⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2747141 | 0.82 | CA12 (0.37) | — | |
| SCHEMBL19874194 | 0.79 | CA2 (0.32) | — | |
| SCHEMBL12962181 | 0.77 | SCN9A (0.31) | — | |
| SCHEMBL19294579 | 0.76 | ALDH1A1 (0.34) | — | |
| SCHEMBL19293552 | 0.74 | ALDH1A1 (0.39) | — | |
| SCHEMBL13556201 | 0.73 | ALDH1A1 (0.32) | — | |
| SCHEMBL4855493 | 0.70 | ALDH1A1 (0.39) | — | |
| SCHEMBL23964603 | 0.69 | — | — | |
| SCHEMBL3028193 | 0.68 | ESR1 (0.36) | — | |
| SCHEMBL12759007 | 0.68 | GRIN2D (0.36) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20100203446-A1 | CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND METHOD FOR FORMING PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-08-12 | — | — | US | disclosed |
| US-7611822-B2 | Positive resist composition used for semiconductor microfabrication employing a lithography process contains an acid generator comprising a compound generating an acid by irradiation and a monomer having a bulky and acid-labile group | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-11-03 | — | — | US | disclosed |
| US-20090042128-A1 | Positive resist composition used for semiconductor microfabrication employing a lithography process contains an acid generator comprising a compound generating an acid by irradiation and a monomer having a bulky and acid-labile group | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-02-12 | — | — | US | disclosed |