SCHEMBL2990575

SCHEMBL2990575

Cc1cc(N)cc(C)c1C(C)(C)c1cccc(C(C)(C)c2c(C)cc(N)cc2C)c1

nearest known ligand 0.42

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 3/20 0.42
ESR2 Q92731 2/20 0.42
ALDH1A1 P00352 2/20 0.37
TSHR P16473 2/20 0.36
MAPK1 P28482 1/20 0.36
POLB P06746 1/20 0.34
RAPGEF4 Q8WZA2 2/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
PDE10A Q9Y233 1/20 0.33
CASP1 P29466 2/20 0.32
ACHE P22303 1/20 0.32
CYP3A4 P08684 1/20 0.32
RECQL P46063 1/20 0.32
CNR1 P21554 1/20 0.32
CNR2 P34972 1/20 0.32
CD44 P16070 1/20 0.31
KIF11 P52732 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3004902 0.85 ALDH1A1 (0.41) ESR1ESR2ALDH1A1TSHRMAPK1
SCHEMBL3006208 0.80 ALDH1A1 (0.43) ESR1ALDH1A1TSHRMAPK1POLB
SCHEMBL10492681 0.79 ESR1 (0.37) ESR1ESR2ALDH1A1TSHRMAPK1
SCHEMBL3000871 0.77 ALDH1A1 (0.43) ESR1ESR2ALDH1A1TSHRMAPK1
SCHEMBL9245317 0.75 POLB (0.52) ESR1ESR2ALDH1A1TSHRMAPK1
SCHEMBL203901 0.74 TSHR (0.58) ESR1ESR2ALDH1A1TSHRMAPK1
SCHEMBL29408726 0.74 TSHR (0.58) ESR1ESR2ALDH1A1TSHRMAPK1
SCHEMBL10447989 0.73 ESR1 (0.53) ESR1ESR2ALDH1A1TSHRMAPK1
SCHEMBL16584127 0.73 ESR1 (0.49) ESR1ESR2ALDH1A1TSHRMAPK1
SCHEMBL137216 0.72 ESR1 (0.63) ESR1ESR2ALDH1A1TSHRMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11885694-B2 Temperature sensor element SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-01-30 US disclosed
US-11674920-B2 Moisture-sensitive film and sensor using same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-06-13 US disclosed
US-20220065708-A1 TEMPERATURE SENSOR ELEMENT SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2022-03-03 US disclosed
US-11261303-B2 Polyimide resin film and method for producing polyimide resin film MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2022-03-01 US disclosed
US-20210381905-A1 TEMPERATURE SENSOR ELEMENT SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-12-09 US disclosed
US-20210364368-A1 TEMPERATURE SENSOR ELEMENT SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-11-25 US disclosed
EP-3489284-B1 POLYIMIDE RESIN FILM AND METHOD FOR PRODUCING POLYIMIDE RESIN FILM MITSUBISHI GAS CHEMICAL CO (JP) 2021-06-09 EP disclosed
US-20210055247-A1 MOISTURE-SENSITIVE FILM AND SENSOR USING SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-02-25 US disclosed
WO-2020162418-A1 COLORLESS TRANSPARENT POLYIMIDE FILM 三菱瓦斯化学株式会社 2020-08-13 WO disclosed
US-20190185631-A1 POLYIMIDE RESIN FILM AND METHOD FOR PRODUCING POLYIMIDE RESIN FILM MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2019-06-20 US disclosed
EP-3489284-A1 POLYIMIDE RESIN FILM AND METHOD FOR PRODUCING POLYIMIDE RESIN FILM Mitsubishi Gas Chemical Company, Inc. (JP) 2019-05-29 EP disclosed
US-9193850-B2 Nanocomposite, process for preparing the same, and surface emitting device SAMSUNG ELECTRONICS CO., LTD. (KR) 2015-11-24 US disclosed
US-20130037786-A1 NANOCOMPOSITE, PROCESS FOR PREPARING THE SAME, AND SURFACE EMITTING DEVICE SAMSUNG ELECTRONICS CO., LTD. (KR) 2013-02-14 US disclosed
US-8357322-B2 Process and apparatus for production of colorless transparent resin film MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2013-01-22 US disclosed
EP-2147766-B1 PROCESS AND APPARATUS FOR PRODUCTION OF COLORLESS TRANSPARENT RESIN FILM MITSUBISHI GAS CHEMICAL CO (JP) 2012-08-01 EP disclosed
US-20100187719-A1 PROCESS AND APPARATUS FOR PRODUCTION OF COLORLESS TRANSPARENT RESIN FILM MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2010-07-29 US disclosed
EP-2147766-A1 PROCESS AND APPARATUS FOR PRODUCTION OF COLORLESS TRANSPARENT RESIN FILM Mitsubishi Gas Chemical Company, Inc. (JP) 2010-01-27 EP disclosed