SCHEMBL3043085

SCHEMBL3043085

OCc1cc2cc3cc4cc5ccccc5cc4cc3cc2cc1CO

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PDE4A P27815 1/20 0.48
PDE4B Q07343 1/20 0.48
PDE4C Q08493 1/20 0.48
PDE4D Q08499 1/20 0.48
ALDH1A1 P00352 2/20 0.42
HSD17B10 Q99714 2/20 0.42
CYP3A4 P08684 1/20 0.42
ALOX15 P16050 1/20 0.42
CASP1 P29466 1/20 0.42
CASP7 P55210 1/20 0.42
HBB P68871 1/20 0.42
HIF1A Q16665 1/20 0.42
TDP1 Q9NUW8 1/20 0.42
MEN1 O00255 2/20 0.41
KMT2A Q03164 2/20 0.41
APOBEC3G Q9HC16 1/20 0.41
CYP2A6 P11509 2/20 0.40
HTR2A P28223 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
CYP1A2 P05177 2/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL901034 1.00 PDE4A (0.48) PDE4APDE4BPDE4CPDE4DALDH1A1
SCHEMBL29583446 0.95 PDE4A (0.46) PDE4APDE4BPDE4CPDE4DALDH1A1
SCHEMBL430273 0.95 PDE4A (0.46) PDE4APDE4BPDE4CPDE4DALDH1A1
SCHEMBL15033126 0.82 ALDH1A1 (0.41) PDE4APDE4BPDE4CPDE4DALDH1A1
SCHEMBL1773980 0.80 TRPM4 (0.48) ALDH1A1HSD17B10CASP1CASP7TDP1
SCHEMBL2313052 0.80 TDP1 (0.42) ALDH1A1HSD17B10CYP3A4ALOX15CASP1
SCHEMBL29768796 0.80 TRPM4 (0.48) ALDH1A1HSD17B10CASP1CASP7TDP1
SCHEMBL29825149 0.80 TRPM4 (0.48) ALDH1A1HSD17B10CASP1CASP7TDP1
SCHEMBL647376 0.78 IDO1 (0.45) PDE4APDE4BPDE4CPDE4DALDH1A1
SCHEMBL20562979 0.78 CBFB (0.43) ALDH1A1MEN1KMT2AAPOBEC3GCYP2A6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9804492-B2 Method for forming multi-layer film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-10-31 US disclosed
US-9785049-B2 Method for forming multi-layer film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-10-10 US disclosed
US-20170199457-A1 METHOD FOR FORMING MULTI-LAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-07-13 US disclosed
US-9658530-B2 Process for forming multi-layer film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-05-23 US disclosed
US-20160111287-A1 METHOD FOR FORMING MULTI-LAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-04-21 US disclosed
US-20160008844-A1 PROCESS FOR FORMING MULTI-LAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-01-14 US disclosed
US-8338078-B2 Photoresist undercoat-forming material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-12-25 US disclosed
US-20100104977-A1 PHOTORESIST UNDERCOAT-FORMING MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-04-29 US disclosed