SCHEMBL3027745

SCHEMBL3027745

CCCOC(C)C(=O)OCC

nearest known ligand 0.40

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.40
LMNA P02545 2/20 0.39
HSD17B10 Q99714 2/20 0.39
ALOX15 P16050 1/20 0.37
MGAM O43451 1/20 0.37
GAA P10253 1/20 0.37
SI P14410 1/20 0.37
MGAM2 Q2M2H8 1/20 0.37
SOAT1 P35610 1/20 0.37
L3MBTL1 Q9Y468 1/20 0.36
TRPA1 O75762 1/20 0.34
KMT2A Q03164 2/20 0.34
HCAR2 Q8TDS4 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
MEN1 O00255 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
HPGD P15428 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9786483 1.00 ALDH1A1 (0.40) ALDH1A1LMNAHSD17B10ALOX15MGAM
SCHEMBL20254014 0.89 ALDH1A1 (0.39) ALDH1A1LMNAHSD17B10ALOX15MGAM
SCHEMBL2388844 0.89 ALDH1A1 (0.39) ALDH1A1LMNAHSD17B10ALOX15MGAM
SCHEMBL3027521 0.88 HCAR2 (0.39) ALDH1A1LMNAHSD17B10HCAR2TDP1
SCHEMBL446065 0.87 ALDH1A1 (0.45) ALDH1A1LMNAL3MBTL1KMT2AHCAR2
SCHEMBL14570068 0.87 ALDH1A1 (0.45) ALDH1A1LMNAL3MBTL1KMT2AHCAR2
SCHEMBL9487326 0.85 NAAA (0.44) ALDH1A1HCAR2
SCHEMBL28567775 0.84 ALDH1A1 (0.34) ALDH1A1LMNAHSD17B10HCAR2TDP1
SCHEMBL10868226 0.84 NAAA (0.47) ALDH1A1LMNAHCAR2
SCHEMBL10867512 0.84 NAAA (0.47) ALDH1A1LMNAHCAR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119065043-A Composition, optical film, layer, optical filter, optical element, solid-state imaging device, and camera module JSR株式会社 2024-12-03 CN disclosed
CN-115667404-B Curable resin composition, cured film, laminate, method for producing cured film, and semiconductor device 富士胶片株式会社 2024-05-03 CN disclosed
US-8409783-B2 Copolymer, resin composition, spacer for display panel, planarization film, thermosetting protective film, microlens, and process for producing copolymer TOKYO OHKA KOGYO CO., LTD. (JP) 2013-04-02 US disclosed
US-20100209847-A1 COPOLYMER, RESIN COMPOSITION, SPACER FOR DISPLAY PANEL, PLANARIZATION FILM, THERMOSETTING PROTECTIVE FILM, MICROLENS, AND PROCESS FOR PRODUCING COPOLYMER TOKYO OHKA KOGYO CO., LTD. (JP) 2010-08-19 US disclosed
US-7713680-B2 Radiation sensitive resin composition for forming a protective film, method of forming a protective film from the composition, liquid crystal display device and solid-state image sensing device JSR CORPORATION (JP) 2010-05-11 US disclosed
US-20080233515-A1 RADIATION SENSITIVE RESIN COMPOSITION FOR FORMING A PROTECTIVE FILM, METHOD OF FORMING A PROTECTIVE FILM FROM THE COMPOSITION, LIQUID CRYSTAL DISPLAY DEVICE AND SOLID-STATE IMAGE SENSING DEVICE JSR CORPORATION (JP) 2008-09-25 US disclosed
EP-1972673-A1 Radiation sensitive resin composition for forming a protective film, method of forming a protective film from the composition, liquid crystal display device and solid-state image sensing device JSR Corporation (JP) 2008-09-24 EP disclosed
CN-1262632-C Bleach compositions containing metal bleach catalyst, and bleach activators and/or organic percarboxylic acids PROCTER & GAMBLE (US) 2006-07-05 CN disclosed
EP-1632794-A2 Radiation sensitive resin composition for forming microlens JSR Corporation (JP) 2006-03-08 EP disclosed
US-20060008735-A1 Radiation sensitive resin composition for forming microlens JSR CORPORATION (JP) 2006-01-12 US disclosed
CN-1291224-A granular composition with improved dissolution PROCTER & GAMBLE (US) 2001-04-11 CN disclosed
US-6168908-B1 COATING AN ALKALI-SOLUBLE THERMOSETTING RESIN ON A SUBSTRATE, AND BAKING IT, COATING A RADIATION SENSITIVE RESIN ON THE COATED FILM, AND BAKING, EXPOSING THE RADIATION SENSITIVE FILM TO A RADIATION THROUGH A MASK AND BAKING, DEVELOPING JSR CORPORATION (JP) 2001-01-02 US disclosed
CN-1261823-A Catalyst and method for catalytic oxidation UNIV KANSAS (US) 2000-08-02 CN disclosed
CN-1260830-A Bleach compositions PROCTER & GAMBLE (US) 2000-07-19 CN disclosed
CN-1253583-A Bleach compositions containing metal bleach catalyst, and bleach activators and/or organic percarboxylic acids PROCTER & GAMBLE (US) 2000-05-17 CN disclosed
EP-0562819-B1 Resist coating composition JSR CORP (JP) 1999-12-01 EP disclosed
EP-0908780-A1 Process for forming a cured film of a thermosetting resin JSR Corporation (JP) 1999-04-14 EP disclosed
EP-0562819-A2 Resist coating composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1993-09-29 EP disclosed
US-5055222-A Enantiomorph for use in liquid crystal display elements CHISSO CORPORATION (JP) 1991-10-08 US disclosed
EP-0267758-A2 Alpha-substituted-propionic acid esters Chisso Corporation (JP) 1988-05-18 EP disclosed