Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.53 |
| ▸ | THRB | P10828 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | DUSP3 | P51452 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | LPAR6 | P43657 | 1/20 | 0.33 |
| ▸ | LPAR1 | Q92633 | 1/20 | 0.33 |
| ▸ | LPAR4 | Q99677 | 1/20 | 0.33 |
| ▸ | LPAR5 | Q9H1C0 | 1/20 | 0.33 |
| ▸ | LPAR2 | Q9HBW0 | 1/20 | 0.33 |
| ▸ | LPAR3 | Q9UBY5 | 1/20 | 0.33 |
| ▸ | ENPP2 | Q13822 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.30 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3412120 | 0.87 | TSHR (0.59) | TSHRTHRBALDH1A1KDM4EDUSP3 | |
| SCHEMBL94906 | 0.87 | TSHR (0.68) | TSHRTHRBALDH1A1KDM4EDUSP3 | |
| SCHEMBL4975790 | 0.85 | TSHR (0.57) | TSHRTHRBALDH1A1KDM4EDUSP3 | |
| SCHEMBL30130372 | 0.85 | TSHR (0.40) | TSHRALDH1A1 | |
| SCHEMBL19998240 | 0.85 | TSHR (0.65) | TSHRTHRBALDH1A1KDM4EDUSP3 | |
| SCHEMBL10053530 | 0.84 | TSHR (0.55) | TSHRTHRBALDH1A1KDM4EDUSP3 | |
| SCHEMBL129034 | 0.83 | TSHR (0.59) | TSHRTHRBALDH1A1TDP1 | |
| SCHEMBL4980929 | 0.82 | TSHR (0.53) | TSHRKDM4EDUSP3MEN1KMT2A | |
| SCHEMBL3408544 | 0.82 | TSHR (0.53) | TSHRKDM4EDUSP3MEN1KMT2A | |
| SCHEMBL28832982 | 0.81 | TSHR (0.57) | TSHRTHRBALDH1A1TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 229 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12638775-B2 | Methods and compositions for improved patterning of photoresist | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2026-05-26 | — | — | US | disclosed |
| US-20260140444-A1 | PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2026-05-21 | — | — | US | disclosed |
| CN-122028714-A | Method for manufacturing semiconductor device and composition for coating patterned photoresist | 台湾积体电路制造股份有限公司 | 2026-05-12 | — | — | CN | disclosed |
| US-20260130180-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND WAFER PROTECTIVE COMPOSITION | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2026-05-07 | — | — | US | disclosed |
| US-20260104643-A1 | METHOD OF FORMING PHOTORESIST PATTERN | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2026-04-16 | — | — | US | disclosed |
| US-20260101726-A1 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE MANUFACTURING TOOL | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2026-04-09 | — | — | US | disclosed |
| US-12578645-B2 | Method of manufacturing a semiconductor device | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2026-03-17 | — | — | US | disclosed |
| US-20260076154-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2026-03-12 | — | — | US | disclosed |
| US-12566374-B2 | Photoresist composition and method of manufacturing semiconductor device | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2026-03-03 | — | — | US | disclosed |
| US-12550685-B2 | Protective composition and method of forming photoresist pattern | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2026-02-10 | — | — | US | disclosed |
| US-20140272724-A1 | Photoresist System and Method | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2014-09-18 | — | — | US | disclosed |
| US-20140272716-A1 | Photoresist System and Method | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2014-09-18 | — | — | US | disclosed |
| US-20140263053-A1 | Filter System and Method | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2014-09-18 | — | — | US | disclosed |
| US-20140273457-A1 | Anti-Reflective Layer and Method | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2014-09-18 | — | — | US | disclosed |
| US-20140273521-A1 | PHOTORESIST SYSTEM AND METHOD | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2014-09-18 | — | — | US | disclosed |
| US-20140273506-A1 | Unlocking Layer and Method | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2014-09-18 | — | — | US | disclosed |
| US-20140255851-A1 | Photoresist Defect Reduction System and Method | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2014-09-11 | — | — | US | disclosed |
| US-6881529-B2 | Positive photoresist transfer material and method for processing surface of substrate using the transfer material | FUJI PHOTO FILM CO., LTD. (JP) | 2005-04-19 | — | — | US | disclosed |
| US-20030087179-A1 | Positive photoresist transfer material and method for processing surface of substrate using the transfer material | FUJI PHOTO FILM CO., LTD. | 2003-05-08 | — | — | US | disclosed |
| US-4120721-A | ACRYLIC OR METHACRYLIC TERMINATED, URETHANE CONTAINING POLYENE; WATER INSOLUBLE VINYL MONOMER DILUENT; POLYTHIOL; PHOTOINITIATOR | W. R. GRACE & CO. (US) | 1978-10-17 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (9 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260140444-A1 | PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | INO80C, INO80, NAT10 | TSHR 242/4885THRB 988/4885ALDH1A1 2819/4885 |
| US-20260076154-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | JUP, DSG1, ATM | TSHR 1912/4885THRB 3762/4885ALDH1A1 2660/4885 |
| US-12578645-B2 | Method of manufacturing a semiconductor device | SUN2, MYB, NONO | TSHR 2013/4885THRB 2229/4885ALDH1A1 4479/4885 |
| US-20260101726-A1 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE MANUFACTURING TOOL | PIEZO1, MYB, MAP2K4 | TSHR 989/4885THRB 2569/4885ALDH1A1 4866/4885 |
| US-12566374-B2 | Photoresist composition and method of manufacturing semiconductor device | INO80C, INO80, PI4K2B | TSHR 191/4885THRB 648/4885ALDH1A1 2896/4885 |
| US-12550685-B2 | Protective composition and method of forming photoresist pattern | C1R, C1S, C5 | TSHR 1282/4885THRB 1243/4885ALDH1A1 530/4885 |
| US-20260130180-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND WAFER PROTECTIVE COMPOSITION | C9, C1S, ZKSCAN2 | TSHR 2285/4885THRB 2733/4885ALDH1A1 566/4885 |
| US-12638775-B2 | Methods and compositions for improved patterning of photoresist | DSG1, SCO2, ERCC1 | TSHR 4721/4885THRB 4827/4885ALDH1A1 1401/4885 |
| US-20260104643-A1 | METHOD OF FORMING PHOTORESIST PATTERN | DSTN, PFAS, DNTT | TSHR 1723/4885THRB 1488/4885ALDH1A1 616/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.