Methacrylic Acid

Methacrylic Acid

SCHEMBL3020182

C=C(C)C(=O)O.C=CC=C.C=Cc1ccccc1C=C

nearest known ligand 0.41

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 2/20 0.41
HPGD P15428 1/20 0.40
AKR1C3 P42330 1/20 0.39
ALDH1A1 P00352 3/20 0.39
AKT1 P31749 1/20 0.38
HTT P42858 1/20 0.37
LMNA P02545 1/20 0.36
MAPT P10636 1/20 0.36
CA12 O43570 1/20 0.35
CA1 P00915 1/20 0.35
CA2 P00918 1/20 0.35
CA9 Q16790 1/20 0.35
GLA P06280 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
CYP2C9 P11712 1/20 0.35
ELANE P08246 1/20 0.35
TSHR P16473 1/20 0.34
CES2 O00748 1/20 0.34
CES1 P23141 1/20 0.34
TGM2 P21980 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL301490 0.96 KDM4E (0.42) KDM4EHPGDAKR1C3ALDH1A1AKT1
Methacrylic Acid SCHEMBL8110276 0.96 KDM4E (0.42) KDM4EHPGDAKR1C3ALDH1A1AKT1
Methacrylic Acid SCHEMBL4421004 0.90 KDM4E (0.40) KDM4EHPGDAKR1C3ALDH1A1AKT1
Methacrylic Acid SCHEMBL29044765 0.89 ALDH1A1 (0.42) KDM4EHPGDAKR1C3ALDH1A1AKT1
Methacrylic Acid SCHEMBL126705 0.89 KDM4E (0.39) KDM4EHPGDAKR1C3ALDH1A1AKT1
Methacrylic Acid SCHEMBL641785 0.89 KDM4E (0.39) KDM4EHPGDAKR1C3ALDH1A1AKT1
Styrene SCHEMBL28745769 0.89 ALDH1A1 (0.52) KDM4EHPGDAKR1C3ALDH1A1AKT1
Methacrylic Acid SCHEMBL8620013 0.88 ALDH1A1 (0.47) KDM4EHPGDALDH1A1LMNAMAPT
Methacrylic Acid SCHEMBL27548067 0.87 ALDH1A1 (0.44) KDM4EHPGDAKR1C3ALDH1A1AKT1
Methacrylic Acid SCHEMBL3260705 0.85 MAPT (0.50) KDM4EHPGDAKR1C3ALDH1A1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8455173-B2 Photosensitive insulating resin composition, cured product of the composition, and method of producing insulating film JSR CORPORATION (JP) 2013-06-04 US disclosed
US-20100196822-A1 PHOTOSENSITIVE INSULATING RESIN COMPOSITION, CURED PRODUCT OF THE COMPOSITION, AND METHOD OF PRODUCING INSULATING FILM JSR CORPORATION (JP) 2010-08-05 US disclosed