⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6640735 | 1.00 | — | — | |
| SCHEMBL6559802 | 0.58 | — | — | |
| SCHEMBL25472 | 0.58 | — | — | |
| SCHEMBL29889134 | 0.58 | — | — | |
| Hydrochloric Acid SCHEMBL72335 | 0.41 | — | — | |
| Water SCHEMBL490048 | 0.41 | — | — | |
| SCHEMBL74539 | 0.41 | — | — | |
| SCHEMBL1179177 | 0.41 | — | — | |
| Fluoride Ion SCHEMBL73611 | 0.41 | — | — | |
| SCHEMBL1629906 | 0.41 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-11335461-A | — | — | None | — | — | JP | disclosed |
| JP-11181090-A | — | — | None | — | — | JP | disclosed |
| US-20240199847-A1 | RESIN COMPOSITION AND ELECTRONIC DEVICE | KONICA MINOLTA INC (JP) | 2024-06-20 | — | — | US | disclosed |
| US-11920019-B2 | Resin composition and electronic device | Konica Minolta, Inc. (JP) | 2024-03-05 | — | — | US | disclosed |
| EP-3896114-B1 | POLYIMIDE RESIN AND METHOD OF PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD AND METHOD OF FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHINETSU CHEMICAL CO (JP) | 2023-10-18 | — | — | EP | disclosed |
| US-11572442-B2 | Compound, polyimide resin and method of producing the same, photosensitive resin composition, patterning method and method of forming cured film, interlayer insulating film, surface protective film, and electronic component | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2023-02-07 | — | — | US | disclosed |
| CN-112805337-B | Resin composition and electronic device | 柯尼卡美能达株式会社 | 2022-10-28 | — | — | CN | disclosed |
| US-11261303-B2 | Polyimide resin film and method for producing polyimide resin film | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2022-03-01 | — | — | US | disclosed |
| US-20210347964-A1 | RESIN COMPOSITION AND ELECTRONIC DEVICE | Konica Minolta, Inc. (JP) | 2021-11-11 | — | — | US | disclosed |
| CN-108884245-B | Polyimide film and method for producing same | 柯尼卡美能达株式会社 | 2021-10-29 | — | — | CN | disclosed |
| US-8357322-B2 | Process and apparatus for production of colorless transparent resin film | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2013-01-22 | — | — | US | disclosed |
| EP-2147766-B1 | PROCESS AND APPARATUS FOR PRODUCTION OF COLORLESS TRANSPARENT RESIN FILM | MITSUBISHI GAS CHEMICAL CO (JP) | 2012-08-01 | — | — | EP | disclosed |
| US-20100187719-A1 | PROCESS AND APPARATUS FOR PRODUCTION OF COLORLESS TRANSPARENT RESIN FILM | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2010-07-29 | — | — | US | disclosed |
| EP-2147766-A1 | PROCESS AND APPARATUS FOR PRODUCTION OF COLORLESS TRANSPARENT RESIN FILM | Mitsubishi Gas Chemical Company, Inc. (JP) | 2010-01-27 | — | — | EP | disclosed |
| US-6335143-B1 | Resist composition containing specific cross-linking agent | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2002-01-01 | — | — | US | disclosed |
| JP-H11335461-A | LIQUID CRYSTAL ORIENTING AGENT | SUMITOMO BAKELITE CO LTD | 1999-12-07 | — | — | JP | disclosed |
| EP-0946552-A1 | SULFONAMIDES AND DERIVATIVES THEREOF THAT MODULATE THE ACTIVITY OF ENDOTHELIN | TEXAS BIOTECHNOLOGY CORPORATION (US) | 1999-10-06 | — | — | EP | disclosed |
| JP-H11181090-A | POLYIMDE PRECURSOR COMPOSITION AND LIQUID CRYSTAL ORIENTING AGENT | SUMITOMO BAKELITE CO LTD | 1999-07-06 | — | — | JP | disclosed |
| EP-0887706-A1 | Resist composition containing specific cross-linking agent | WAKO PURE CHEMICAL INDUSTRIES, LTD (JP) | 1998-12-30 | — | — | EP | disclosed |
| WO-1998013366-A1 | SULFONAMIDES AND DERIVATIVES THEREOF THAT MODULATE THE ACTIVITY OF ENDOTHELIN | TEXAS BIOTECHNOLOGY CORPORATION (US) | 1998-04-02 | — | — | WO | disclosed |