SCHEMBL156358

SCHEMBL156358

CC(=O)Oc1ccc([S+](C)Cc2ccccc2)cc1

nearest known ligand 0.51

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
▸ ELANE P08246 1/20 0.51
▸ GAA P10253 3/20 0.51
▸ NPC1 O15118 1/20 0.49
▸ RAB9A P51151 1/20 0.49
▸ SMN1; SMN2 Q16637 1/20 0.49
▸ MAPT P10636 3/20 0.49
▸ ALDH1A1 P00352 3/20 0.49
▸ HSP90AA1 P07900 1/20 0.49
▸ HSD17B10 Q99714 2/20 0.46
▸ LMNA P02545 2/20 0.44
▸ TDP1 Q9NUW8 1/20 0.43
▸ BACE1 P56817 2/20 0.43
▸ KMT2A Q03164 3/20 0.42
▸ PKM P14618 2/20 0.42
▸ POLB P06746 2/20 0.42
▸ KDM4E B2RXH2 1/20 0.42
▸ MEN1 O00255 1/20 0.42
▸ TSHR P16473 1/20 0.42
▸ HTT P42858 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9241421 0.94 GAA (0.47) ELANEGAANPC1RAB9ASMN1; SMN2
SCHEMBL30217832 0.94 GAA (0.47) ELANEGAANPC1RAB9ASMN1; SMN2
SCHEMBL30217900 0.94 GAA (0.47) ELANEGAANPC1RAB9ASMN1; SMN2
SCHEMBL10440732 0.88 KMT2A (0.39) ELANEGAANPC1RAB9ASMN1; SMN2
SCHEMBL30243179 0.87 GAA (0.41) ELANEGAANPC1RAB9ASMN1; SMN2
Trifluoromethanesulfonic Acid SCHEMBL4165790 0.87 GAA (0.41) ELANEGAANPC1RAB9ASMN1; SMN2
SCHEMBL13220642 0.85 RAB9A (0.43) GAANPC1RAB9ASMN1; SMN2MAPT
SCHEMBL8757318 0.84 GAA (0.42) ELANEGAANPC1RAB9ASMN1; SMN2
SCHEMBL13220643 0.82 ELANE (0.39) ELANEGAANPC1RAB9AKMT2A
SCHEMBL30921561 0.82 ELANE (0.56) ELANEGAANPC1RAB9ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12428553-B2 Resin composition SOLUS ADVANCED MATERIALS CO., LTD. (KR) 2025-09-30 — — US claimed
CN-114793438-B Resin composition 索路思高新材料有限公司 2024-04-23 — — CN claimed
CN-114793438-A Resin composition 索路思高新材料有限公司 2022-07-26 — — CN claimed
WO-2022108238-A1 RESIN COMPOSITION 솔루스첨단소재 주식회사 2022-05-27 — — WO claimed
US-8575234-B2 Ink composition, and method of forming pattern, color filter and method of preparing color filter using the same SAMSUNG DISPLAY CO., LTD. (KR) 2013-11-05 — — US claimed
US-20120058273-A1 INK COMPOSITION, AND METHOD OF FORMING PATTERN, COLOR FILTER AND METHOD OF PREPARING COLOR FILTER USING THE SAME DONGWOO FINE-CHEM CO., LTD. (KR) 2012-03-08 — — US claimed
EP-0331496-B1 POLYFLUORIDE SULFONIUM COMPOUNDS AND POLYMERIZATION INITIATOR THEREOF SANSHIN KAGAKU KOGYO CO., LTD. (JP) 1992-09-16 — — EP claimed
US-20260117060-A1 High refractive index and high adhesion epoxy resin composition and encapsulation material comprising the same SOLUS ADVANCED MATERIALS CO LTD (KR) 2026-04-30 — — US disclosed
US-20260117104-A1 High refractive index and high adhesion epoxy resin composition and encapsulation material comprising the same SOLUS ADVANCED MATERIALS CO LTD (KR) 2026-04-30 — — US disclosed
US-20250368849-A1 High temperature stability epoxy resin composition and encapsulation material comprising the same SOLUS ADVANCED MATERIALS CO LTD (KR) 2025-12-04 — — US disclosed
EP-4644454-A1 HIGH-REFRACTIVE-INDEX AND HIGH-ADHESION EPOXY RESIN COMPOSITION AND ENCAPSULANT COMPRISING SAME Solus Advanced Materials Co., Ltd. (KR) 2025-11-05 — — EP disclosed
CN-115836100-B Polymerizable composition, cured product, and method for producing cured product 株式会社艾迪科 2024-12-17 — — CN disclosed
WO-2024117367-A1 DUAL CURABLE CERAMIC SLURRY COMPOSITION FOR 3D PRINTING AND METHOD FOR MANUFACTURING DUAL CURABLE CERAMIC STRUCTURE USING SAME 창원대학교 산학협력단 2024-06-06 — — WO disclosed
US-20180162989-A1 LOW TEMPERATURE CURING COMPOSITION, CURED FILM FORMED THEREFROM, AND ELECTRONIC DEVICE HAVING CURED FILM SAMSUNG SDI CO., LTD. (KR) 2018-06-14 — — US disclosed
US-20180162989-A1 LOW TEMPERATURE CURING COMPOSITION, CURED FILM FORMED THEREFROM, AND ELECTRONIC DEVICE HAVING CURED FILM SAMSUNG SDI CO., LTD. (KR) 2018-06-14 — — US disclosed
EP-2996170-A1 PACKAGING MATERIAL FOR BATTERIES Dai Nippon Printing Co., Ltd. (JP) 2016-03-16 — — EP disclosed
US-8575234-B2 Ink composition, and method of forming pattern, color filter and method of preparing color filter using the same SAMSUNG DISPLAY CO., LTD. (KR) 2013-11-05 — — US disclosed
US-20120058273-A1 INK COMPOSITION, AND METHOD OF FORMING PATTERN, COLOR FILTER AND METHOD OF PREPARING COLOR FILTER USING THE SAME DONGWOO FINE-CHEM CO., LTD. (KR) 2012-03-08 — — US disclosed
US-7785768-B2 Thermoacid generator for antireflection film formation, composition for antireflection film formation, and antireflection film made therefrom TOKYO OHKA KOGYO CO. LTD. (JP) 2010-08-31 — — US disclosed
US-20090130595-A1 Thermoacid Generator for Antireflection Film Formation, Composition for Antireflection Film Formation, and Antireflection Film Made Therefrom TOKYO OHKA KOGYO CO., LTD. (JP) 2009-05-21 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260117060-A1 High refractive index and high adhesion epoxy resin composition and encapsulation material comprising the same ITGA5, ICAM1, ITGA1 ELANE 1899/4885GAA 3168/4885NPC1 1796/4885
US-20260117104-A1 High refractive index and high adhesion epoxy resin composition and encapsulation material comprising the same STRA6, ITGB6, ITGA6 ELANE 1601/4885GAA 3566/4885NPC1 2031/4885
US-20090130595-A1 Thermoacid Generator for Antireflection Film Formation, Composition for Antireflection Film Formation, and Antireflection Film Made Therefrom RTF1, RO60, PUF60 ELANE 3273/4885GAA 3866/4885NPC1 4761/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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