SCHEMBL2979378

SCHEMBL2979378

CC(Cc1ccccc1O)(c1ccccc1O)c1ccccc1O

nearest known ligand 0.54

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.54
ALDH1A1 P00352 1/20 0.54
TDP1 Q9NUW8 1/20 0.54
HSPA5 P11021 1/20 0.46
IDO1 P14902 2/20 0.44
CYP2D6 P10635 1/20 0.42
HIF1A Q16665 1/20 0.42
TAAR1 Q96RJ0 1/20 0.41
AKR1B1 P15121 1/20 0.41
CA12 O43570 5/20 0.39
CA2 P00918 5/20 0.39
CA9 Q16790 4/20 0.38
MPO P05164 1/20 0.38
KEAP1 Q14145 1/20 0.38
HTR1A P08908 1/20 0.38
KDM4E B2RXH2 1/20 0.37
HSD17B10 Q99714 1/20 0.37
MAPT P10636 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29779511 1.00 TSHR (0.54) TSHRALDH1A1TDP1HSPA5IDO1
SCHEMBL23861371 0.83 CYP1A2 (0.46) TSHRALDH1A1TDP1CYP2D6AKR1B1
SCHEMBL30374559 0.81 ESR1 (0.53) TSHRALDH1A1TDP1KEAP1KDM4E
SCHEMBL114335 0.79 HSPA5 (0.50) TSHRALDH1A1TDP1HSPA5IDO1
SCHEMBL674324 0.79 HSPA5 (0.54) TSHRALDH1A1TDP1HSPA5IDO1
SCHEMBL3967693 0.79 ALDH1A1 (0.62) TSHRALDH1A1TDP1HSPA5IDO1
SCHEMBL9402716 0.78 HSPA5 (0.48) TSHRALDH1A1TDP1HSPA5IDO1
SCHEMBL28813911 0.77 TSHR (0.55) TSHRALDH1A1TDP1HSPA5IDO1
SCHEMBL21483748 0.77 HSPA5 (0.52) TSHRALDH1A1TDP1HSPA5IDO1
SCHEMBL3152876 0.77 TSHR (0.60) TSHRALDH1A1TDP1HSPA5HIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 123 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11640111-B2 Photosensitive resin composition and cured film comprising the same LG CHEM, LTD. (KR) 2023-05-02 US disclosed
CN-110325914-A PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM COMPRISING SAME 株式会社LG化学 2019-10-11 CN disclosed
EP-1199603-B1 Positive photosensitive composition FUJIFILM CORP (JP) 2016-11-30 EP disclosed
EP-1158363-B1 Positive resist composition and onium salts of saccharin derivatives FUJIFILM CORP (JP) 2014-01-22 EP disclosed
US-7812194-B2 Positive photosensitive composition FUJIFILM CORPORATION (JP) 2010-10-12 US disclosed
US-20100255419-A1 POSITIVE PHOTOSENSITIVE COMPOSITION FUJIFILM CORPORATION (JP) 2010-10-07 US disclosed
US-7776512-B2 Positive photosensitive composition FUJIFILM CORPORATION (JP) 2010-08-17 US disclosed
EP-1465010-B1 Positive resist composition FUJIFILM CORP (JP) 2009-10-21 EP disclosed
US-20090148791-A1 POSITIVE PHOTOSENSITIVE COMPOSITION FUJIFILM CORPORATION (JP) 2009-06-11 US disclosed
US-7435526-B2 Positive photosensitive composition FUJIFILM CORPORATION (JP) 2008-10-14 US disclosed
US-5529881-A ALKALI-SOLUBLE RESIN AND 1,2-NAPHTHOQUINONEDIAZIDE SULFONIC ACID ESTER OF SPECIFIED POLYHYDROXY COMPOUND AS PHOTOSENSITIVE COMPOUND FUJI PHOTO FILM CO., LTD. (JP) 1996-06-25 US disclosed
US-5523396-A ESTERIFICATION OF POLYHYDROXY COMPOUND WITH 1,2-NAPHTHOQUINONEDIAZIDE-5-SULFONYL CHLORIDE IN THE PRESENCE OF A BASIC CATALYST FUJI PHOTO FILM CO., LTD. (JP) 1996-06-04 US disclosed
EP-0710886-A1 Positive photoresist composition FUJI PHOTO FILM CO., LTD. (JP) 1996-05-08 EP disclosed
EP-0709736-A1 Positive chemically amplified resist composition and method for producing compounds used therein FUJI PHOTO FILM CO., LTD. (JP) 1996-05-01 EP disclosed
EP-0706089-A2 Process for synthesizing quinonediazide ester and positive working photoresist containing the same FUJI PHOTO FILM CO., LTD. (JP) 1996-04-10 EP disclosed
US-5494773-A MIXTURE WITH A 1,2-QUINONEDIAZIDE COMPOUND FUJI PHOTO FILM CO., LTD. (JP) 1996-02-27 US disclosed
EP-0684521-A1 Positive working photosensitive compositions FUJI PHOTO FILM CO., LTD. (JP) 1995-11-29 EP disclosed
EP-0677789-A1 Positive photoresist composition Fuji Photo Film Co., Ltd. (JP) 1995-10-18 EP disclosed
EP-0672952-A1 Positive photoresist composition FUJI PHOTO FILM CO., LTD. (JP) 1995-09-20 EP disclosed
EP-0658807-A1 Positive-working photoresist composition FUJI PHOTO FILM CO., LTD. (JP) 1995-06-21 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100255419-A1 POSITIVE PHOTOSENSITIVE COMPOSITION RARA, SUN2, RARG TSHR 4674/4885ALDH1A1 2704/4885TDP1 1232/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.