SCHEMBL3017696

SCHEMBL3017696

COC(=O)C1CN2CCN1CC2

nearest known ligand 0.48

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
MMP2 P08253 3/20 0.41
ANPEP P15144 3/20 0.41
GAA P10253 1/20 0.37
KDM4E B2RXH2 1/20 0.36
BRD4 O60885 1/20 0.35
TP53 P04637 1/20 0.35
POLB P06746 1/20 0.35
CYP1A2 P05177 1/20 0.35
CYP2C19 P33261 1/20 0.35
ALDH1A1 P00352 2/20 0.34
KMT2A Q03164 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3013238 0.76 TSHR (0.39) MMP2ANPEPBRD4TP53POLB
SCHEMBL3018094 0.75 TSHR (0.38) MMP2ANPEPGAAKDM4EBRD4
SCHEMBL7266837 0.71 POLB (0.45) MMP2ANPEPKDM4ETP53POLB
SCHEMBL3016583 0.71 MMP2 (0.38) MMP2ANPEPBRD4TP53POLB
SCHEMBL10794700 0.70
SCHEMBL12891657 0.70
SCHEMBL12765089 0.70
SCHEMBL13654462 0.69
SCHEMBL19170054 0.69
SCHEMBL9472426 0.68 POLB (0.43) MMP2ANPEPTP53POLBALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118176270-A Adhesive tape and processing method 电化株式会社 2024-06-11 CN disclosed
CN-117645573-A Method for synthesizing azoxystrobin without catalyst 江苏快达农化股份有限公司 2024-03-05 CN disclosed
WO-2023188714-A1 ADHESIVE TAPE AND PROCESSING METHOD デンカ株式会社 2023-10-05 WO disclosed
WO-2023085409-A1 ADHESIVE TAPE AND PROCESSING METHOD デンカ株式会社 2023-05-19 WO disclosed
US-9075304-B2 Method of producing ammonium salt compound, method of producing compound, and compound, polymeric compound, acid generator, resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2015-07-07 US disclosed
US-9075304-B2 Method of producing ammonium salt compound, method of producing compound, and compound, polymeric compound, acid generator, resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2015-07-07 US disclosed
US-20140017617-A1 METHOD OF PRODUCING AMMONIUM SALT COMPOUND, METHOD OF PRODUCING COMPOUND, AND COMPOUND, POLYMERIC COMPOUND, ACID GENERATOR, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2014-01-16 US disclosed
US-20140017617-A1 METHOD OF PRODUCING AMMONIUM SALT COMPOUND, METHOD OF PRODUCING COMPOUND, AND COMPOUND, POLYMERIC COMPOUND, ACID GENERATOR, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2014-01-16 US disclosed
US-20130260319-A1 METHOD OF PRODUCING POLYMERIC COMPOUND, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2013-10-03 US disclosed
US-20100204438-A1 METHOD FOR PRODUCING TEDA DERIVATIVES BASF SE (DE) 2010-08-12 US disclosed
EP-2197882-A2 METHOD FOR PRODUCING TEDA DERIVATIVES Basf Se (DE) 2010-06-23 EP disclosed
WO-2009030649-A2 METHOD FOR PRODUCING TEDA DERIVATIVES BASF SE (DE) 2009-03-12 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100204438-A1 METHOD FOR PRODUCING TEDA DERIVATIVES TES, TRRAP, NAAA MMP2 3185/4885ANPEP 3214/4885GAA 3017/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.