⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4274065 | 0.75 | — | — | |
| SCHEMBL1999095 | 0.74 | — | — | |
| SCHEMBL2007143 | 0.74 | — | — | |
| SCHEMBL776535 | 0.73 | — | — | |
| SCHEMBL20591244 | 0.73 | — | — | |
| SCHEMBL408354 | 0.73 | — | — | |
| SCHEMBL26574 | 0.73 | — | — | |
| SCHEMBL31471457 | 0.70 | — | — | |
| SCHEMBL22117325 | 0.70 | LMNA (0.36) | — | |
| Fluoride SCHEMBL21137227 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 90 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10566208-B2 | Plasma etching method | ZEON CORPORATION (JP) | 2020-02-18 | — | — | US | claimed |
| US-20190252202-A1 | PLASMA ETCHING METHOD | ZEON CORPORATION (JP) | 2019-08-15 | — | — | US | claimed |
| US-20190228983-A1 | PLASMA ETCHING METHOD | ZEON CORPORATION (JP) | 2019-07-25 | — | — | US | claimed |
| EP-3506335-A1 | PLASMA ETCHING METHOD | Zeon Corporation (JP) | 2019-07-03 | — | — | EP | claimed |
| CN-109564868-A | Plasma-etching method | 日本瑞翁株式会社 | 2019-04-02 | — | — | CN | claimed |
| EP-3435408-A1 | PLASMA ETCHING METHOD | Zeon Corporation (JP) | 2019-01-30 | — | — | EP | claimed |
| EP-2280318-B1 | FLUOROELASTOMER-CONTAINING INTERMEDIATE TRANSFER MEMBERS | XEROX CORP (US) | 2018-07-04 | — | — | EP | claimed |
| US-8418530-B1 | Compositions and methods for detecting leaks in HVAC/R systems | MAINSTREAM ENGINEERING CORPORATION (US) | 2013-04-16 | — | — | US | claimed |
| US-8329301-B2 | Fluoroelastomer containing intermediate transfer members | XEROX CORPORATION (US) | 2012-12-11 | — | — | US | claimed |
| US-7960331-B2 | Replacement solvents having improved properties and methods of using the same | GRZYLL LAWRENCE R | 2011-06-14 | — | — | US | claimed |
| US-20110027709-A1 | FLUOROELASTOMER CONTAINING INTERMEDIATE TRANSFER MEMBERS | XEROX CORPORATION (US) | 2011-02-03 | — | — | US | claimed |
| EP-2280318-A2 | Fluoroelastomer containing intermediate transfer members | Xerox Corporation (US) | 2011-02-02 | — | — | EP | claimed |
| US-7429557-B2 | Replacement solvents having improved properties and methods of using the same | MAINSTREAM ENGINEERING CORPORATION (US) | 2008-09-30 | — | — | US | claimed |
| US-20060266976-A1 | Compositions comprising bromofluoro-olefins and uses thereof | E. I. DU PONT DE NEMOURS AND COMPANY | 2006-11-30 | — | — | US | claimed |
| EP-4556084-A1 | NOVEL UNSATURATED HYDROBROMOFLUOROCARBON FIRE SUPPRESSANTS | Kidde Graviner Limited (GB) | 2025-05-21 | — | — | EP | disclosed |
| US-20250154084-A1 | NOVEL UNSATURATED HYDROBROMOFLUOROCARBON FIRE SUPPRESSANTS | KIDDE GRAVINER LIMITED (GB) | 2025-05-15 | — | — | US | disclosed |
| US-20240105466-A1 | METHOD FOR FORMING PATTERN OF METAL OXIDE AND METHOD FOR PRODUCING SEMICONDUCTOR ELEMENT | RESONAC CORPORATION (JP) | 2024-03-28 | — | — | US | disclosed |
| EP-1267223-A2 | Surface contacting member for toner fusing system and process, composition for member surface layer, and process for preparing composition | Heidelberger Druckmaschinen Aktiengesellschaft (DE) | 2002-12-18 | — | — | EP | disclosed |
| EP-1267222-A1 | Toner fusing system with an external heating member | Heidelberger Druckmaschinen Aktiengesellschaft (DE) | 2002-12-18 | — | — | EP | disclosed |
| US-4101554-A | IODINE CATALYST | OLIN CORPORATION (US) | 1978-07-18 | — | — | US | disclosed |