SCHEMBL30217832

SCHEMBL30217832

CC(=O)Oc1ccc([S+](C)Cc2ccccc2)cc1.F[Sb-](F)(F)(F)(F)F

nearest known ligand 0.47

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
▸ GAA P10253 3/20 0.47
▸ ELANE P08246 1/20 0.46
▸ NPC1 O15118 1/20 0.45
▸ RAB9A P51151 1/20 0.45
▸ SMN1; SMN2 Q16637 1/20 0.45
▸ MAPT P10636 3/20 0.44
▸ ALDH1A1 P00352 3/20 0.44
▸ HSP90AA1 P07900 1/20 0.44
▸ HSD17B10 Q99714 2/20 0.42
▸ LMNA P02545 2/20 0.40
▸ TDP1 Q9NUW8 1/20 0.40
▸ BACE1 P56817 2/20 0.39
▸ KMT2A Q03164 3/20 0.39
▸ PKM P14618 2/20 0.39
▸ POLB P06746 2/20 0.39
▸ KDM4E B2RXH2 1/20 0.39
▸ TSHR P16473 1/20 0.39
▸ HTT P42858 1/20 0.39
▸ MEN1 O00255 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL156358 0.94 ELANE (0.51) GAAELANENPC1RAB9ASMN1; SMN2
SCHEMBL9241421 0.92 GAA (0.47) GAAELANENPC1RAB9ASMN1; SMN2
SCHEMBL30217900 0.92 GAA (0.47) GAAELANENPC1RAB9ASMN1; SMN2
SCHEMBL30031154 0.86 RAB9A (0.39) GAANPC1RAB9ASMN1; SMN2MAPT
Trifluoromethanesulfonic Acid SCHEMBL4165790 0.85 GAA (0.41) GAAELANENPC1RAB9ASMN1; SMN2
SCHEMBL30243179 0.85 GAA (0.41) GAAELANENPC1RAB9ASMN1; SMN2
SCHEMBL10440732 0.82 KMT2A (0.39) GAAELANENPC1RAB9ASMN1; SMN2
SCHEMBL13220643 0.81 ELANE (0.39) GAAELANENPC1RAB9AKMT2A
SCHEMBL13220642 0.80 RAB9A (0.43) GAANPC1RAB9ASMN1; SMN2MAPT
SCHEMBL8757318 0.80 GAA (0.42) GAAELANENPC1RAB9ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024117367-A1 DUAL CURABLE CERAMIC SLURRY COMPOSITION FOR 3D PRINTING AND METHOD FOR MANUFACTURING DUAL CURABLE CERAMIC STRUCTURE USING SAME 창원대학교 산학협력단 2024-06-06 — — WO disclosed
EP-4130877-A1 NEGATIVE RESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-02-08 — — EP disclosed
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