SCHEMBL574271

SCHEMBL574271

CCO[Si](OCC)(OCC)c1cccc([Si](OCC)(OCC)OCC)c1

nearest known ligand 0.33

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
TP53 P04637 1/20 0.33
CYP3A4 P08684 1/20 0.33
CYP1A2 P05177 1/20 0.32
GABRA1 P14867 1/20 0.31
GABRG2 P18507 1/20 0.31
GABRB3 P28472 1/20 0.31
GABRA5 P31644 1/20 0.31
GABRA3 P34903 1/20 0.31
MAPK8 P45983 1/20 0.30
NPC1 O15118 1/20 0.30
ALDH1A1 P00352 1/20 0.30
MAPK1 P28482 1/20 0.30
RAB9A P51151 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6561373 0.87 ACHE (0.42) CYP3A4CYP1A2ALDH1A1MAPK1
SCHEMBL28532235 0.86 ALDH1A1 (0.41) CYP3A4ALDH1A1
SCHEMBL30022263 0.86 CYP3A4 (0.48) TP53CYP3A4ALDH1A1
SCHEMBL3675040 0.86 GABRG2 (0.43) GABRA1GABRG2GABRB3GABRA5GABRA3
SCHEMBL2329175 0.86 CYP3A4 (0.36) CYP3A4ALDH1A1
SCHEMBL434177 0.86 CYP3A4 (0.48) TP53CYP3A4ALDH1A1
SCHEMBL15735907 0.86 ACHE (0.39)
SCHEMBL315824 0.85
SCHEMBL13027214 0.84 ACHE (0.44) CYP3A4ALDH1A1MAPK1
SCHEMBL465401 0.84 HPGD (0.32) CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 273 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250304819-A1 Flexible and foldable abrasion resistant photopatternable siloxane hard coat OPTITUNE OY (FI) 2025-10-02 US claimed
CN-112615052-B Composite electrolyte material and preparation method thereof 江苏纳盾科技有限公司 2024-04-26 CN claimed
CN-107636097-B Silicone polymer composition and use thereof 奥普提汀公司 2024-03-15 CN claimed
CN-117317515-A Integrated lithium ion battery negative electrode diaphragm and preparation method and application thereof 苏州大学 2023-12-29 CN claimed
EP-4238640-A1 MICROCAPSULE HAVING CORE-SHELL STRUCTURE, AND PRODUCTION METHOD FOR SAME Insilico Co., Ltd. (KR) 2023-09-06 EP claimed
US-20230183563-A1 MICROCAPSULE HAVING CORE-SHELL STRUCTURE, AND PRODUCTION METHOD FOR SAME INSILICO CO. LTD. (KR) 2023-06-15 US claimed
US-11634610-B2 Siloxane polymer compositions and their use OPTITUNE OY (FI) 2023-04-25 US claimed
CN-115877663-A Photosensitive resin composition and method for manufacturing display device using same 三星显示有限公司 2023-03-31 CN claimed
US-20230096077-A1 PHOTOSENSITIVE RESIN COMPOSITION AND MANUFACTURING METHOD OF DISPLAY DEVICE USING THE SAME LTC CO., LTD (KR) 2023-03-30 US claimed
WO-2022092355-A1 MICROCAPSULE HAVING CORE-SHELL STRUCTURE, AND PRODUCTION METHOD FOR SAME 주식회사 인실리코 2022-05-05 WO claimed
EP-2598441-A1 SUPERFICIALLY POROUS MATERIALS COMPRISING A SUBSTANTIALLY NONPOROUS CORE HAVING NARROW PARTICLE SIZE DISTRIBUTION; PROCESS FOR THE PREPARATION THEREOF; AND USE THEREOF FOR CHROMATOGRAPHIC SEPARATIONS Waters Technologies Corporation (US) 2013-06-05 EP claimed
EP-2598440-A2 SUPERFICIALLY POROUS MATERIALS COMPRISING A SUBSTANTIALLY NONPOROUS HYBRID CORE HAVING NARROW PARTICLE SIZE DISTRIBUTION; PROCESS FOR THE PREPARATION THEREOF; AND USE THEREOF FOR CHROMATOGRAPHIC SEPARATIONS Waters Technologies Corporation (US) 2013-06-05 EP claimed
WO-2012018598-A1 SUPERFICIALLY POROUS MATERIALS COMPRISING A SUBSTANTIALLY NONPOROUS CORE HAVING NARROW PARTICLE SIZE DISTRIBUTION; PROCESS FOR THE PREPARATION THEREOF; AND USE THEREOF FOR CHROMATOGRAPHIC SEPARATIONS WATERS TECHNOLOGIES CORPORATION (US) 2012-02-09 WO claimed
WO-2012018596-A2 SUPERFICIALLY POROUS MATERIALS COMPRISING A SUBSTANTIALLY NONPOROUS HYBRID CORE HAVING NARROW PARTICLE SIZE DISTRIBUTION; PROCESS FOR THE PREPARATION THEREOF; AND USE THEREOF FOR CHROMATOGRAPHIC SEPARATIONS WATERS TECHNOLOGIES CORPORATION (US) 2012-02-09 WO claimed
US-7932295-B2 Organic silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device JSR CORPORATION (JP) 2011-04-26 US claimed
US-7875317-B2 formed by hydrolyzing and condensing a siloxy compound in the presence of a polycarbosilane; low relative dielectric constant and excellent mechanical strength, storage stability, and chemical resistance; semiconductors JSR CORPORATION (JP) 2011-01-25 US claimed
US-7767620-B2 Homogeneous integrated matrix of silica having bridged bonded organic and silicons constituents as a hybrid porous framework for chemically attaching molecules to the wall surface; self-assembled mesoporous silica walls having bis/silsesquisilane compounds linkages;microelectronic; catalyst supports NOVX SYSTEMS INC. (CA) 2010-08-03 US claimed
US-20080246153-A1 ORGANIC SILICA-BASED FILM, METHOD OF FORMING THE SAME, COMPOSITION FOR FORMING INSULATING FILM FOR SEMICONDUCTOR DEVICE, INTERCONNECT STRUCTURE, AND SEMICONDUCTOR DEVICE JSR CORPORATION (JP) 2008-10-09 US claimed
US-20080193734-A1 Homogeneous integrated matrix of silica having bridged bonded organic and silicons constituents as a hybrid porous framework for chemically attaching molecules to the wall surface; self-assembled mesoporous silica walls having bis/silsesquisilane compounds linkages;microelectronic; catalyst supports THE GOVERNING COUNCIL OF THE UNIVERSITY OF TORONTO (CA) 2008-08-14 US claimed
US-7399715-B2 Organic silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device JSR CORPORATION (JP) 2008-07-15 US claimed