SCHEMBL30366558

SCHEMBL30366558

Brc1ccc(Br)c2c(Br)cccc12

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 1/20 0.45
PARP1 P09874 1/20 0.41
CYP1B1 Q16678 8/20 0.41
AHR P35869 1/20 0.41
NOS1 P29475 1/20 0.38
AXL P30530 1/20 0.38
ALDH1A1 P00352 2/20 0.38
POLB P06746 1/20 0.38
RXFP1 Q9HBX9 1/20 0.38
BACE1 P56817 1/20 0.37
PRNP P04156 1/20 0.36
PDPK1 O15530 1/20 0.35
MEN1 O00255 1/20 0.34
APAF1 O14727 1/20 0.34
TDP2 O95551 1/20 0.34
MAPT P10636 1/20 0.34
CASP3 P42574 1/20 0.34
KMT2A Q03164 1/20 0.34
SENP8 Q96LD8 1/20 0.34
SENP7 Q9BQF6 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19417358 1.00 CYP1A2 (0.45) CYP1A2PARP1CYP1B1AHRNOS1
SCHEMBL5251847 0.83 ALDH1A1 (0.42) CYP1A2PARP1CYP1B1AHRALDH1A1
SCHEMBL18859387 0.83 ALDH1A1 (0.46) CYP1A2PARP1CYP1B1AHRAXL
SCHEMBL5251840 0.83 CYP1A2 (0.43) CYP1A2PARP1CYP1B1AHRNOS1
SCHEMBL28769423 0.83 CYP1A2 (0.39) CYP1A2PARP1CYP1B1AHRNOS1
SCHEMBL7298514 0.83 CYP1B1 (0.40) CYP1A2PARP1CYP1B1AHRALDH1A1
SCHEMBL8723752 0.83 CYP1A2 (0.43) CYP1A2PARP1CYP1B1AHRNOS1
SCHEMBL8723755 0.83 CYP1A2 (0.43) CYP1A2PARP1CYP1B1AHRNOS1
SCHEMBL3575204 0.82 CYP1A2 (0.45) CYP1A2PARP1CYP1B1AHRALDH1A1
SCHEMBL29405395 0.82 CYP1A2 (0.45) CYP1A2PARP1CYP1B1AHRALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115991815-B Halogenated modified prepared photoresist resin material and preparation method thereof 中国科学院长春应用化学研究所 2025-03-07 CN disclosed
CN-115991815-A Halogenated modified prepared photoresist resin material and preparation method thereof 中国科学院长春应用化学研究所 2023-04-21 CN disclosed