SCHEMBL299619

SCHEMBL299619

C=CCN1CCOCC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL7127197 0.97 USP2 (0.39)
SCHEMBL10784957 0.97 KDM4E (0.43)
SCHEMBL6303717 0.97 KDM4E (0.43)
SCHEMBL31734261 0.91 RAB9A (0.36)
Formic Acid SCHEMBL27438700 0.89 RAB9A (0.41)
SCHEMBL2319925 0.85
SCHEMBL6692977 0.80 OPRD1 (0.41)
SCHEMBL327601 0.80 OPRD1 (0.41)
SCHEMBL290880 0.80
SCHEMBL3970107 0.80 OPRD1 (0.41)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 2252 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260118765-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2026-04-30 US claimed
US-20250004367-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2025-01-02 US claimed
CN-118974659-A Composition for forming resist underlayer film 日产化学株式会社 2024-11-15 CN claimed
CN-118825311-A Polysulfide high-barrier performance ion exchange membrane and preparation method thereof 安徽恒焺储能科技有限公司 2024-10-22 CN claimed
CN-117980823-A Composition for forming resist underlayer film 日产化学株式会社 2024-05-03 CN claimed
CN-115678140-B Antistatic ultra-high molecular weight polyethylene based on ionic liquid and preparation method thereof 广州市香港科大霍英东研究院 2024-04-26 CN claimed
CN-114887621-B Tungsten oxide modified hydrotalcite supported bimetallic catalyst and preparation method and application thereof 中国科学院大连化学物理研究所 2024-04-12 CN claimed
CN-112824482-B Silicon nitride film etching solution and method for manufacturing semiconductor device using the same OCI有限公司 2024-03-26 CN claimed
CN-112745853-B Silicon nitride film etching solution and method for manufacturing semiconductor device using the same OCI有限公司 2024-03-26 CN claimed
CN-111362988-B System and method for emulsion breaking 生命科技公司 2024-03-15 CN claimed
US-4294711-A STILBENE OPTICAL BRIGHTENERS AND SURFACTANTS THE PROCTER & GAMBLE COMPANY (US) 1981-10-13 US claimed
EP-0026013-A1 Washing and softening compositions and methods for their manufacture THE PROCTER &amp; GAMBLE COMPANY (US) 1981-04-01 EP claimed
EP-0006271-A1 Washing and softening compositions containing nonionic brightener THE PROCTER &amp; GAMBLE COMPANY (US) 1980-01-09 EP claimed
EP-0006268-A1 Washing and softening compositions and processes for making them THE PROCTER &amp; GAMBLE COMPANY (US) 1980-01-09 EP claimed
US-4179423-A TERTIARY AMINE, TRIOL, TRICARBOXYLIC ACID ANHYDRIDE SCHENECTADY CHEMICALS, INC. (US) 1979-12-18 US claimed
US-4110328-A Bis-carbamylguanidinoazaalkane antimicrobial compounds COOPER LABORATORIES, INC. (US) 1978-08-29 US claimed
US-4080393-A CONTACTING WITH AN ALKANOLAMINE, MORPHOLINE OR AN N-ALKYL DERIVATIVE, OR HEXAMETHYLENEIMINE DYNAMIT NOBEL AKTIENGESELLSCHAFT (DT) 1978-03-21 US claimed
US-4055712-A CONDENSATION OF A TERTIARY AMINE WITH 1,4-DIHALO-2-BUTENE, QUATERNIZATION KAWANEE INDUSTRIES (US) 1977-10-25 US claimed
US-4036959-A CATIONIC POLYAMINES MILLMASTER ONYX CORPORATION (US) 1977-07-19 US claimed
US-3959191-A Novel hydrophobic polyurethane foams W. R. GRACE & CO. (US) 1976-05-25 US claimed