SCHEMBL301590

SCHEMBL301590

CCO[SiH](CCC(C)(C)C)OCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5860616 0.85
SCHEMBL8665521 0.80
SCHEMBL301383 0.80
SCHEMBL730145 0.80
SCHEMBL4770294 0.79
SCHEMBL3368064 0.77
SCHEMBL28418476 0.77 CYP2D6 (0.38)
SCHEMBL8666598 0.77 ADRB2 (0.32)
SCHEMBL707438 0.76
SCHEMBL8668647 0.75 CES1 (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 145 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1666632-B1 Porous low dielectric constant compositions and methods for making and using same AIR PROD & CHEM (US) 2013-04-24 EP claimed
EP-2281920-A1 Porous low dielectric constant compositions and methods for making and using same Air Products and Chemicals, Inc. (US) 2011-02-09 EP claimed
US-20090096106-A1 ANTIREFLECTIVE COATINGS AIR PRODUCTS AND CHEMICALS, INC. (US) 2009-04-16 US claimed
EP-2048700-A2 Antireflective coatings Air Products and Chemicals, Inc. (US) 2009-04-15 EP claimed
US-20080271640-A1 Porogens, Porogenated Precursors and Methods for Using the Same to Provide Porous Organosilica Glass Films with Low Dielectric Constants AIR PRODUCTS AND CHEMICALS, INC. (US) 2008-11-06 US claimed
US-7332445-B2 Porous low dielectric constant compositions and methods for making and using same AIR PRODUCTS AND CHEMICALS, INC. (US) 2008-02-19 US claimed
EP-1666632-A2 Porous low dielectric constant compositions and methods for making and using same AIR PRODUCTS AND CHEMICALS, INC. (US) 2006-06-07 EP claimed
US-20060078676-A1 Porous low dielectric constant compositions and methods for making and using same VERSUM MATERIALS US, LLC 2006-04-13 US claimed
US-6846515-B2 Methods for using porogens and/or porogenated precursors to provide porous organosilica glass films with low dielectric constants AIR PRODUCTS AND CHEMICALS, INC. (US) 2005-01-25 US claimed
US-20030232137-A1 Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants VERSUM MATERIALS US, LLC 2003-12-18 US claimed
US-20030198742-A1 Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants VERSUM MATERIALS US, LLC 2003-10-23 US claimed
EP-1354980-A1 Method for forming a porous SiOCH layer. AIR PRODUCTS AND CHEMICALS, INC. (US) 2003-10-22 EP claimed
US-20250223384-A1 METHOD FOR MANUFACTURING PROPYLENE POLYMER MATERIAL SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2025-07-10 US disclosed
WO-2023190470-A1 METHOD FOR PRODUCING PROPYLENE POLYMER MATERIAL 住友化学株式会社 2023-10-05 WO disclosed
WO-2023190469-A1 MODIFIED POLYOLEFIN PRODUCTION METHOD 住友化学株式会社 2023-10-05 WO disclosed
US-11033507-B2 Method of synthesis of silica vesicles and use thereof THE UNIVERSITY OF QUEENSLAND (AU) 2021-06-15 US disclosed
US-5489634-A EFFICIENT SELECTIVE CATALYTIC POLYMERIZATION OF ALPHA-OLEFINS YIELDS HIGH MOLECULAR WEIGHT SPHERICAL PARTICLES HAVING HIGH BULK DENSITY, CONTROLLED PARTICLE SIZE AND MOLECULAR WEIGHT DISTRIBUTION TOSOH CORPORATION (JP) 1996-02-06 US disclosed
EP-0582943-A2 Method for producing a polyolefin TOSOH CORPORATION (JP) 1994-02-16 EP disclosed
EP-0582278-A2 Method for producing a polyolefin TOSOH CORPORATION (JP) 1994-02-09 EP disclosed
EP-0530814-A1 Method for producing a stereospecific polyolefin TOSOH CORPORATION (JP) 1993-03-10 EP disclosed