SCHEMBL30210216

SCHEMBL30210216

O=C(OCOC1CCCCCCC1)C1CC2CC1C1C3C=CC(C3)C21

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30210066 1.00 HSD11B1 (0.31) HSD11B1
SCHEMBL30210003 0.99
SCHEMBL30209807 0.83 CYP2C19 (0.33)
SCHEMBL30210287 0.83 CYP2C19 (0.33)
SCHEMBL30209917 0.83 CYP3A4 (0.36) HSD11B1
SCHEMBL30210139 0.82 LMNA (0.34)
SCHEMBL30210214 0.81 CYP19A1 (0.32)
SCHEMBL30209960 0.81 CYP3A4 (0.34) HSD11B1
SCHEMBL30209998 0.80
SCHEMBL30209987 0.80

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11886119-B2 Material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate MITSUI CHEMICALS, INC. (JP) 2024-01-30 US disclosed
US-20230185195-A1 MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE MITSUI CHEMICALS, INC. (JP) 2023-06-15 US disclosed
US-11599025-B2 Resin material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate MITSUI CHEMICALS, INC. (JP) 2023-03-07 US disclosed