SCHEMBL4453580

SCHEMBL4453580

CCO[Si](C)(OCC)c1cccc(N)c1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 3/20 0.47
TP53 P04637 1/20 0.47
CASP1 P29466 1/20 0.39
RECQL P46063 1/20 0.39
ALDH1A1 P00352 4/20 0.38
TSHR P16473 1/20 0.38
SMN1; SMN2 Q16637 2/20 0.36
MAOB P27338 3/20 0.33
MAP4K4 O95819 2/20 0.33
MAOA P21397 1/20 0.33
CA12 O43570 1/20 0.33
CA1 P00915 1/20 0.33
CA2 P00918 1/20 0.33
CA7 P43166 1/20 0.33
CA9 Q16790 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
CA14 Q9ULX7 1/20 0.33
ADRA2C P18825 1/20 0.33
KDM4E B2RXH2 1/20 0.33
MEN1 O00255 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2957216 0.86 TP53 (0.32) CYP3A4TP53
SCHEMBL7132361 0.86 TSHR (0.42) CYP3A4TP53CASP1RECQLALDH1A1
SCHEMBL8953997 0.85 CYP3A4 (0.47) CYP3A4TP53CASP1RECQLALDH1A1
SCHEMBL30022263 0.83 CYP3A4 (0.48) CYP3A4TP53CASP1RECQLALDH1A1
SCHEMBL434177 0.83 CYP3A4 (0.48) CYP3A4TP53CASP1RECQLALDH1A1
SCHEMBL5024549 0.82 CYP3A4 (0.44) CYP3A4TP53CASP1RECQLALDH1A1
SCHEMBL5023574 0.79 CYP3A4 (0.44) CYP3A4TP53CASP1RECQLALDH1A1
SCHEMBL9804222 0.79 ALDH1A1 (0.47) CYP3A4TP53CASP1RECQLALDH1A1
SCHEMBL15736454 0.78 ACHE (0.38) MAOBMAPT
SCHEMBL28062714 0.78 CYP3A4 (0.35) CYP3A4ALDH1A1TSHRSMN1; SMN2MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110857371-B Cured film and color filter 捷恩智株式会社 2023-05-30 CN disclosed
US-20090026425-A1 COMPOSITION COMPRISING POLYESTER AMIDE ACID AND THE LIKE AND INK-JET INK COMPOSITION USING THE SAME CHISSO CORPORATION (JP) 2009-01-29 US disclosed
US-20080152845-A1 excellent in flatness; heat resistance; solvent resistance, chemical resistance such as acid resistance, alkali resistance; water resistance, ability to adhere to glass substrate; transparency, scratch resistance, coatability and light resistance; polyester amide acid; epoxy resin; curing agent CHISSO CORPORATION 2008-06-26 US disclosed
CN-1173886-A Polyamic acid, polyimide film and liquid crystal aligning film and liquid crystal display element CHISSO CORP (JP) 1998-02-18 CN disclosed