SCHEMBL300439

SCHEMBL300439

O=C(c1ccccc1)c1ccccc1S(=O)(=O)O

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
AKR1C3 P42330 3/20 0.55
ALDH1A1 P00352 3/20 0.53
MAPT P10636 2/20 0.53
KMT2A Q03164 2/20 0.53
LMNA P02545 1/20 0.53
GAA P10253 1/20 0.52
ELANE P08246 1/20 0.45
CYP1A2 P05177 1/20 0.45
ATM Q13315 3/20 0.44
CDC25B P30305 1/20 0.44
TDP1 Q9NUW8 2/20 0.43
L3MBTL1 Q9Y468 1/20 0.43
SRD5A2 P31213 1/20 0.43
HSP90AA1 P07900 1/20 0.43
PKM P14618 1/20 0.43
CCR6 P51684 1/20 0.43
NPSR1 Q6W5P4 1/20 0.43
TLR9 Q9NR96 1/20 0.43
CA1 P00915 1/20 0.43
CA2 P00918 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28340031 0.98 AKR1C3 (0.53) AKR1C3ALDH1A1MAPTKMT2ALMNA
SCHEMBL29496654 0.98 AKR1C3 (0.53) AKR1C3ALDH1A1MAPTKMT2ALMNA
Water SCHEMBL27666388 0.98 AKR1C3 (0.53) AKR1C3ALDH1A1MAPTKMT2ALMNA
SCHEMBL1161086 0.87 CA1 (0.44) ALDH1A1MAPTKMT2ALMNAGAA
SCHEMBL1161088 0.87 AKR1C3 (0.50) AKR1C3ALDH1A1MAPTKMT2ALMNA
SCHEMBL7782808 0.85 KMT2A (0.51) AKR1C3ALDH1A1MAPTKMT2ALMNA
SCHEMBL777167 0.85 AKR1C3 (0.59) AKR1C3ALDH1A1MAPTKMT2ALMNA
SCHEMBL2893168 0.84 MAPT (0.53) AKR1C3ALDH1A1MAPTKMT2ALMNA
SCHEMBL7782795 0.84 AKR1C3 (0.47) AKR1C3ALDH1A1MAPTKMT2ALMNA
SCHEMBL7787656 0.84 KMT2A (0.50) AKR1C3ALDH1A1MAPTKMT2ALMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 532 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119200331-A Photosensitive element, method for forming resist pattern, and method for manufacturing printed wiring board 株式会社力森诺科 2024-12-27 CN claimed
CN-112204464-B Photosensitive element, resin composition for forming barrier layer, method for forming resist pattern, and method for manufacturing printed wiring board 株式会社力森诺科 2024-11-19 CN claimed
WO-2024233223-A1 IMPROVED ABSORBENT TO CLEAN INDOOR AIR OF VOCS AMERICAN AIR FILTER COMPANY, INC. (US) 2024-11-14 WO claimed
CN-118218784-B Wafer laser grooving method 江苏中科智芯集成科技有限公司 2024-09-20 CN claimed
CN-118218784-A Wafer laser grooving method 江苏中科智芯集成科技有限公司 2024-06-21 CN claimed
CN-117107433-A Anti-aging car cover spunlaced material and preparation method thereof 南通崇天纺纱有限公司 2023-11-24 CN claimed
CN-117004131-A Antibacterial ultraviolet-resistant LDH/PP master batch and preparation method and application thereof 苏州多瑈新材料科技有限公司 2023-11-07 CN claimed
CN-115304967-A Wafer cutting protection liquid, preparation method, application and cutting method 大连奥首科技有限公司 2022-11-08 CN claimed
CN-111138812-B Ultrathin degradable mulching film special for beets and preparation method thereof 中国科学院理化技术研究所 2022-08-26 CN claimed
WO-2022138538-A1 SOLID COSMETIC 株式会社 資生堂 2022-06-30 WO claimed
EP-0672405-A1 Hair treatment composition KAO CORPORATION (JP) 1995-09-20 EP claimed
WO-1995020375-A1 HAIR COSMETIC COMPOSITION KAO CORPORATION (JP) 1995-08-03 WO claimed
EP-0662314-A1 Method of hair treatment Kao Corporation (JP) 1995-07-12 EP claimed
EP-0446982-B1 Low-temperature bleaching compositions UNILEVER NV (NL) 1994-10-26 EP claimed
EP-0555400-A4 POLYACRYLIC ACID COMPOSITIONS FOR TEXTILE PROCESSING 1993-10-06 EP claimed
EP-0555400-A1 POLYACRYLIC ACID COMPOSITIONS FOR TEXTILE PROCESSING PEACH STATE LABS, INC. (US) 1993-08-18 EP claimed
US-5212272-A Polymerization of acrylic acid monomers in the presence of acid catalysts PEACH STATE LABS, INC. (US) 1993-05-18 US claimed
EP-0529437-A1 Hair treatment composition Kao Corporation (JP) 1993-03-03 EP claimed
WO-1992007883-A1 POLYACRYLIC ACID COMPOSITIONS FOR TEXTILE PROCESSING PEACH STATE LABS, INC. (US) 1992-05-14 WO claimed
US-4326020-A Method of making positive acting diazo lithographic printing plate POLYCHROME CORPORATION (US) 1982-04-20 US claimed