⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4130638 | 0.94 | — | — | |
| SCHEMBL6862011 | 0.69 | — | — | |
| SCHEMBL975744 | 0.67 | — | — | |
| SCHEMBL7697307 | 0.59 | — | — | |
| SCHEMBL23908715 | 0.56 | — | — | |
| SCHEMBL7694325 | 0.56 | — | — | |
| SCHEMBL25653 | 0.54 | — | — | |
| SCHEMBL3788025 | 0.50 | — | — | |
| SCHEMBL2088 | 0.47 | — | — | |
| SCHEMBL2326 | 0.47 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113527101-B | Novel compound, polymer, process for producing the same, photosensitive resin composition, pattern forming process, cured film, and electronic component | 信越化学工业株式会社 | 2024-04-23 | — | — | CN | disclosed |
| EP-3896114-B1 | POLYIMIDE RESIN AND METHOD OF PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD AND METHOD OF FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHINETSU CHEMICAL CO (JP) | 2023-10-18 | — | — | EP | disclosed |
| US-11572442-B2 | Compound, polyimide resin and method of producing the same, photosensitive resin composition, patterning method and method of forming cured film, interlayer insulating film, surface protective film, and electronic component | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2023-02-07 | — | — | US | disclosed |
| US-11261303-B2 | Polyimide resin film and method for producing polyimide resin film | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2022-03-01 | — | — | US | disclosed |
| CN-113527101-A | Novel compound, polymer and method for producing same, photosensitive resin composition, method for forming pattern, cured film, and electronic component | 信越化学工业株式会社 | 2021-10-22 | — | — | CN | disclosed |
| EP-3896114-A1 | NOVEL COMPOUND, POLYIMIDE RESIN AND METHOD OF PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD AND METHOD OF FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | Shin-Etsu Chemical Co., Ltd. (JP) | 2021-10-20 | — | — | EP | disclosed |
| US-20210317270-A1 | NOVEL COMPOUND, POLYIMIDE RESIN AND METHOD OF PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD AND METHOD OF FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-10-14 | — | — | US | disclosed |
| EP-3489284-B1 | POLYIMIDE RESIN FILM AND METHOD FOR PRODUCING POLYIMIDE RESIN FILM | MITSUBISHI GAS CHEMICAL CO (JP) | 2021-06-09 | — | — | EP | disclosed |
| US-20190185631-A1 | POLYIMIDE RESIN FILM AND METHOD FOR PRODUCING POLYIMIDE RESIN FILM | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2019-06-20 | — | — | US | disclosed |
| EP-3489284-A1 | POLYIMIDE RESIN FILM AND METHOD FOR PRODUCING POLYIMIDE RESIN FILM | Mitsubishi Gas Chemical Company, Inc. (JP) | 2019-05-29 | — | — | EP | disclosed |
| US-20140117280-A1 | OXYGEN ABSORBER | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-05-01 | — | — | US | disclosed |
| EP-2711077-A1 | OXYGEN ABSORBER | Mitsubishi Gas Chemical Company, Inc. (JP) | 2014-03-26 | — | — | EP | disclosed |
| US-8357322-B2 | Process and apparatus for production of colorless transparent resin film | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2013-01-22 | — | — | US | disclosed |
| EP-2147766-B1 | PROCESS AND APPARATUS FOR PRODUCTION OF COLORLESS TRANSPARENT RESIN FILM | MITSUBISHI GAS CHEMICAL CO (JP) | 2012-08-01 | — | — | EP | disclosed |
| US-20100187719-A1 | PROCESS AND APPARATUS FOR PRODUCTION OF COLORLESS TRANSPARENT RESIN FILM | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2010-07-29 | — | — | US | disclosed |
| EP-2147766-A1 | PROCESS AND APPARATUS FOR PRODUCTION OF COLORLESS TRANSPARENT RESIN FILM | Mitsubishi Gas Chemical Company, Inc. (JP) | 2010-01-27 | — | — | EP | disclosed |
| US-6335143-B1 | Resist composition containing specific cross-linking agent | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2002-01-01 | — | — | US | disclosed |
| EP-0887706-A1 | Resist composition containing specific cross-linking agent | WAKO PURE CHEMICAL INDUSTRIES, LTD (JP) | 1998-12-30 | — | — | EP | disclosed |