with high precision and low surface roughness and application thereof | 之江实验室 | 2023-07-18 | — | — | CN | claimed |
| CN-113201372-B | Naphthalene-containing diesel pour point depressant composition and preparation and application thereof | 上海应用技术大学 | 2023-05-30 | — | — | CN | claimed |
| US-11205778-B2 | Conductive polymer emulsion | THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) | 2021-12-21 | — | — | US | claimed |
| CN-113201372-A | Naphthalene-containing diesel pour point depressant composition and preparation and application thereof | 上海应用技术大学 | 2021-08-03 | — | — | CN | claimed |
| EP-2399957-B1 | COMPOSITE CONDUCTIVE POLYMER COMPOSITION, METHOD FOR PRODUCING SAME, SOLUTION CONTAINING THE COMPOSITION, AND USE OF THE COMPOSITION | SOKEN KAGAKU KK (JP) | 2016-11-02 | — | — | EP | claimed |
| US-20030078354-A1 | Novel beta-oxo compounds and their use in photoresist | ARCH SPECIALTY CHEMICALS, INC. (US) | 2003-04-24 | — | — | US | claimed |
| WO-2002068527-A2 | NOVEL β-OXO COMPOUNDS AND THEIR USE IN PHOTORESIST | ARCH SPECIALTY CHEMICALS, INC. (US) | 2002-09-06 | — | — | WO | claimed |
| CN-122051377-A | Battery monomer, preparation method thereof, battery device and energy storage device | 浙江晶科储能有限公司 | 2026-05-15 | — | — | CN | disclosed |
| CN-116510698-B | Adsorption material and preparation method and application thereof | 中国石油化工股份有限公司 | 2025-06-03 | — | — | CN | disclosed |
| CN-119866360-A | Polymer composition and single layer phase difference material | 日产化学株式会社 | 2025-04-22 | — | — | CN | disclosed |
| WO-2002068527-A2 | NOVEL β-OXO COMPOUNDS AND THEIR USE IN PHOTORESIST | ARCH SPECIALTY CHEMICALS, INC. (US) | 2002-09-06 | — | — | WO | disclosed |
| EP-0379315-B1 | Electro-optical liquid crystal device | SEIKO EPSON CORP (JP) | 1994-05-18 | — | — | EP | disclosed |
| US-5142393-A | ELECTRO-OPTICAL LIQUID CRYSTAL DEVICE WITH COMPENSATOR HAVING NEGATIVE OPTICAL ANISOTROPY | SEIKO EPSON CORPORATION (JP) | 1992-08-25 | — | — | US | disclosed |
| EP-0379315-A2 | Electro-optical liquid crystal device | SEIKO EPSON CORPORATION (JP) | 1990-07-25 | — | — | EP | disclosed |