SCHEMBL298653

SCHEMBL298653

O=C(NO)c1ccccc1F

nearest known ligand 0.67

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 3/20 0.67
MEN1 O00255 2/20 0.64
KMT2A Q03164 2/20 0.64
TDP1 Q9NUW8 1/20 0.64
NPC1 O15118 4/20 0.62
ALDH1A1 P00352 3/20 0.62
HPGD P15428 2/20 0.62
MAPT P10636 1/20 0.62
CES2 O00748 1/20 0.60
CES1 P23141 1/20 0.60
SMN1; SMN2 Q16637 3/20 0.59
KDM4E B2RXH2 1/20 0.59
MPO P05164 1/20 0.59
HIF1A Q16665 1/20 0.59
LMNA P02545 2/20 0.58
ALOX15 P16050 1/20 0.56
RAB9A P51151 2/20 0.55
HTT P42858 1/20 0.55
HDAC1 Q13547 1/20 0.54
HDAC7 Q8WUI4 1/20 0.54

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29382881 1.00 GAA (0.67) GAAMEN1KMT2ATDP1NPC1
Hydrochloric Acid SCHEMBL28973500 0.98 GAA (0.64) GAAMEN1KMT2ATDP1NPC1
SCHEMBL6450415 0.84 ALDH1A1 (0.70) GAAMEN1KMT2ATDP1NPC1
SCHEMBL1331243 0.83 GAA (0.73) GAAALDH1A1SMN1; SMN2KDM4EMPO
SCHEMBL5384443 0.83 CES2 (0.63) GAAMEN1KMT2ATDP1NPC1
SCHEMBL27819669 0.80 HDAC1 (0.57) GAAMEN1KMT2ATDP1NPC1
SCHEMBL255025 0.80 GAA (1.00) GAAMEN1KMT2ATDP1NPC1
SCHEMBL540770 0.80 GAA (0.64) GAAMEN1KMT2ATDP1NPC1
SCHEMBL21779849 0.80 GAA (0.64) GAAMEN1KMT2ATDP1NPC1
SCHEMBL2222719 0.80 GAA (0.64) GAAMEN1KMT2ATDP1NPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 71 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11981648-B2 Method for the synthesis of 3-R-1,4,2-dioxazol-5-ones TESLA, INC. (US) 2024-05-14 US claimed
CN-117597628-A Method for forming pattern 三星SDI株式会社 2024-02-23 CN claimed
US-20240019784-A1 METAL CONTAINING PHOTORESIST DEVELOPER COMPOSITION, AND METHOD OF FORMING PATTERNS INCLUDING STEP OF DEVELOPING USING THE COMPOSITION SAMSUNG SDI CO., LTD. (KR) 2024-01-18 US claimed
CN-117348341-A Metal-containing photoresist developer composition and pattern forming method 三星SDI株式会社 2024-01-05 CN claimed
WO-2023097386-A1 SELECTIVE HDAC6-INHIBITING N-ACYLHYDRAZONE COMPOUNDS, METHODS FOR PRODUCING SAME, COMPOSITIONS, USES, TREATMENT METHODS AND KITS EUROFARMA LABORATÓRIOS S.A (BR) 2023-06-08 WO claimed
US-20230029852-A1 METHOD FOR THE SYNTHESIS OF 3-R-1,4,2-DIOXAZOL-5-ONES PANASONIC HOLDINGS CORPORATION (JP) 2023-02-02 US claimed
EP-3624804-B1 HISTONE DEACETYLASES (HDACS) INHIBITORS ANNJI PHARM CO LTD (TW) 2022-02-16 EP claimed
US-20220008414-A1 PHARMACEUTICAL COMPOSITION COMPRISING HISTONE DEACETYLASE 6 INHIBITORS CHONG KUN DANG PHARMACEUTICAL CORP. (KR) 2022-01-13 US claimed
CN-113385305-A Halogenated benzohydroxamic acid collecting agent and application thereof in mineral flotation 广东省科学院资源利用与稀土开发研究所 2021-09-14 CN claimed
US-10287255-B2 Compounds as histone deacetylase 6 inhibitors and pharmaceutical compositions comprising the same CHONG KUN DANG PHARMACEUTICAL CORP. (KR) 2019-05-14 US claimed
US-20170096405-A1 NOVEL COMPOUNDS AS HISTONE DEACETYLASE 6 INHIBITORS AND PHARMACEUTICAL COMPOSITIONS COMPRISING THE SAME CHONG KUN DANG PHARMACEUTICAL CORP. (KR) 2017-04-06 US claimed
CN-119490449-A Hydroxamic acid compound containing N-benzyl-2- (5-phenylpyridin-2-yl) acetamide and preparation method and application thereof 沈阳药科大学 2025-02-21 CN disclosed
CN-114195737-B 5- (Phenyl) -1,3,2, 4-dioxathiazole 2-oxide and preparation thereof 张家港市国泰华荣化工新材料有限公司 2025-01-24 CN disclosed
EP-4397656-A2 HDAC6 INHIBITORS AND IMAGING AGENTS The General Hospital Corporation (US) 2024-07-10 EP disclosed
CN-115160097-B Method for synthesizing amide by reducing N-O bond by thioacetic acid 温州大学 2024-05-28 CN disclosed
US-20060144824-A1 Method of polishing a silicon-containing dielectric CABOT MICROELECTRONICS CORPORATION (US) 2006-07-06 US disclosed
US-7071105-B2 Method of polishing a silicon-containing dielectric CABOT MICROELECTRONICS CORPORATION (US) 2006-07-04 US disclosed
EP-1601735-A1 METHOD OF POLISHING A SILICON-CONTAINING DIELECTRIC Cabot Microelectronics Corporation (US) 2005-12-07 EP disclosed
WO-2004069947-A1 METHOD OF POLISHING A SILICON-CONTAINING DIELECTRIC CABOT MICROELECTRONICS CORPORATION (US) 2004-08-19 WO disclosed
US-20040152309-A1 Method of polishing a silicon-containing dielectric CABOT MICROELECTRONICS CORPORATION 2004-08-05 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10287255-B2 Compounds as histone deacetylase 6 inhibitors and pharmaceutical compositions comprising the same HDAC6, HDAC1, HDAC11 GAA 195/4885MEN1 2537/4885KMT2A 43/4885
US-20220008414-A1 PHARMACEUTICAL COMPOSITION COMPRISING HISTONE DEACETYLASE 6 INHIBITORS HDAC6, HDAC1, HDAC3 GAA 24/4885MEN1 4680/4885KMT2A 543/4885
US-11981648-B2 Method for the synthesis of 3-R-1,4,2-dioxazol-5-ones CYP4X1, DDO, CYP4B1 GAA 1385/4885MEN1 1474/4885KMT2A 1995/4885
US-20170096405-A1 NOVEL COMPOUNDS AS HISTONE DEACETYLASE 6 INHIBITORS AND PHARMACEUTICAL COMPOSITIONS COMPRISING THE SAME HDAC6, HDAC1, HDAC5 GAA 139/4885MEN1 3278/4885KMT2A 55/4885
US-20230029852-A1 METHOD FOR THE SYNTHESIS OF 3-R-1,4,2-DIOXAZOL-5-ONES CYP4X1, DDO, CYP4B1 GAA 1385/4885MEN1 1474/4885KMT2A 1995/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.