Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 4/20 | 0.53 |
| ▸ | MEN1 | O00255 | 3/20 | 0.53 |
| ▸ | MAPT | P10636 | 3/20 | 0.48 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.48 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.46 |
| ▸ | GAA | P10253 | 3/20 | 0.46 |
| ▸ | POLB | P06746 | 3/20 | 0.46 |
| ▸ | TP53 | P04637 | 1/20 | 0.45 |
| ▸ | RAB9A | P51151 | 2/20 | 0.45 |
| ▸ | CXCR1 | P25024 | 1/20 | 0.45 |
| ▸ | CXCR2 | P25025 | 1/20 | 0.45 |
| ▸ | NPC1 | O15118 | 1/20 | 0.44 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.44 |
| ▸ | LMNA | P02545 | 1/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.44 |
| ▸ | KCNMA1 | Q12791 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27040969 | 0.91 | HDAC1 (0.49) | KMT2AMEN1MAPTMAPK1ALDH1A1 | |
| SCHEMBL1057098 | 0.87 | POLB (0.51) | KMT2AMEN1MAPTALDH1A1GAA | |
| SCHEMBL15969764 | 0.87 | ALDH1A1 (0.48) | KMT2AMEN1MAPTMAPK1ALDH1A1 | |
| SCHEMBL29790015 | 0.85 | KMT2A (0.53) | KMT2AMEN1MAPTMAPK1ALDH1A1 | |
| SCHEMBL14962143 | 0.82 | ALDH1A1 (0.42) | KMT2AMEN1MAPTMAPK1ALDH1A1 | |
| SCHEMBL16924653 | 0.82 | ALDH1A1 (0.42) | KMT2AMEN1MAPTMAPK1ALDH1A1 | |
| SCHEMBL15969165 | 0.82 | ALDH1A1 (0.44) | KMT2AMEN1MAPTMAPK1ALDH1A1 | |
| SCHEMBL6672269 | 0.81 | RAB9A (0.61) | KMT2AMEN1MAPTMAPK1ALDH1A1 | |
| SCHEMBL15970433 | 0.81 | ALDH1A1 (0.50) | KMT2AMEN1MAPTMAPK1ALDH1A1 | |
| SCHEMBL2472414 | 0.81 | TDP1 (0.43) | KMT2AMEN1MAPTMAPK1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240030030-A1 | METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION | JSR CORPORATION (JP) | 2024-01-25 | — | — | US | disclosed |
| WO-2022209816-A1 | METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE AND COMPOSITION FOR FORMING RESIST UNDERLAYER FILM | JSR株式会社 | 2022-10-06 | — | — | WO | disclosed |
| WO-2022202402-A1 | SEMICONDUCTOR SUBSTRATE PRODUCTION METHOD AND COMPOSITION FOR FORMING RESIST UNDERLAYER FILM | JSR株式会社 | 2022-09-29 | — | — | WO | disclosed |
| CN-107561863-B | Positive photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2022-09-16 | — | — | CN | disclosed |
| CN-108732831-B | Resin composition, substrate and element comprising same, and method for producing same | JSR株式会社 | 2022-08-16 | — | — | CN | disclosed |