SCHEMBL30022263

SCHEMBL30022263

CCO[Si](OCC)(OCC)c1cccc(N)c1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 3/20 0.48
TP53 P04637 1/20 0.48
CASP1 P29466 1/20 0.41
RECQL P46063 1/20 0.41
ALDH1A1 P00352 3/20 0.39
TSHR P16473 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.37
CA12 O43570 1/20 0.34
CA1 P00915 1/20 0.34
CA2 P00918 1/20 0.34
CA7 P43166 1/20 0.34
CA9 Q16790 1/20 0.34
TDP1 Q9NUW8 1/20 0.34
CA14 Q9ULX7 1/20 0.34
MAOB P27338 4/20 0.34
MAOA P21397 3/20 0.34
ADRA2C P18825 1/20 0.34
CYP19A1 P11511 1/20 0.33
KDM4E B2RXH2 1/20 0.33
GAA P10253 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL434177 1.00 CYP3A4 (0.48) CYP3A4TP53CASP1RECQLALDH1A1
SCHEMBL574271 0.86 TP53 (0.33) CYP3A4TP53ALDH1A1
SCHEMBL8954070 0.85 TSHR (0.44) CYP3A4TP53CASP1RECQLALDH1A1
SCHEMBL4453580 0.83 CYP3A4 (0.47) CYP3A4TP53CASP1RECQLALDH1A1
SCHEMBL8953997 0.83 CYP3A4 (0.47) CYP3A4TP53CASP1RECQLALDH1A1
SCHEMBL3468837 0.83 TP53 (0.36) CYP3A4TP53SMN1; SMN2
SCHEMBL21409813 0.82 TSHR (0.49) CYP3A4TP53CASP1RECQLALDH1A1
SCHEMBL5024549 0.80 CYP3A4 (0.44) CYP3A4TP53CASP1RECQLALDH1A1
SCHEMBL5023574 0.80 CYP3A4 (0.44) CYP3A4TP53CASP1RECQLALDH1A1
SCHEMBL21409757 0.80 TSHR (0.40) CYP3A4TP53CASP1RECQLALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115268215-B Photosensitive polyimide resin composition, photosensitive polyimide film containing photosensitive polyimide resin composition and application of photosensitive polyimide film 吉林奥来德光电材料股份有限公司 2025-05-16 CN claimed
CN-119781246-A Photosensitive polyimide resin composition, cured film, and preparation method and application thereof 吉林奥来德光电材料股份有限公司 2025-04-08 CN claimed
CN-115268215-A Photosensitive polyimide resin composition, photosensitive polyimide film containing same and application of photosensitive polyimide resin composition 吉林奥来德光电材料股份有限公司 2022-11-01 CN claimed
CN-115268215-B Photosensitive polyimide resin composition, photosensitive polyimide film containing photosensitive polyimide resin composition and application of photosensitive polyimide film 吉林奥来德光电材料股份有限公司 2025-05-16 CN disclosed
CN-119781246-A Photosensitive polyimide resin composition, cured film, and preparation method and application thereof 吉林奥来德光电材料股份有限公司 2025-04-08 CN disclosed
CN-116643458-A Diamine compound, photosensitive polyimide resin composition, and preparation method and application thereof 吉林奥来德光电材料股份有限公司 2023-08-25 CN disclosed
CN-115246930-B Novel polyimide resin, photosensitive polyimide resin composition, and preparation methods and applications thereof 吉林奥来德光电材料股份有限公司 2023-08-18 CN disclosed
CN-115268215-A Photosensitive polyimide resin composition, photosensitive polyimide film containing same and application of photosensitive polyimide resin composition 吉林奥来德光电材料股份有限公司 2022-11-01 CN disclosed
CN-115246930-A Novel polyimide resin, photosensitive polyimide resin composition, and preparation method and application thereof 吉林奥来德光电材料股份有限公司 2022-10-28 CN disclosed