SCHEMBL29847342

SCHEMBL29847342

O=S(=O)(c1ccc(-c2ccccc2Sc2ccccc2)cc1)c1ccc(-c2ccccc2Sc2ccccc2)cc1

nearest known ligand 0.49

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.49
NSD2 O96028 1/20 0.49
MAPT P10636 1/20 0.49
MAPK1 P28482 1/20 0.49
PTGS2 P35354 9/20 0.44
HTR6 P50406 1/20 0.43
ADORA2A P29274 1/20 0.40
CA12 O43570 3/20 0.39
CA1 P00915 3/20 0.39
CA2 P00918 3/20 0.39
CA9 Q16790 3/20 0.39
SIRT1 Q96EB6 1/20 0.39
PTGS1 P23219 3/20 0.38
MMP3 P08254 1/20 0.37
MMP8 P22894 1/20 0.37
MMP13 P45452 1/20 0.37
GALR1 P47211 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28818648 1.00 KDM4E (0.49) KDM4ENSD2MAPTMAPK1PTGS2
SCHEMBL7737500 0.81 MAPK1 (0.48) KDM4ENSD2MAPTMAPK1ADORA2A
SCHEMBL9568786 0.81 MAPT (0.48) KDM4ENSD2MAPTMAPK1ADORA2A
SCHEMBL17065474 0.81 MAPT (0.48) KDM4ENSD2MAPTMAPK1ADORA2A
SCHEMBL10706537 0.81 MAPT (0.48) KDM4ENSD2MAPTMAPK1ADORA2A
SCHEMBL6550775 0.81 MAPT (0.52) KDM4ENSD2MAPTMAPK1ADORA2A
SCHEMBL15418953 0.81 PTGS2 (0.55) KDM4EPTGS2HTR6CA12CA1
SCHEMBL14712815 0.80 PTGS2 (0.64) PTGS2PTGS1
Hydrogen Sulfide SCHEMBL27169707 0.79 MAPT (0.50) KDM4ENSD2MAPTMAPK1ADORA2A
SCHEMBL811840 0.79 PTGS2 (0.47) KDM4EMAPTPTGS2HTR6CA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114901638-B Sulfonium salt, photoacid generator, curable composition, and resist composition 三亚普罗股份有限公司 2024-10-29 CN disclosed
CN-114901638-A Sulfonium salt, photoacid generator, curable composition, and resist composition 三亚普罗股份有限公司 2022-08-12 CN disclosed