SCHEMBL30002958

SCHEMBL30002958

CCCCC(CC)COc1ccc(OCC(CC)CCCC)c2ccccc12

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.53
CYP3A4 P08684 5/20 0.53
CA2 P00918 1/20 0.53
LMNA P02545 3/20 0.48
PRSS1 P07477 1/20 0.47
PRSS2 P07478 1/20 0.47
PRSS3 P35030 1/20 0.47
MAPK1 P28482 3/20 0.44
L3MBTL1 Q9Y468 2/20 0.43
MEN1 O00255 2/20 0.41
KMT2A Q03164 2/20 0.41
MAPT P10636 1/20 0.41
KDM4E B2RXH2 1/20 0.41
CNR1 P21554 3/20 0.40
CNR2 P34972 3/20 0.40
TSHR P16473 2/20 0.40
HSD17B10 Q99714 1/20 0.40
ATM Q13315 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
CYP2C9 P11712 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19612465 1.00 ALDH1A1 (0.53) ALDH1A1CYP3A4CA2LMNAPRSS1
SCHEMBL13732601 0.93 CYP3A4 (0.49) ALDH1A1CYP3A4CA2LMNAPRSS1
SCHEMBL17912855 0.91 LMNA (0.51) ALDH1A1CYP3A4CA2LMNAPRSS1
SCHEMBL1777606 0.89 ALDH1A1 (0.55) ALDH1A1CYP3A4CA2LMNAPRSS1
SCHEMBL17912824 0.87 HTR1B (0.54) ALDH1A1CA2LMNAMAPK1MEN1
SCHEMBL30416537 0.87 HTR1B (0.54) ALDH1A1CA2LMNAMAPK1MEN1
SCHEMBL17403681 0.87 ALDH1A1 (0.50) ALDH1A1CYP3A4CA2LMNAPRSS1
SCHEMBL23271846 0.85 ALDH1A1 (0.42) ALDH1A1CYP3A4CA2LMNAPRSS1
SCHEMBL30003128 0.85 ALDH1A1 (0.42) ALDH1A1CYP3A4CA2LMNAPRSS1
SCHEMBL1401911 0.84 ALDH1A1 (0.54) ALDH1A1CYP3A4CA2LMNAPRSS1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120077329-A Photosensitive resin composition, photosensitive resin laminate, and method for forming resist pattern 旭化成株式会社 2025-05-30 CN disclosed
CN-117063121-A Photosensitive film, photosensitive element, and method for producing laminate 株式会社力森诺科 2023-11-14 CN disclosed
CN-110891980-B Radical polymerization control agent and radical polymerization control method 川崎化成工业株式会社 2022-09-30 CN disclosed