SCHEMBL301920

SCHEMBL301920

CNc1ccc(-c2ccc(N)c(C)c2)cc1

nearest known ligand 0.68

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 6/20 0.68
▸ TDP1 Q9NUW8 5/20 0.68
▸ CYP3A4 P08684 5/20 0.68
▸ TSHR P16473 2/20 0.68
▸ ALOX15 P16050 2/20 0.46
▸ RECQL P46063 2/20 0.46
▸ THRB P10828 1/20 0.46
▸ HIF1A Q16665 1/20 0.46
▸ KIF11 P52732 1/20 0.42
▸ MEN1 O00255 1/20 0.39
▸ KMT2A Q03164 1/20 0.39
▸ NPC1 O15118 2/20 0.38
▸ RAB9A P51151 2/20 0.38
▸ SMN1; SMN2 Q16637 2/20 0.38
▸ MAPT P10636 2/20 0.38
▸ KDM4E B2RXH2 1/20 0.38
▸ PKM P14618 1/20 0.38
▸ HSD17B10 Q99714 4/20 0.36
▸ APP P05067 4/20 0.36
▸ S100B P04271 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8954009 0.85 CYP3A4 (0.94) ALDH1A1TDP1CYP3A4TSHRALOX15
SCHEMBL10826314 0.83 CYP3A4 (0.57) ALDH1A1TDP1CYP3A4TSHRALOX15
Orthotolidine SCHEMBL49414 0.82 CYP3A4 (1.00) ALDH1A1TDP1CYP3A4TSHRALOX15
Orthotolidine SCHEMBL29386552 0.82 CYP3A4 (1.00) ALDH1A1TDP1CYP3A4TSHRALOX15
Orthotolidine SCHEMBL29365329 0.82 CYP3A4 (1.00) ALDH1A1TDP1CYP3A4TSHRALOX15
Hydrochloric Acid SCHEMBL11092761 0.81 CYP3A4 (0.55) ALDH1A1TDP1CYP3A4TSHRALOX15
Hydrochloric Acid SCHEMBL11439401 0.81 CYP3A4 (0.55) ALDH1A1TDP1CYP3A4TSHRALOX15
SCHEMBL13105724 0.81 KIF11 (0.47) ALDH1A1TDP1CYP3A4TSHRKIF11
Orthotolidine SCHEMBL6009632 0.80 CYP3A4 (0.94) ALDH1A1TDP1CYP3A4TSHRALOX15
Orthotolidine SCHEMBL20547383 0.80 CYP3A4 (0.94) ALDH1A1TDP1CYP3A4TSHRALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 56 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240182645-A1 POLY(AMIC ACID) COMPOSITION, POLYIMIDE COMPOSITION, ADHESIVE, AND LAMINATE MITSUI CHEMICALS, INC. (JP) 2024-06-06 — — US disclosed
US-20240182765-A1 POLYAMIC ACID COMPOSITION, POLYIMIDE COMPOSITION, ADHESIVE AND LAMINATE MITSUI CHEMICALS, INC. (JP) 2024-06-06 — — US disclosed
CN-117043231-A Polyamic acid composition, polyimide composition, adhesive, and laminate 三井化学株式会社 2023-11-10 — — CN disclosed
CN-112752644-B Stretchable multilayer films, methods of forming and applying, and articles formed therefrom 庞贝捷先进表面技术有限责任公司 2023-07-25 — — CN disclosed
WO-2022210321-A1 POLY(AMIC ACID) COMPOSITION, POLYIMIDE COMPOSITION, ADHESIVE, AND LAYERED PRODUCT 三井化学株式会社 2022-10-06 — — WO disclosed
WO-2022202416-A1 POLYAMIDE ACID COMPOSITION, POLYIMIDE COMPOSITION, ADHESIVE AND LAMINATE 三井化学株式会社 2022-09-29 — — WO disclosed
EP-3829853-A2 STRETCHABLE MULTI-LAYER FILM, METHOD OF FORMATION AND APPLICATION, AND ARTICLES THEREFROM Entrotech, Inc. (US) 2021-06-09 — — EP disclosed
CN-112752644-A Stretchable multilayer films, methods of formation and use, and articles formed therefrom 安特科技有限公司 2021-05-04 — — CN disclosed
US-10988647-B2 Semiconductor substrate manufacturing method, semiconductor device, and method for manufacturing same MITSUI CHEMICALS, INC. (JP) 2021-04-27 — — US disclosed
US-20210078307-A1 Stretchable Multi-Layer Film, Method of Formation and Application, and Articles Therefrom ENTROTECH, INC. (US) 2021-03-18 — — US disclosed
EP-0106902-A1 Sulfur-modified polypropylene ether glycols, a method for preparing them, and polyurethanes prepared therefrom E.I. DU PONT DE NEMOURS AND COMPANY (US) 1984-05-02 — — EP disclosed
EP-0106903-A1 Mixture of sulfur-modified and unmodified copolyether glycols and polyurethanes prepared therefrom E.I. DU PONT DE NEMOURS AND COMPANY (US) 1984-05-02 — — EP disclosed
US-4383100-A AUTOMOBILES; TIRES; HARDNESS E. I. DU PONT DE NEMOURS AND COMPANY (US) 1983-05-10 — — US disclosed
US-4374970-A Sulfur-modified copolyether glycols, a method for preparing them, and polyurethanes prepared therefrom E. I. DU PONT DE NEMOURS AND COMPANY (US) 1983-02-22 — — US disclosed
US-4373084-A HEAT AND OXYGEN RESISTANCE E. I. DU PONT DE NEMOURS AND COMPANY (US) 1983-02-08 — — US disclosed
US-4371687-A Sulfur-modified polytetramethylene ether glycols, a method for preparing them, and polyurethanes prepared therefrom E. I. DU PONT DE NEMOURS AND COMPANY (US) 1983-02-01 — — US disclosed
US-4355119-A Oligomeric formal diols of poly(tetramethylene ether) glycol and polyurethanes prepared therefrom E. I. DUPONT DE NEMOURS AND COMPANY (US) 1982-10-19 — — US disclosed
US-4340719-A Oligomeric formal diols of poly(tetramethylene ether) glycol and polyurethanes prepared therefrom E. I. DU PONT DE NEMOURS AND COMPANY (US) 1982-07-20 — — US disclosed
EP-0048338-A1 Oligomeric formal diols of copolymer glycols E.I. DU PONT DE NEMOURS AND COMPANY (US) 1982-03-31 — — EP disclosed
US-4014832-A POLYIMIDES NITTO ELECTRIC INDUSTRIAL CO., LTD. (JA) 1977-03-29 — — US disclosed
Send feedback