SCHEMBL29907979

SCHEMBL29907979

Cc1ccc(S(=O)(=O)N(C(=O)OCC2c3ccccc3-c3ccccc32)[C@@H](Cc2c[nH]cn2)C(=O)O)cc1

nearest known ligand 0.38

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
MDM2 Q00987 1/20 0.38
CASP3 P42574 3/20 0.37
KEAP1 Q14145 2/20 0.34
MDM4 O15151 2/20 0.33
TP53 P04637 2/20 0.33
BMP1 P13497 1/20 0.33
KMT2A Q03164 1/20 0.33
KDM4E B2RXH2 1/20 0.33
LMNA P02545 1/20 0.33
MAPT P10636 1/20 0.33
HTT P42858 1/20 0.33
NFE2L2 Q16236 1/20 0.33
ATM Q13315 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28836306 1.00 MDM2 (0.38) MDM2CASP3KEAP1MDM4TP53
SCHEMBL28836284 0.84 LMNA (0.41) KEAP1LMNAMAPTNFE2L2
SCHEMBL29908082 0.84 LMNA (0.41) KEAP1LMNAMAPTNFE2L2
SCHEMBL28737117 0.82 KMT2A (0.37) MDM2CASP3MDM4TP53KMT2A
SCHEMBL16166754 0.82 KMT2A (0.37) MDM2CASP3MDM4TP53KMT2A
SCHEMBL8892691 0.82 KMT2A (0.38) MDM2CASP3MDM4TP53KMT2A
SCHEMBL28836238 0.82 C5AR1 (0.35) KEAP1KMT2ANFE2L2ATM
SCHEMBL29908045 0.82 C5AR1 (0.35) KEAP1KMT2ANFE2L2ATM
SCHEMBL28952548 0.81 ADAMTS5 (0.34) KEAP1KMT2ANFE2L2ATM
SCHEMBL29908090 0.81 ADAMTS5 (0.34) KEAP1KMT2ANFE2L2ATM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115053184-B Composition for forming EUV resist underlayer film 日产化学株式会社 2024-12-06 CN disclosed
CN-115053184-A Composition for forming EUV resist underlayer film 日产化学株式会社 2022-09-13 CN disclosed