⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3729744 | 1.00 | — | — | |
| SCHEMBL721854 | 1.00 | — | — | |
| Water SCHEMBL3354792 | 0.97 | — | — | |
| Glycerin SCHEMBL28966317 | 0.97 | THRB (0.61) | — | |
| SCHEMBL9693830 | 0.94 | THRB (0.58) | — | |
| SCHEMBL8952135 | 0.94 | THRB (0.77) | — | |
| SCHEMBL4601586 | 0.94 | THRB (0.58) | — | |
| SCHEMBL18192368 | 0.94 | THRB (0.58) | — | |
| Glycerin SCHEMBL9407350 | 0.91 | THRB (0.72) | — | |
| SCHEMBL35437 | 0.90 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 6078 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119751802-B | Polyurethane resin, polyurethane synthetic leather, and preparation method and application thereof | ZHEJIANG HUAFON SYNTHETIC RESIN Co.,Ltd. (CN) | 2026-05-26 | — | — | CN | claimed |
| CN-122082033-A | Composite photoelectrode for preparing ketone compound from photoelectrocatalytic polyol, preparation method and application | — | 2026-05-26 | — | — | CN | claimed |
| CN-122033237-A | Vulcanized nano zero-valent iron and preparation method and application thereof | 中国石油化工股份有限公司 | 2026-05-15 | — | — | CN | claimed |
| EP-3527624-B1 | POLYOXYMETHYLENE RESIN COMPOSITION | KOREA ENG PLASTICS CO LTD (KR) | 2025-11-26 | — | — | EP | claimed |
| US-12454597-B2 | Polyester resin | MITSUBISHI CHEMICAL CORPORATION (JP) | 2025-10-28 | — | — | US | claimed |
| EP-4624554-A1 | FABRIC CARE COMPOSITIONS | The Procter & Gamble Company (US) | 2025-10-01 | — | — | EP | claimed |
| EP-4621488-A1 | RINSE SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMATION METHOD USING SAME | Ycchem Co., Ltd. (KR) | 2025-09-24 | — | — | EP | claimed |
| US-20250236813-A1 | RINSE SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMATION METHOD USING SAME | YCCHEM CO., LTD. (KR) | 2025-07-24 | — | — | US | claimed |
| US-12325844-B2 | Photoresist remover | VERSUM MATERIALS US, LLC (US) | 2025-06-10 | — | — | US | claimed |
| EP-4370582-B1 | POLYESTER COMPOUNDS AND THEIR USES | BASF SE (DE) | 2025-06-04 | — | — | EP | claimed |
| EP-0164257-B1 | TONER FOR DEVELOPING ELECTROSTATIC LATENT IMAGE | KONICA CORPORATION (JP) | 1991-04-17 | — | — | EP | claimed |
| US-4933252-A | Toners | KAO CORPORATION (JP) | 1990-06-12 | — | — | US | claimed |
| US-4917983-A | Toner for developing an electrostatic latent image comprising linear polyester polymer | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1990-04-17 | — | — | US | claimed |
| US-4877704-A | WITH ALKYLENE-BIS-ALIPHATIC ACID AMIDE AND WAX; LOW TEMPERATURE FIXABILITY, STABILITY | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1989-10-31 | — | — | US | claimed |
| EP-0337613-A1 | Device comprising means for protecting and dispensing fluid sensitive medicament | ALZA CORPORATION (US) | 1989-10-18 | — | — | EP | claimed |
| US-4855141-A | Device comprising means for protecting and dispensing fluid sensitive medicament | ALZA CORPORATION (US) | 1989-08-08 | — | — | US | claimed |
| US-4804622-A | POLYESTER BINDER | KAO CORPORATION (JP) | 1989-02-14 | — | — | US | claimed |
| US-4693952-A | POLYESTER, EPOXY RESIN | KONISHIROKU PHOTO INDUSTRY CO., LTD. | 1987-09-15 | — | — | US | claimed |
| EP-0236280-A1 | Injectable pharmaceutical formulations of active principles having general anaesthetic activity | Mazzarella, Basilio (IT) | 1987-09-09 | — | — | EP | claimed |
| US-4579802-A | APPLYING AN AGENT FOR IMPROVING ELASTICITY TO PREVENT BACK CONTAMINATION | KONISHIROKU PHOTO INDUSTRY CO. LTD. (JP) | 1986-04-01 | — | — | US | claimed |